Inventor

Gerhard Stengl

Inventor
Wernberg, AT

Overview

38→
Patents
1983–2013
Patent span
Electricity
Primary field (CPC H)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps48%
B82YSpecific uses or applications of nanostructures30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
C01BNon-metallic elements2%
C23CCoating metallic material2%
C30BSingle-crystal growth2%
G05FSystems for regulating electric or magnetic variables2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
8,368,030'Charged particle beam exposure system and beam manipulating arrangement'20138,368,015'Particle-optical system'20138,049,189'Charged particle system'20117,772,574'Pattern lock system for particle-beam exposure apparatus'20107,737,422'Charged-particle exposure apparatus'20107,436,120'Compensation of magnetic fields'20087,388,217'Particle-optical projection system'20087,214,951'Charged-particle multi-beam exposure apparatus'20077,199,373'Particle-optic electrostatic lens'20077,041,992'Charged-particle multi-beam exposure apparatus'20067,033,647'Method of synthesising carbon nano tubes'20066,989,546'Particle multibeam lithography'20066,909,103'Ion irradiation of a target at very high and very low kinetic ion energies'20056,858,118'Apparatus for enhancing the lifetime of stencil masks'20056,768,125'Maskless particle-beam system for exposing a pattern on a substrate'20046,661,015'Pattern lock system'20036,326,632'Particle-optical imaging system for lithography purposes'20016,194,730'Electrostatic lens'20015,874,739'Arrangement for shadow-casting lithography'19995,869,838'Field composable electrostatic lens system'19995,801,388'Particle beam, in particular ionic optic imaging system'19985,742,062'Arrangement for masked beam lithography by means of electrically charged particles'19985,693,950'Projection system for charged particles'19975,436,460'Ion-optical imaging system'19955,378,917'Particle-beam imaging system'19955,350,924'Ion-optical imaging system'19945,317,161'Ion source'19944,985,634'Ion beam lithography'19914,967,088'Method and apparatus for image alignment in ion lithography'19904,924,104'Ion beam apparatus and method of modifying substrate'19904,894,549'Apparatus for demagnification or full-size ion projection lithography'19904,891,547'Particle or radiation beam mask and process for making same'19904,859,857'Ion-projection apparatus and method of operating same'19894,835,392'Ion-projection apparatus'19894,823,011'Ion-projection lithographic apparatus with means for aligning the mask image with the substrate'19894,780,382'Process for making a transmission mask'19884,775,797'Method of stabilizing a mask'19884,370,556'Self-supporting mask, method for production as well as use of same'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983Based in Purkersdorf, AT· patent location history
1988–2005Patents assigned to IMS IONEN MIKROFAB SYST (19)· patent assignee history
1988–1990Based in Villach, AT· patent location history
1989–2013Based in Wernberg, AT· patent location history
1990–1991Patents assigned to OESTERR INVESTITIONSKREDIT (2)· patent assignee history
1990–1994Based in Karnten, AT· patent location history
2004–2008Patents assigned to IMS NANOFABRICATION GMBH (5)· patent assignee history
2010Patents assigned to IMS NANOFABRICATION AG (2)· patent assignee history
2011–2013Patents assigned to ZEISS CARL SMS GMBH (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IMS IONEN MIKROFAB SYST191988–2005
IMS NANOFABRICATION GMBH52004–2008
ZEISS CARL SMS GMBH32011–2013
IMS NANOFABRICATION AG22010
OESTERR INVESTITIONSKREDIT21990–1991
Locations
LocationPatentsSpan
Wernberg, AT301989–2013
Villach, AT51988–1990
Karnten, AT21990–1994
Purkersdorf, AT11983