Inventor

Marc Antonius Maria Haast

Inventor
Eindhoven, NL

Overview

10→
Patents
2006–2014
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
G02BOptical elements, systems or apparatus16%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2014Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2006–2014Based in Eindhoven, NL· patent location history
2012–2014Patents assigned to HAAST MARC ANTONIUS MARIA (4)· patent assignee history
2012–2014Patents assigned to MOEST BEARRACH (3)· patent assignee history
2012–2013Patents assigned to BAAS GERARDUS WILHELMUS PETRUS (2)· patent assignee history
2012–2013Patents assigned to GOMMEREN GREGORY MICHA (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV92006–2014
HAAST MARC ANTONIUS MARIAself42012–2014
MOEST BEARRACH32012–2014
BAAS GERARDUS WILHELMUS PETRUS22012–2013
GOMMEREN GREGORY MICHA22012–2013
Locations
LocationPatentsSpan
Eindhoven, NL102006–2014