USPatentGranted
B2

Charged-particle multi-beam exposure apparatus

Granted 9 May 2006 · no office action yet

Life of the patent

3 dated events
⤢ drag to zoomOct 2004Jan 2005Apr 2005Jul 2005Oct 2005Jan 2006Apr 2006Jul 2006Prosecution
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Abstract

A charged-particle multi-beam exposure apparatus ( 1 ) for exposure of a target ( 41 ) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target ( 41 ). For each particle beam an illumination system ( 10 ), a pattern definition means ( 20 ) and a projection optics system ( 30 ) are provided. The illuminating system ( 10 ) and/or the projection optics system ( 30 ) comprise particle-optical lenses having lens elements (L 1 , L 2 , L 3 , L 4 , L 5 ) common to more than one particle beam. The pattern definition means ( 20 ) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target ( 41 ), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

Claims

23 · 1 independent · depth 4
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23 granted claims

Classifications

5 codes
IPC · International Patent Classification
Section G — Physics
  • G21G5/00
Section H — Electricity
  • H01J37/08
USPC · US Patent Classification
250/492.23250/492.21250/492.22

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File wrapper

Pendency
1.5 y
566 days filing → grant
Office actions
0
none on record
Responses
1
1 RCE
Examiner
Nikita Wells
art unit 2881 · TC 2800
Citations: 4 back · 0 forward

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20050104013 A119 May 2005

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