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Inventor

Sanae Furuya

Inventor
Kawasaki, JP

Overview

11→
Patents
2010–2014
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
C07CAcyclic or carbocyclic compounds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
8,742,038'Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound'20148,642,244'Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound'20148,501,387'Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound'20138,475,997'Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound'20138,298,745'Polymeric compound, positive resist composition, and method of forming resist pattern'20128,221,956'Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound'20128,088,553'Positive resist composition, method of forming resist pattern, and polymeric compound'20128,025,923'Method for manufacturing a structure'20117,989,138'Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern'20117,914,967'Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern'20117,741,008'Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2014Patents assigned to TOKYO OHKA KOGYO CO LTD (10)· patent assignee history
2010–2014Based in Kawasaki, JP· patent location history
2012–2014Patents assigned to DAZAI TAKAHIRO (6)· patent assignee history
2012–2014Patents assigned to FURUYA SANAE (6)· patent assignee history
2012–2014Patents assigned to HIRANO TOMOYUKI (5)· patent assignee history
2012–2014Patents assigned to SHIONO DAIJU (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD102010–2014
DAZAI TAKAHIRO62012–2014
FURUYA SANAEself62012–2014
HIRANO TOMOYUKI52012–2014
SHIONO DAIJU52012–2014
Locations
LocationPatentsSpan
Kawasaki, JP112010–2014