LexDanaLexDanabeta
Inventor

Nobutaka Magome

Inventor
Kawasaki, JP

Overview

74→
Patents
1986–2019
Patent span
Physics
Primary field (CPC G)

Patents· 74 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices61%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G01BMeasuring length, thickness or similar linear dimensions4%
B82YSpecific uses or applications of nanostructures3%
G03HHolographic processes or apparatus3%
H01LSemiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
G01MTesting static or dynamic balance of machines or structures2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
10,461,039Mark, method for forming same, and exposure apparatus201910,236,259Mark, method for forming same, and exposure apparatus201910,185,232Exposure apparatus, method for producing device, and method for controlling exposure apparatus20199,941,217Mark, method for forming same, and exposure apparatus20189,846,371Exposure method, substrate stage, exposure apparatus, and device manufacturing method20179,760,026'Exposure apparatus, method for producing device, and method for controlling exposure apparatus'20179,494,871'Exposure apparatus, method for producing device, and method for controlling exposure apparatus'20169,268,237'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20169,235,139'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20169,019,467'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20158,749,757'Exposure apparatus, method for producing device, and method for controlling exposure apparatus'20148,451,424'Exposure apparatus, method for producing device, and method for controlling exposure apparatus'20138,384,880'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20138,208,117'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20128,040,491'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20118,034,539'Exposure apparatus and method for producing device'20117,911,582'Exposure apparatus and device manufacturing method'20117,515,246'Exposure apparatus, exposure method, and method for producing device'20097,505,115'Exposure apparatus, method for producing device, and method for controlling exposure apparatus'20097,483,119'Exposure method, substrate stage, exposure apparatus, and device manufacturing method'20097,466,392'Exposure apparatus, exposure method, and method for producing device'20087,460,207'Exposure apparatus and method for producing device'20087,436,487'Exposure apparatus and method for producing device'20087,379,158'Exposure apparatus and method for producing device'20086,876,946'Alignment method and apparatus therefor'20056,798,516'Projection exposure apparatus having compact substrate stage'20046,677,088'Photomask producing method and apparatus and device manufacturing method'20046,650,421'Method and apparatus for inspecting optical device'20036,583,853'Method of measuring exposure condition in projection exposure apparatus'20036,538,740'Adjusting method for position detecting apparatus'20036,356,343'Mark for position detection and mark detecting method and apparatus'20026,319,641'Scanning exposure method utilizing alignment marks based on scanning direction'20016,320,195'Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the device'20016,284,416'Photo mask and exposure method using same'20016,278,957'Alignment method and apparatus therefor'20016,265,119'Method for producing semiconductor devices'20016,221,540'Photomask and projection exposure apparatus'20016,160,619'Projection exposure apparatus having compact substrate stage'20006,141,107'Apparatus for detecting a position of an optical mark'20006,132,908'Photo mask and exposure method using the same'20006,124,933'Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus'20006,118,516'Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns'20006,078,380'Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure'20005,981,117'Scanning exposure method utilizing identical scan direction across multiple mask pattern layers'19995,966,201'Mark for position detection, and mark detecting method and apparatus'19995,907,405'Alignment method and exposure system'19995,805,866'Alignment method'19985,801,835'Surface position detection apparatus and method'19985,774,240'Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques'19985,754,300'Alignment method and apparatus'19985,734,478'Projection exposure apparatus'19985,689,339'Alignment apparatus'19975,587,794'Surface position detection apparatus'19965,576,829'Method and apparatus for inspecting a phase-shifted mask'19965,528,390'Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques'19965,521,036'Positioning method and apparatus'19965,504,596'Exposure method and apparatus using holographic techniques'19965,489,986'Position detecting apparatus'19965,483,311'Projection exposure apparatus'19965,402,224'Distortion inspecting method for projection optical system'19955,355,223'Apparatus for detecting a surface position'19945,347,356'Substrate aligning device using interference light generated by two beams irradiating diffraction grating'19945,343,270'Projection exposure apparatus'19945,289,231'Apparatus for manufacturing disc medium'19945,171,999'Adjustable beam and interference fringe position'19925,160,849'Diffraction-type displacement detector for alignment of mask and wafer'19925,151,750'Alignment apparatus'1992RE034010'Position detection apparatus'19925,118,953'Substrate alignment apparatus using diffracted and reflected radiation beams'19925,070,250'Position detection apparatus with adjustable beam and interference fringe positions'19915,004,348'Alignment device'19914,739,373'Projection exposure apparatus'19884,710,026'Position detection apparatus'19874,632,531'Focusing screen'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–2017Patents assigned to NIPPON KOGAKU KK (5)· patent assignee history
1986–2005Based in Kawasaki, JP· patent location history
1991–2019Patents assigned to NIKON CORP (67)· patent assignee history
1994–2003Based in Kanagawa, JP· patent location history
2000–2004Based in Tokyo, JP· patent location history
2004Based in Saitama, JP· patent location history
2008–2019Based in Kumagaya, JP· patent location history
2012–2013Patents assigned to MAGOME NOBUTAKA (3)· patent assignee history
2012–2013Patents assigned to TAKAIWA HIROAKI (3)· patent assignee history
2012–2013Patents assigned to HIRUKAWA SHIGERU (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP671991–2019
NIPPON KOGAKU KK51986–2017
MAGOME NOBUTAKAself32012–2013
TAKAIWA HIROAKI32012–2013
HIRUKAWA SHIGERU22012–2013
Locations
LocationPatentsSpan
Kawasaki, JP291986–2005
Kumagaya, JP242008–2019
Kanagawa, JP141994–2003
Tokyo, JP32000–2004
Saitama, JP12004