System for attachment of an electrode into an inductively coupled plasma source
Granted 6 Jan 2015 · 2 office actions
Current assignee: FEI Company · originally FEI Comapny
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Inventors: Noel Smith, Walter Skoczylas, Sean Kellogg, Mark W. Utlaut +5 · Examiner: Britt D Hanley · AU 2889 · TC 2800
Life of the patent
10 dated eventsAbstract
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Claims
16 · 3 independent · depth 3Classifications
3 codes- H01J1/02
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1 priority documents›Priority documents — 1
| Type | Document | Date |
|---|---|---|
| related publication | US 20130134855 A1 | 30 May 2013 |
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