Inventor

Yoshifumi Watabe

Inventor
Tondabayashi, JP

Overview

25→
Patents
1993–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
B82YSpecific uses or applications of nanostructures19%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general6%
C25DProcesses for the electrolytic or electrophoretic production of coatings4%
G08BSignalling systems, e.g. personal calling systems4%
H04RLoudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C25FProcesses for the electrolytic removal of materials from objects2%
PatentTitleYear
10,948,406Moisture amount detection device20219,528,879'Infrared detection element, infrared detector, and infrared type gas sensor'20169,494,467'Infrared detection element, infrared detector, and infrared type gas sensor'20169,105,368'Infrared radiation element'20158,519,854'Fire alarm system'20138,254,209'Acoustic wave sensor'20128,253,578'Smoke sensor of the sound wave type including a smoke density estimation unit'20127,881,157'Pressure wave generator and production method therefor'20117,709,795'Infrared sensor unit and process of fabricating the same'20107,569,124'Anodic oxidation apparatus'20097,474,590'Pressure wave generator and process for manufacturing the same'20096,844,664'Field emission electron source and production method thereof'20056,815,315'Method for electrochemical oxidation'20046,794,805'Field emission electron source, method of producing the same, and use of the same'20046,784,621'Field emission-type electron source and method of biasing the same'20046,765,342'Field emission-type electron source and manufacturing method thereof'20046,753,196'Method of and apparatus for manufacturing field emission-type electron source'20046,720,717'Field emission-type electron source'20046,707,061'Field emission type electron source'20046,583,578'Field emission-type electron source and manufacturing method thereof'20036,498,426'Field emission-type electron source and manufacturing method thereof'20026,285,118'Field emission-type electron source and manufacturing method thereof and display using the electron source'20016,236,046'Infrared sensor'20015,273,640'Electrochemical gas sensor'19935,215,643'Electrochemical gas sensor'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2005Patents assigned to MATSUSHITA ELECTRIC WORKS LTD (14)· patent assignee history
1993–2009Based in Kadoma, JP· patent location history
2001–2013Based in Tondabayashi, JP· patent location history
2004–2021Based in Osaka, JP· patent location history
2009–2011Patents assigned to PANASONIC ELEC WORKS CO LTD (3)· patent assignee history
2012–2013Patents assigned to HONDA YOSHIAKI (3)· patent assignee history
2012–2013Patents assigned to PANASONIC CORP (3)· patent assignee history
2015–2021Patents assigned to PANASONIC IP MAN CO LTD (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC WORKS LTD141993–2005
HONDA YOSHIAKI32012–2013
PANASONIC CORP32012–2013
PANASONIC ELEC WORKS CO LTD32009–2011
PANASONIC IP MAN CO LTD32015–2021
Locations
LocationPatentsSpan
Tondabayashi, JP172001–2013
Osaka, JP52004–2021
Kadoma, JP31993–2009