Inventor
Hidenari Yoshida
Inventor
Toyama, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
LOC13primary
LOC1335%
C23CCoating metallic material21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices16%
H01JElectric discharge tubes or discharge lamps2%
H05BElectric heating2%
LOC232%
PatentTitleYear
10,811,271Substrate processing device, manufacturing method for semiconductor device, and reaction tube202010,808,318Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202010,731,254Protective plate, substrate processing apparatus, and method of manufacturing semiconductor device202010,689,758Substrate processing apparatus, and method for manufacturing semiconductor device202010,615,061Substrate processing apparatus2020D0872037Cover of seal cap for reaction chamber for semiconductor manufacturing202010,453,735Substrate processing apparatus, reaction tube, semiconductor device manufacturing method, and recording medium2019D0855027Cover of seal cap for reaction chamber of semiconductor2019D0847105Boat of substrate processing apparatus2019D0847301Return nozzle2019D0846514Boat of substrate processing apparatus2019D0843958Reaction tube2019D0842823Reaction tube2019D0839219Boat for substrate processing apparatus20199,957,616Substrate processing apparatus and heating unit2018D0793975'Heater for semiconductor thermal process'2017D0791090'Reaction tube'2017D0772824'Reaction tube'2016D0770993'Reaction tube'2016D0747279'Boat for substrate processing apparatus'2016D0738329'Boat for substrate processing apparatus'2015D0737785'Boat for substrate processing apparatus'20159,111,748'Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer readable recording medium'2015D0734730'Boat of substrate processing apparatus'20158,791,031'Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2020Patents assigned to HITACHI INT ELECTRIC INC (22)· patent assignee history
2014–2020Based in Toyama, JP· patent location history
2019–2020Patents assigned to KOKUSAI ELECTRIC CORP (14)· patent assignee history
2019Based in Tokyo, JP· patent location history
2020Based in Toyoma, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 22 | 2014–2020 |
| KOKUSAI ELECTRIC CORP | 14 | 2019–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 23 | 2014–2020 |
| Toyoma, JP | 1 | 2020 |
| Tokyo, JP | 1 | 2019 |