Inventor
Masahiro Shindo
Inventor
Toyonaka, JP
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H10DInorganic electric semiconductor devices5%
Y10TTechnical subjects covered by former us classification5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure4%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
H01HElectric switches4%
H01JElectric discharge tubes or discharge lamps4%
PatentTitleYear
10,218,048Vehicle201910,205,215Vehicle20199,171,761'Resin sealing type semiconductor device and method of manufacturing the same, and lead frame'20159,136,174'Resin sealing type semiconductor device and method of manufacturing the same, and lead frame'20158,704,342'Resin sealing type semiconductor device and method of manufacturing the same, and lead frame'20148,502,360'Resin sealing type semiconductor device and method of manufacturing the same, and resin sealing type electronic device'20137,386,576'Data file storage device with automatic filename creation function, data file storage program and data file storage method'20086,677,214'Semiconductor device and method of fabricating the same'20046,537,404'Continuous manufacturing method and manufacturing apparatus of thermoplastic polyester resin foam'20036,538,890'Heat sink element and high-frequency electronic circuit substrate using such'20036,254,977'High molecular weight thermoplastic polyester resin foam'20016,225,668'Semiconductor device having a single crystal gate electrode and insulation'20016,177,706'Field-effect thin-film transistor device'20016,137,120'Semiconductor device and method of fabricating the same'20006,106,734'Micromachine manufacture using gas beam crystallization'20006,032,611'Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device'20006,025,252'Semiconductor device and method of fabricating the same'20005,993,538'Method of forming single-crystalline thin film using beam irradiating method'19995,958,164'Method of manufacturing thermoplastic polyester resin foam by extrusion'19995,814,150'Method of and apparatus for forming single-crystalline thin film, beam irradiator, beam irradiating method and beam reflecting device'19985,795,385'Method of forming single-crystalline thin film by beam irradiator'19985,776,253'Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device'19985,738,731'Photovoltaic device'19985,218,669'VLSI hardware implemented rule-based expert system apparatus and method'19935,197,016'Integrated silicon-software compiler'19935,048,179'IC chip mounting method'19914,922,432'Knowledge based method and apparatus for designing integrated circuits using functional specifications'19904,617,649'Erasable FPLA'19864,503,520'Erasable FPLA'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–1993Patents assigned to RICOH KK (6)· patent assignee history
1985–2001Based in Toyonaka, JP· patent location history
1990–1993Patents assigned to INT CHIP CORP (3)· patent assignee history
1990–1993Based in Osaka, JP· patent location history
1998–2004Patents assigned to MEGA CHIPS CORP (12)· patent assignee history
1998–2004Patents assigned to CRYSTAL DEVICE CORP (5)· patent assignee history
1998–2000Patents assigned to NEURALSYSTEMS CORP (5)· patent assignee history
1998–2004Based in Suita, JP· patent location history
1999–2003Based in Tenri, JP· patent location history
2019Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MEGA CHIPS CORP | 12 | 1998–2004 |
| RICOH KK | 6 | 1985–1993 |
| CRYSTAL DEVICE CORP | 5 | 1998–2004 |
| NEURALSYSTEMS CORP | 5 | 1998–2000 |
| INT CHIP CORP | 3 | 1990–1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyonaka, JP | 9 | 1985–2001 |
| Suita, JP | 6 | 1998–2004 |
| Tenri, JP | 3 | 1999–2003 |
| Osaka, JP | 3 | 1990–1993 |
| Kawasaki, JP | 2 | 2019 |