Inventor
ANTHONY CHIH-TUNG CHAN
Inventor
US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H01JElectric discharge tubes or discharge lamps27%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H01FMagnets5%
LOC155%
PatentTitleYear
12,322,573Pulsing plasma treatment for film densification202512,136,544Etch uniformity improvement for single turn internal coil PVD chamber202412,112,890Top magnets for decreased non-uniformity in PVD202411,846,013Methods and apparatus for extended chamber for through silicon via deposition202311,581,166Low profile deposition ring for enhanced life202311,295,938Multi-radius magnetron for physical vapor deposition (PVD) and methods of use thereof2022D0933726Deposition ring for a semiconductor processing chamber2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 7 | 2021–2025 |