Inventor
Takahiro Senzaki
Inventor
Kawasaki, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
B05DProcesses for applying fluent materials to surfaces, in general7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
B82YSpecific uses or applications of nanostructures6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C08LCompositions of macromolecular compounds4%
H01LSemiconductor devices4%
B29CShaping or joining of plastics3%
B29LIndexing scheme associated with subclass b29c, relating to particular articles3%
PatentTitleYear
11,066,531Surface treatment liquid and hydrophilic treatment method202111,041,086Hydrophilic treatment method and surface treatment liquid202110,751,672Gas-permeable membrane202010,400,078Surface treatment liquid201910,336,976Photosensitive resin composition for forming cell culture substrate201910,137,665Method for manufacturing laminate, and laminate20189,834,696Undercoat agent and method of forming pattern of layer containing block copolymer20179,810,986'Method for producing a fiber having a pattern on a surface thereof'20179,810,985'Method for producing a fiber having a pattern on the surface thereof'20179,676,934'Block copolymer-containing composition and method of reducing pattern'20179,134,617'Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer'20159,060,415'Method for producing substrate having surface nanostructure'20159,051,648'Substrate provided with metal nanostructure on surface thereof and method of producing the same'20159,029,073'Undercoat agent, and pattern formation method for layer containing block copolymer'20159,029,262'Method of forming contact hole pattern'20158,999,631'Primer and pattern forming method for layer including block copolymer'20158,961,802'Method of forming fine pattern, and developer'20158,956,810'Primer and pattern forming method for layer including block copolymer'20158,617,795'Photosensitive resin composition and pattern forming method using the same'20138,507,180'Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern'20138,455,058'Resin composition and coating method using the same'20138,288,078'Photosensitive resin composition, and pattern formation method using the same'20128,187,408'Method of forming precision microspace, process for manufacturing member with precision microspace, and photosensitive laminated film'20127,977,030'Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2021Patents assigned to TOKYO OHKA KOGYO CO LTD (23)· patent assignee history
2011Based in Kawsaki, JP· patent location history
2012–2015Patents assigned to SENZAKI TAKAHIRO (9)· patent assignee history
2012–2013Patents assigned to MISUMI KOICHI (4)· patent assignee history
2012–2021Based in Kanagawa, JP· patent location history
2013–2020Based in Kawasaki, JP· patent location history
2015Patents assigned to RIKEN (6)· patent assignee history
2015Patents assigned to FUJIKAWA SHIGENORI (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 23 | 2011–2021 |
| SENZAKI TAKAHIROself | 9 | 2012–2015 |
| RIKEN | 6 | 2015 |
| FUJIKAWA SHIGENORI | 4 | 2015 |
| MISUMI KOICHI | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 18 | 2013–2020 |
| Kanagawa, JP | 5 | 2012–2021 |
| Kawsaki, JP | 1 | 2011 |