USPatentGranted
B2

System for attachment of an electrode into an inductively coupled plasma source

Granted 6 Jan 2015 · 2 office actions

Current assignee: FEI Company · originally FEI Comapny

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Inventors: Noel Smith, Walter Skoczylas, Sean Kellogg, Mark W. Utlaut +5 · Examiner: Britt D Hanley · AU 2889 · TC 2800

Life of the patent

10 dated events
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Abstract

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

Claims

16 · 3 independent · depth 3
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16 granted claims

Classifications

3 codes
IPC · International Patent Classification
Section H — Electricity
  • H01J1/02
USPC · US Patent Classification
313/39313/237

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File wrapper

⤢ drag to zoomJan 2012Jul 2012Jan 2013Jul 2013Jan 2014Jul 2014Jan 2015USPTOApplicantRestriction requirementNon-final rejectionResponse after non-finalRequest for continued examination
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Pendency
3.1 y
1,133 days filing → grant
Office actions
1
after a restriction
Responses
2
1 RCE
Examiner
Britt D Hanley
art unit 2889 · TC 2800
Citations: 12 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20130134855 A130 May 2013

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