Inventor
Andrew J. Hazelton
Inventor
San Carlos, CA, US
Overview
Patents· 96 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H02KDynamo-electric machines15%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
Y10TTechnical subjects covered by former us classification3%
H01JElectric discharge tubes or discharge lamps2%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling1%
F16FSprings1%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
PatentTitleYear
10,185,222Liquid jet and recovery system for immersion lithography201910,082,461Optical metrology with purged reference chip20189,977,350Environmental system including vacuum scavenge for an immersion lithography apparatus20189,958,673Protected lens cover plate for an optical metrology device20189,910,370'Environmental system including a transport region for an immersion lithography apparatus'20189,785,057'Liquid jet and recovery system for immersion lithography'20179,658,537'Environmental system including vacuum scavenge for an immersion lithography apparatus'20179,632,427'Environmental system including a transport region for an immersion lithography apparatus'20179,618,852'Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets'20179,304,409'Liquid jet and recovery system for immersion lithography'20169,244,363'Environmental system including a transport region for an immersion lithography apparatus'20169,244,362'Environmental system including vacuum scavenge for an immersion lithography apparatus'20168,836,914'Environmental system including vacuum scavenge for an immersion lithography apparatus'20148,830,443'Environmental system including a transport region for an immersion lithography apparatus'20148,810,768'Environmental system including vacuum scavenge for an immersion lithography apparatus'20148,797,500'Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface'20148,508,718'Wafer table having sensor for immersion lithography'20138,497,973'Immersion lithography fluid control system regulating gas velocity based on contact angle'20138,456,610'Environmental system including vacuum scavenge for an immersion lithography apparatus'20138,102,501'Immersion lithography fluid control system using an electric or magnetic field generator'20128,089,610'Environmental system including vacuum scavenge for an immersion lithography apparatus'20128,059,258'Liquid jet and recovery system for immersion lithography'20117,969,552'Environmental system including a transport region for an immersion lithography apparatus'20117,965,376'Environmental system including a transport region for an immersion lithography apparatus'20117,932,995'Environmental system including vacuum scavenge for an immersion lithography apparatus'20117,932,989'Liquid jet and recovery system for immersion lithography'20117,929,110'Environmental system including a transport region for an immersion lithography apparatus'20117,929,111'Environmental system including a transport region for an immersion lithography apparatus'20117,869,000'Stage assembly with lightweight fine stage and low transmissibility'20117,839,486'Environmental system including vacuum scavenge for an immersion lithography apparatus'20107,821,615'Liquid jet and recovery system for immersion lithography'2010RE041232'Wafer positioner with planar motor and mag-lev fine stage'20107,522,259'Cleanup method for optics in immersion lithography'20097,486,380'Wafer table for immersion lithography'20097,462,958'Z actuator with anti-gravity'20087,456,930'Environmental system including vacuum scavenge for an immersion lithography apparatus'20087,443,482'Liquid jet and recovery system for immersion lithography'20087,368,838'High efficiency voice coil motor'20087,355,308'Mover combination with two circulation flows'20087,345,742'Environmental system including a transport region for an immersion lithography apparatus'20087,339,650'Immersion lithography fluid control system that applies force to confine the immersion liquid'20087,321,415'Environmental system including vacuum scavenge for an immersion lithography apparatus'20087,301,607'Wafer table for immersion lithography'20077,288,864'System and method for cooling motors of a lithographic tool'20077,288,859'Wafer stage operable in a vacuum environment'20077,283,210'Image shift optic for optical system'20077,251,017'Environmental system including a transport region for an immersion lithography apparatus'20077,193,683'Stage design for reflective optics'20077,164,466'Detachable heat sink'20077,095,482'Multiple system vibration isolator'20067,087,906'Bellows with spring anti-gravity device'20066,979,920'Circulation housing for a mover'20056,958,808'System and method for resetting a reaction mass assembly of a stage assembly'20056,927,838'Multiple stage, stage assembly having independent stage bases'20056,903,467'Tube carrier reaction apparatus'20056,885,430'System and method for resetting a reaction mass assembly of a stage assembly'20056,882,126'Holder mover for a stage assembly'20056,880,942'Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system'20056,870,600'Vibration-attenuation devices and methods using pressurized bellows exhibiting substantially zero lateral stiffness'20056,841,956'Actuator to correct for off center-of-gravity line of force'20056,809,323'Isolated frame caster'20046,801,300'System and method for switching position signals during servo control of a device table'20046,788,385'Stage device, exposure apparatus and method'20046,757,053'Stage assembly including a reaction mass assembly'20046,750,625'Wafer stage with magnetic bearings'20046,724,466'Stage assembly including a damping assembly'20046,724,000'Reaction frame apparatus and method'20046,686,990'Scanning exposure method with reduced time between scans'20046,593,997'Stage assembly including a reaction assembly'20036,570,273'Electric linear motor'20036,555,936'Flatmotor device and exposure device'20036,551,045'Wafer stage chamber'20036,486,941'Guideless stage'20026,437,463'Wafer positioner with planar motor and mag-lev fine stage'20026,405,659'Monolithic stage'20026,373,153'Stage device, and exposure apparatus with linear motor having polygonal shaped coil units'20026,355,993'Linear motor having polygonal shaped coil units'20026,323,567'Circulating system for shaft-type linear motors'20016,313,550'Coil mounting and cooling system for an electric motor'20016,313,551'Magnet array for a shaft-type linear motor'20016,304,320'Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same'20016,285,097'Planar electric motor and positioning device having transverse magnets'20016,285,438'Scanning exposure method with reduced time between scans'20016,278,203'Cooling structure for a linear motor'20016,271,606'Driving motors attached to a stage that are magnetically coupled through a chamber'20016,252,234'Reaction force isolation system for a planar motor'20016,208,045'Electric motors and positioning devices having moving magnet arrays and six degrees of freedom'20016,188,147'Wedge and transverse magnet arrays'20016,163,091'Linear motor with commutation coil'20006,147,421'Platform positionable in at least three degrees of freedom by interaction with coils'20006,144,119'Planar electric motor with dual coil and magnet arrays'20006,140,734'Armature with regular windings and having a high conductor density'20006,114,781'Cooling system for a linear or planar motor'20006,104,108'Wedge magnet array for linear motor'20006,097,114'Compact planar motor having multiple degrees of freedom'20005,556,241'Quick stop device'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Based in San Francisco, CA, US· patent location history
2000–2019Patents assigned to NIKON CORP (87)· patent assignee history
2000–2019Based in San Carlos, CA, US· patent location history
2006–2017Based in Tokyo, JP· patent location history
2006–2008Based in Kanagawa, JP· patent location history
2007–2011Based in Yokohama, JP· patent location history
2011–2017Patents assigned to HAZELTON ANDREW J (11)· patent assignee history
2012–2017Patents assigned to COON DEREK (4)· patent assignee history
2012–2014Patents assigned to SOGARD MICHAEL (4)· patent assignee history
2018Patents assigned to NANOMETRICS INC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 87 | 2000–2019 |
| HAZELTON ANDREW Jself | 11 | 2011–2017 |
| COON DEREK | 4 | 2012–2017 |
| SOGARD MICHAEL | 4 | 2012–2014 |
| NANOMETRICS INC | 2 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Carlos, California, US | 57 | 2000–2019 |
| Tokyo, JP | 32 | 2006–2017 |
| Yokohama, JP | 4 | 2007–2011 |
| Kanagawa, JP | 2 | 2006–2008 |
| San Francisco, California, US | 1 | 1996 |