Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound

A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: [structure] wherein R 1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(╠O)— group in general formula (c-1); and R 2 represents an organic group having a fluorine atom.