Inventor

Susumu Makinouchi

Inventor

Zama, JP

Overview

1989–2014

Patent span

Physics

Primary field (CPC G)

Patents· 37 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%

G01DMeasuring not specially adapted for a specific variable19%

G01BMeasuring length, thickness or similar linear dimensions6%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

Y10TTechnical subjects covered by former us classification4%

G02BOptical elements, systems or apparatus2%

G05BControl or regulating systems in general2%

G06VImage or video recognition or understanding2%

G12BConstructional details of instruments, or comparable details of other apparatus, not otherwise provided for2%

PatentTitleYear

8,796,613'Encoder apparatus using liquid to suppress detection failure'2014 8,797,506'Exposure apparatus, exposure method, and device fabrication method'2014 8,760,622'Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method'2014 8,710,426'Encoder that detects positional information of a moving body generating interference fringes that move in opposite directions'2014 8,710,425'Encoder that optically detects positional information of a moving body from different optical paths lengths'2014 8,395,110'Encoder apparatus using liquid to suppress detection failure'2013 8,390,780'Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method'2013 8,272,544'Exposure apparatus, exposure method, and device fabrication method'2012 8,222,594'Encoder that optically detects positional information of a movable body by changing a path length through periodic oscillation of an optical element'2012 8,208,128'Position measuring system and position measuring method, Movable body apparatus, movable body drive method, exposure apparatus and exposure method, pattern forming apparatus, and device manufacturing method'2012 8,064,037'Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure'2011 7,961,289'Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure'2011 7,932,996'Exposure apparatus, exposure method, and device fabrication method'2011 7,723,671'Positional information detecting device'2010 7,601,947'Encoder that optically detects positional information of a scale'2009 6,646,715'Scanning exposure apparatus and method with run-up distance control'2003 6,633,363'Scanning exposure apparatus and method'2003 6,490,025'Exposure apparatus'2002 6,337,733'Apparatus including a motor-driven stage for exposing a photosensitive substrate, and method of making such apparatus'2002 6,260,282'Stage control with reduced synchronization error and settling time'2001 6,259,511'Scanning type exposure apparatus'2001 6,188,464'Exposure apparatus'2001 5,978,071'Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage'1999 5,969,800'Scanning exposure apparatus and method'1999 5,907,392'Exposure apparatus'1999 5,877,845'Scanning exposure apparatus and method'1999 5,777,721'Exposure method and apparatus with control of a linear motor'1998 5,742,376'Projection exposure apparatus and projection exposure method'1998 5,714,860'Stage device capable of applying a damping force to a movable member'1998 5,699,145'Scanning type exposure apparatus'1997 5,677,754'Scanning exposure apparatus'1997 5,483,311'Projection exposure apparatus'1996 5,446,519'Stage device'1995 5,343,270'Projection exposure apparatus'1994 4,958,082'Position measuring apparatus'1990 4,860,374'Apparatus for detecting position of reference pattern'1989 4,801,977'Projection optical apparatus'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2014Patents assigned to NIKON CORP (35)· patent assignee history

1989–1990Based in Kawasaki, JP· patent location history

1994–2014Based in Zama, JP· patent location history

1997–2002Based in Kanagawa, JP· patent location history

1999–2014Based in Tokyo, JP· patent location history

2011–2014Patents assigned to MAKINOUCHI SUSUMU (10)· patent assignee history

2012–2014Patents assigned to WATANABE AKIHIRO (4)· patent assignee history

2012–2014Patents assigned to IMAI TORU (3)· patent assignee history

2012–2014Patents assigned to IMAI MOTOKATSU (2)· patent assignee history

2014Based in Zuma, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	35	1989–2014
MAKINOUCHI SUSUMUself	10	2011–2014
WATANABE AKIHIRO	4	2012–2014
IMAI TORU	3	2012–2014
IMAI MOTOKATSU	2	2012–2014

Locations

Location	Patents	Span
Zama, JP	28	1994–2014
Tokyo, JP	3	1999–2014
Kanagawa, JP	2	1997–2002
Kawasaki, JP	2	1989–1990
Zuma, JP	1	2014