Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure

An exposure apparatus comprising:na projection optical system having an optical member via which an exposure light is irradiated onto a substrate to expose the substrate;a liquid supply system including a supply port through which a liquid is supplied onto the substrate;a liquid recovery system including a recovery port through which the liquid having been supplied onto the substrate is recovered from above the substrate; anda controller that controls the liquid supply system and the liquid recovery system such that (i) when the exposure light is being irradiated onto an image plane of the projection optical system, the liquid recovery system does not perform recovery of the liquid and the liquid supply system performs the supply of the liquid onto the substrate, and (ii) during at least some times when the exposure light is not being irradiated onto the image plane of the projection optical system, the liquid recovery system performs recovery of the liquid and the liquid supply system simultaneously performs the supply of the liquid onto the substrate.

An exposure method comprising:nsupplying a liquid to a space between a projection optical system and a substrate using a liquid supply system;exposing the substrate by irradiating an exposure light onto the substrate via the projection optical system and the liquid; andrecovering the liquid having been supplied onto the substrate from above the substrate using a liquid recovery system, wherein(i) when the exposure light is being irradiated onto an image plane of the projection optical system, the liquid recovery system does not perform recovery of the liquid and the liquid supply system performs the supply of the liquid onto the substrate, and(ii) during at least some times when the exposure light is not being irradiated onto the image plane of the projection optical system, the liquid recovery system performs recovery of the liquid and the liquid supply system simultaneously performs the supply of the liquid onto the substrate.

An exposure apparatus comprising:na projection optical system having an optical member via which an exposure light is irradiated onto a substrate to expose the substrate;a liquid supply system including a supply port through which a liquid is supplied onto the substrate;a liquid recovery system including a recovery port through which the liquid having been supplied onto the substrate is recovered from above the substrate; anda controller that controls the liquid supply system and the liquid recovery system such that when the exposure light is being irradiated onto an image plane of the projection optical system, the liquid recovery system does not perform recovery of the liquid and the liquid supply system performs the supply of the liquid onto the substrate,wherein the liquid supply system and the liquid recovery system form a liquid immersion area on the substrate, the liquid immersion area covering an area that is smaller than a surface of the substrate on which the exposure light is irradiated so that only a portion of the surface of the substrate on which the exposure light is irradiated is covered by the liquid.

An exposure method comprising:nsupplying a liquid to a space between a projection optical system and a substrate using a liquid supply system;exposing the substrate by irradiating an exposure light onto the substrate via the projection optical system and the liquid; andrecovering the liquid having been supplied onto the substrate from above the substrate using a liquid recovery system, whereinwhen the exposure light is being irradiated onto an image plane of the projection optical system, the liquid recovery system does not perform recovery of the liquid and the liquid supply system performs the supply of the liquid onto the substrate, andwherein the liquid supply system and the liquid recovery system form a liquid immersion area on the substrate, the liquid immersion area covering an area that is smaller than a surface of the substrate on which the exposure light is irradiated so that only a portion of the surface of the substrate on which the exposure light is irradiated is covered by the liquid.