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Inventor

Shouichi Sasaki

Inventor
Ibaraki, JP

Overview

5→
Patents
2000–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions19%
C09KMaterials for miscellaneous applications, not provided for elsewhere19%
C23FNon-mechanical removal of metallic material from surface19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%
C08LCompositions of macromolecular compounds6%
H01GCapacitors6%
PatentTitleYear
8,481,428'Polishing slurry and polishing method'20138,084,362'Polishing slurry and polishing method'20118,084,363'Polishing slurry and polishing method'20117,994,058'Polishing slurry and polishing method'20116,042,740'Composition for forming electrolyte for solid electrolytic capacitor and solid electrolytic capacitor'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2013Patents assigned to HITACHI CHEMICAL CO LTD (4)· patent assignee history
2000–2013Based in Hitachi, JP· patent location history
2011–2013Patents assigned to AMANOKURA JIN (3)· patent assignee history
2011–2013Patents assigned to ANZAI SOU (3)· patent assignee history
2011–2013Patents assigned to FUKASAWA MASATO (3)· patent assignee history
2011–2013Patents assigned to SAKURADA TAKAFUMI (3)· patent assignee history
2011Based in Ibaraki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD42000–2013
AMANOKURA JIN32011–2013
ANZAI SOU32011–2013
FUKASAWA MASATO32011–2013
SAKURADA TAKAFUMI32011–2013
Locations
LocationPatentsSpan
Ibaraki, JP32011
Hitachi, JP22000–2013