A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.

Claims

78 · 3 independent · depth 6

78 granted claims

›1.independentA method for making a lithographic apparatus, the method comprising:nproviding a substrate table on which a substrate is held;providing a projection s…+42

›2.↳ 1The method according to claim 1, wherein the cleaning system cleans the final optical element in-line in the lithographic apparatus using the liquid f…d2

›3.↳ 1The method according to claim 1, wherein the cleaning system supplies the cleaning fluid to the substrate table from the supply outlet.d2+13

›21.↳ 3The method according to claim 3, wherein the cleaning fluid is supplied to an upper surface of the substrate table, the upper surface being around the…d3+1

›23.↳ 3The method according to claim 3, wherein the cleaning fluid is supplied to a measurement member provided on the substrate table.d3+3

›27.↳ 3The method according to claim 3, wherein the cleaning system has a member which partially confines the cleaning fluid on the substrate table.d3+1

›29.↳ 3The method according to claim 3, wherein the substrate table is movable below the supply outlet of the cleaning system.d3

›30.↳ 3The method according to claim 3, wherein the cleaning fluid includes a cleaning gas.d3

›31.↳ 3The method according to claim 3, wherein the cleaning system includes a suction inlet.d3+2

›4.↳ 1The method according to claim 1, wherein the cleaning system includes a component which is in the substrate table.d2+4

›7.↳ 1The method according to claim 1, wherein the cleaning system includes a first device which cleans only the substrate table by supplying the cleaning f…d2

›9.↳ 1The method according to claim 1, wherein the cleaning system cleans the final optical element.d2+11

›10.↳ 9The method according to claim 9, wherein the cleaning system cleans the final optical element in-line in the lithographic apparatus.d3

›11.↳ 9The method according to claim 9, wherein the cleaning system supplies a cleaning fluid to the final optical element to clean the final optical element…d3+2

›12.↳ 9The method according to claim 9, wherein the cleaning system includes a component to clean the final optical element, the component being in the subst…d3+5

›15.↳ 9The method according to claim 9, wherein the cleaning system includes a first device which cleans the substrate table and a second device which cleans…d3

›17.↳ 1The method according to claim 1, wherein the cleaning system comprises a spray unit having the supply outlet to spray the cleaning fluid.d2+1

›19.↳ 1The method according to claim 1, wherein the liquid supply system the liquid confinement structure partially confines liquid in the space during the p…d2

›20.↳ 1The method according to claim 1, wherein the cleaning fluid includes a cleaning gas.d2

›40.↳ 1The method according to claim 1, wherein the cleaning system includes a suction inlet.d2+2

›43.↳ 1The method according to claim 1, wherein the cleaning by the cleaning system includes removing a residual liquid from the substrate table.d2

›44.↳ 1A device manufacturing method comprising:nexposing a substrate via the projection system of the lithographic apparatus made by using the method accord…d2

›8.independentA method for making a lithographic apparatus comprising:nproviding a substrate table on which substrate is held:providing a projection system includin…

›45.independentA method used in a lithographic apparatus, the method comprising:nholding a substrate on a substrate table of the lithographic apparatus;projecting a …+33

›46.↳ 45The method according to claim 45, wherein the cleaning fluid is supplied to an upper surface of the substrate table.d2+1

›47.↳ 45The method according to claim 45, wherein the cleaning fluid is supplied to a measurement member provided at the substrate table.d2+3

›48.↳ 45The method according to claim 45, wherein the cleaning system includes a member which partially confines the cleaning fluid on the substrate table.d2+2

›49.↳ 45The method according to claim 45, wherein the supply outlet of the cleaning system provides the cleaning fluid from above the substrate table.d2

›50.↳ 45The method according to claim 45, wherein the cleaning fluid includes a cleaning gas.d2

›51.↳ 45The method according to claim 45, wherein the cleaning of the substrate table includes removing a residual liquid from the substrate table.d2+4

›62.↳ 45The method according to claim 45, wherein the cleaning system includes a suction inlet.d2+2

›65.↳ 45The method according to claim 45, wherein the cleaning system sprays the cleaning fluid onto the substrate table.d2

›66.↳ 45The method according to claim 45, wherein the cleaning system cleans the substrate table after finishing the projection of the patterned beam to the s…d2

›67.↳ 45The method according to claim 45, wherein the cleaning system cleans the substrate table before projecting the patterned beam to the substrate.d2

›68.↳ 45The method according to claim 45, wherein the cleaning system cleans the substrate table in a period in which the projection of the patterned beam is …d2

›69.↳ 45The method according to claim 45, further comprising cleaning the final optical element by the cleaning system.d2+9

›70.↳ 69The method according to claim 69, wherein the cleaning system supplies a cleaning fluid to the final optical element to clean the final optical elemen…d3+4

›75.↳ 69The method according to claim 69, wherein the cleaning system includes a component with which the final optical element is cleaned, the substrate tabl…d3+2

›78.↳ 69The method according to claim 69, wherein the cleaning system includes a first device that cleans the substrate table and a second device that cleans …d3

Classifications

4 codes

IPC · International Patent Classification

Section G — Physics

G03B27/52
G03B27/42

USPC · US Patent Classification

355/30355/53

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Hung Henry Nguyen

art unit 2882 · TC 2800

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1 priority documents

›Priority documents — 1

Type	Document	Date
related publication	US 20070247600 A1	25 Oct 2007

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