Inventor
Takafumi Sakurada
Inventor
Hitachi, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C09GPolishing compositions18%
C23FNon-mechanical removal of metallic material from surface13%
H01LSemiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
B24BMachines, devices, or processes for grinding or polishing2%
C01BNon-metallic elements2%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals2%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds2%
PatentTitleYear
9,944,827CMP polishing solution and polishing method20188,901,002'Polishing slurry for metal films and polishing method'20148,821,750'Metal polishing slurry and polishing method'20148,791,019'Metal polishing slurry and method of polishing a film to be polished'20148,609,541'Polishing slurry for metal films and polishing method'20138,481,428'Polishing slurry and polishing method'20138,328,893'Method of producing oxide particles, slurry, polishing slurry, and method of polishing substrate'20128,084,362'Polishing slurry and polishing method'20118,084,363'Polishing slurry and polishing method'20117,994,058'Polishing slurry and polishing method'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2018Patents assigned to HITACHI CHEMICAL CO LTD (9)· patent assignee history
2011–2018Patents assigned to SAKURADA TAKAFUMI (8)· patent assignee history
2011–2014Patents assigned to ANZAI SOU (5)· patent assignee history
2011–2014Patents assigned to AMANOKURA JIN (4)· patent assignee history
2011–2013Patents assigned to FUKASAWA MASATO (4)· patent assignee history
2011Based in Ibaraki, JP· patent location history
2012–2018Based in Hitachi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 9 | 2011–2018 |
| SAKURADA TAKAFUMIself | 8 | 2011–2018 |
| ANZAI SOU | 5 | 2011–2014 |
| AMANOKURA JIN | 4 | 2011–2014 |
| FUKASAWA MASATO | 4 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 7 | 2012–2018 |
| Ibaraki, JP | 3 | 2011 |