Inventor
Takatomo Yamaguchi
Inventor
Toyama, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
LOC1316%
H01LSemiconductor devices14%
C30BSingle-crystal growth8%
LOC154%
B08BCleaning in general2%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof2%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application2%
H05BElectric heating2%
PatentTitleYear
10,895,225Intake manifold202110,615,061Substrate processing apparatus202010,597,780Substrate processing apparatus, heater and method of manufacturing semiconductor device2020D0826185Ceiling heater for substrate processing apparatus2018D0825502Heater for substrate processing apparatus2018D0825501Air flow controller for heater of substrate processing apparatus2018D0822081Rotary tool for boat of semiconductor manufacturing apparatus2018D0818961Insulation unit cover of semiconductor manufacturing apparatus2018D0818960Insulation unit of semiconductor manufacturing apparatus20189,982,347Cleaning method, method of manufacturing semiconductor device and substrate processing apparatus2018D0803908'Rotary tool for boat of semiconductor manufacturing apparatus'2017D0795209'Heater for semiconductor thermal process'2017D0793974'Heater for semiconductor thermal process'20179,530,677'Substrate processing apparatus and semiconductor device manufacturing method'20169,502,237'Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium'20169,222,732'Substrate processing apparatus and method of manufacturing semiconductor device'2015D0739832'Reaction tube'20159,028,614'Substrate processing apparatus'20158,882,923'Substrate processing apparatus and method of manufacturing semiconductor device'20148,771,416'Substrate processing apparatus with an insulator disposed in the reaction chamber'20147,455,734'Substrate processing apparatus, substrate holder, and manufacturing method of semiconductor device'20086,737,613'Heat treatment apparatus and method for processing substrates'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2020Patents assigned to HITACHI INT ELECTRIC INC (21)· patent assignee history
2004Based in Tokyo, JP· patent location history
2008–2020Based in Toyama, JP· patent location history
2014–2015Patents assigned to SAIDO SHUHEI (3)· patent assignee history
2014–2015Patents assigned to YAMAGUCHI TAKATOMO (3)· patent assignee history
2014–2015Patents assigned to SHIRAKO KENJI (2)· patent assignee history
2020Patents assigned to KOKUSAI ELECTRIC CORP (2)· patent assignee history
2021Based in Aichi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 21 | 2004–2020 |
| SAIDO SHUHEI | 3 | 2014–2015 |
| YAMAGUCHI TAKATOMOself | 3 | 2014–2015 |
| KOKUSAI ELECTRIC CORP | 2 | 2020 |
| SHIRAKO KENJI | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 20 | 2008–2020 |
| Aichi, JP | 1 | 2021 |
| Tokyo, JP | 1 | 2004 |