A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

Claims

40 · 2 independent · depth 4

40 granted claims

›1.independentA lithographic projection method comprising:nfilling a space between a projection system and a surface of a substrate with a liquid during exposure of…+18

›2.↳ 1The method according to claim 1, wherein the inlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is …d2+2

›4.↳ 1The method according to claim 1, wherein the outlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is…d2+1

›6.↳ 1The method according to claim 1, wherein a fluid bearing is formed between the liquid confinement member and the substrate during the exposure.d2+3

›9.↳ 1The method according to claim 1, further comprising removing fluid via a second outlet of the liquid confinement member, that is located closer inward…d2+2

›11.↳ 1The method according to claim 1, wherein the fluid removed from the outlet includes liquid.d2

›12.↳ 1The method according to claim 1, wherein the fluid includes gas.d2

›16.↳ 1The method according to claim 1, wherein the gas supplied from the inlet assists in containing the liquid.d2

›17.↳ 1The method according to claim 1, wherein the inlet of the liquid confinement member is below the final surface of the projection system.d2+1

›19.↳ 1The method according to claim 1, wherein the outlet of the liquid confinement member is below the final surface of the projection system.d2

›20.independentA method used in a liquid immersion lithography system, the method comprising:ncontaining liquid using a liquid confinement member of the liquid immer…+20

›21.↳ 20The method according to claim 20, wherein the liquid confinement member having the inlet and the outlet surrounds the lens.d2

›22.↳ 20The method according to claim 20, wherein the object includes a wafer.d2

›23.↳ 20The method according to claim 20, wherein the gas supplied from the inlet includes pressurized air.d2

›24.↳ 20The method according to claim 20, wherein the liquid confinement member is flexibly attached to the lens.d2

›25.↳ 20The method according to claim 20, wherein the liquid confinement member is movable relative to the lens.d2

›26.↳ 20The method according to claim 20, wherein the inlet is formed in a face of the liquid confinement member, the face of the liquid confinement member is…d2+1

›28.↳ 20The method according to claim 20, wherein the outlet is formed in a face of the liquid confinement member, the face of the liquid confinement member i…d2+1

›30.↳ 20The method according to claim 20, wherein a fluid bearing is formed between the liquid confinement member and the object.d2+2

›33.↳ 20The method according to claim 20, further comprising removing fluid via a second outlet of the liquid confinement member, that is closer inward toward…d2+2

›36.↳ 20The method according to claim 20, wherein the fluid removed from the outlet includes liquid.d2

›37.↳ 20The method according to claim 20, wherein the gas supplied from the inlet assists in containing the liquid.d2

›38.↳ 20The method according to claim 20, wherein the inlet of the liquid confinement member is below a final surface of the lens.d2+1

›40.↳ 20The method according to claim 20, wherein the outlet of the liquid confinement member is below the final surface of the lens.d2

Classifications

4 codes

IPC · International Patent Classification

Section G — Physics

G03B27/52
G03B27/42

USPC · US Patent Classification

355/53355/30

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File wrapper

Pendency

4.2 y

1,544 days filing → grant

Office actions

non-final + final

Responses

5 RCE

Examiner

Hung Henry Nguyen

art unit 2882 · TC 2800

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Citations: 351 back · 0 forward

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Priority chain

2 priority documents

Priority

10 Apr 2003

earliest claimed

›Priority documents — 2

Type	Document	Date
provisional	US 60462112	10 Apr 2003
related publication	US 20070132974 A1	14 Jun 2007

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