Inventor
Anthony Graupera
Inventor
Hillsboro, OR, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps74%
H05HPlasma technique17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
9,691,583'Imaging and processing for plasma ion source'20179,627,169'Plasma ion source for use with a focused ion beam column with selectable ions'20179,530,625'Method for attachment of an electrode into an inductively-coupled plasma'20169,159,534'Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source'20159,105,438'Imaging and processing for plasma ion source'20159,087,671'Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions'20159,053,895'System for attachment of an electrode into a plasma source'20158,987,678'Encapsulation of electrodes in solid media'20158,928,210'System for attachment of an electrode into an inductively coupled plasma source'20158,822,913'Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions'20148,759,764'On-axis detector for charged particle beam system'20148,723,143'Plasma igniter for an inductively coupled plasma ion source'20148,642,974'Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation'20148,633,452'Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source'20148,445,870'Charged particle beam system having multiple user-selectable operating modes'20138,278,220'Method to direct pattern metals on a substrate'20128,253,118'Charged particle beam system having multiple user-selectable operating modes'20128,124,942'Plasma igniter for an inductively coupled plasma ion source'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2017Patents assigned to FEI CO (17)· patent assignee history
2012–2015Patents assigned to GRAUPERA ANTHONY (11)· patent assignee history
2012–2015Patents assigned to KELLOGG SEAN (7)· patent assignee history
2012–2017Based in Hillsboro, OR, US· patent location history
2014–2015Patents assigned to PARKER N WILLIAM (5)· patent assignee history
2014–2015Patents assigned to UTLAUT MARK W (5)· patent assignee history
2017Based in Kailua-Kona, HI, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FEI CO | 17 | 2012–2017 |
| GRAUPERA ANTHONYself | 11 | 2012–2015 |
| KELLOGG SEAN | 7 | 2012–2015 |
| PARKER N WILLIAM | 5 | 2014–2015 |
| UTLAUT MARK W | 5 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hillsboro, OR, US | 17 | 2012–2017 |
| Kailua-Kona, HI, US | 1 | 2017 |