An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Claims

26 · 1 independent · depth 4

26 granted claims

›1.independentAn exposure method that exposes a substrate through a projection optical system and an immersion region formed with a liquid below the projection opti…+25

›2.↳ 1The exposure method according to claim 1, further comprising sucking a gas within a third space between the first peripheral wall and the second perip…d2+2

›5.↳ 1The exposure method according to claim 1, further comprising supplying a gas to a third space between the first peripheral wall and the second periphe…d2+3

›9.↳ 1The exposure method according to claim 1, wherein a third space between the first peripheral wall and the second peripheral wall is open to atmosphere…d2+2

›12.↳ 1The exposure method according to claim 1, further comprising controlling a pressure in a third space between the first peripheral wall and the second …d2

›13.↳ 1The exposure method according to claim 1, wherein a height of a top surface of the second peripheral wall is not higher than a height of a top surface…d2+1

›15.↳ 1The exposure method according to claim 1, further comprising recovering a liquid within a third space between the first peripheral wall and the second…d2

›16.↳ 1The exposure method according to claim 1, wherein the first flow channel is connected to the second space such that the liquid which flowed into the s…d2

›17.↳ 1The exposure method according to claim 1, whereinnthe second space is located between the first peripheral wall and a side surface portion provided ar…d2+3

›21.↳ 1The exposure method according to claim 1, further comprising sucking a gas within the first space via a gas flow channel connected to the first space …d2+2

›24.↳ 1The exposure method according to claim 1, wherein a height of a top surface of the stage is provided so as to be substantially the same as a height of…d2+1

›26.↳ 1A device fabricating method comprising:nexposing a pattern onto a substrate using the exposure method according to claim 1; andassembling a device on …d2

Classifications

7 codes

IPC · International Patent Classification

Section G — Physics

G03B27/54
G03F7/20
G03B27/60
G03B27/32
G03B27/42
G03B27/52
G03B27/58

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Pendency

2.9 y

1,077 days filing → grant

Office actions

non-final + final

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1 RCE

Examiner

Christina Riddle

art unit 2882 · TC 2800

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1 priority documents

›Priority documents — 1

Type	Document	Date
related publication	US 20130141703 A1	6 Jun 2013

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