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Inventor

Katsushi Nakano

Inventor
Kumagaya, JP

Overview

33→
Patents
1997–2021
Patent span
Physics
Primary field (CPC G)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
G01QScanning-probe techniques or apparatus5%
H01JElectric discharge tubes or discharge lamps5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B82YSpecific uses or applications of nanostructures4%
E21BEarth or rock drilling4%
E02DFoundations2%
G01KMeasuring temperature2%
PatentTitleYear
11,073,496Reference electrode202110,642,159Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium202010,317,803Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium201910,061,214Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method20189,746,781'Exposure apparatus and method for producing device'20179,720,332'Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium'20178,941,808'Immersion lithographic apparatus rinsing outer contour of substrate with immersion space'20158,780,327'Exposure apparatus and method for producing device'20148,760,617'Exposure apparatus and method for producing device'20148,514,366'Exposure method and apparatus, maintenance method and device manufacturing method'20138,384,877'Exposure apparatus and method for producing device'20138,305,553'Exposure apparatus and device manufacturing method'20128,294,873'Exposure method, device manufacturing method, and substrate'20128,253,924'Exposure method, exposure apparatus and device manufacturing method'20128,174,668'Exposure apparatus and method for producing device'20128,169,592'Exposure apparatus and method for producing device'20128,130,363'Exposure apparatus and method for producing device'20128,111,374'Analysis method, exposure method, and device manufacturing method'20128,072,576'Exposure apparatus and method for producing device'20118,053,937'Linear motor, stage apparatus and exposure apparatus'20118,040,489'Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid'20118,004,653'Exposure apparatus and method for producing device'20117,995,187'Exposure apparatus and method for producing device'20117,388,649'Exposure apparatus and method for producing device'20086,802,986'Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors'20046,635,891'Hollow-beam apertures for charged-particle-beam microlithography apparatus and methods for making and using same'20036,566,663'Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations'20036,223,591'Probe needle arrangement and movement method for use in an atomic force microscope'20016,018,991'Scanning probe microscope having cantilever attached to driving member'20005,896,926'Packer type groundwater sampling system and water sampling method'19995,784,401'Temperature distribution measurement methods and apparatus'19985,767,400'Hydraulic test system mounted with borehole television set for simultaneous observation in front and lateral directions'19985,656,769'Scanning probe microscope'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2020Patents assigned to NIKON CORP (27)· patent assignee history
1997–2003Based in Kawasaki, JP· patent location history
2003–2020Based in Kumagaya, JP· patent location history
2011–2018Patents assigned to NAKANO KATSUSHI (12)· patent assignee history
2011–2014Patents assigned to KOBAYASHI NAOYUKI (6)· patent assignee history
2011–2018Patents assigned to SHIRAISHI KENICHI (6)· patent assignee history
2011–2013Patents assigned to MIZUNO YASUSHI (5)· patent assignee history
2011Based in Kamagaya, JP· patent location history
2018Based in Tokyo, JP· patent location history
2021Based in Nara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP271997–2020
NAKANO KATSUSHIself122011–2018
KOBAYASHI NAOYUKI62011–2014
SHIRAISHI KENICHI62011–2018
MIZUNO YASUSHI52011–2013
Locations
LocationPatentsSpan
Kumagaya, JP232003–2020
Kawasaki, JP41997–2003
Nara, JP12021
Tokyo, JP12018
Kamagaya, JP12011