Inventor
Boris Bittner
Inventor
Roth, DE
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
G02BOptical elements, systems or apparatus22%
G21KHandling of particles or ionising radiation not otherwise provided for9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B82YSpecific uses or applications of nanostructures4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
G06FElectric digital data processing1%
Y10TTechnical subjects covered by former us classification1%
PatentTitleYear
11,112,543Optical element having a coating for influencing heating radiation and optical arrangement202110,754,132Imaging optical system for microlithography202010,474,036Optical element and optical arrangement therewith201910,401,540Optical element having a coating for influencing heating radiation and optical arrangement201910,303,063Projection exposure apparatus with at least one manipulator201910,261,425Projection exposure apparatus with a highly flexible manipulator201910,151,922Wavefront correction element for use in an optical system201810,061,206Projection lens with wave front manipulator and related method and apparatus201810,054,860Projection exposure apparatus with optimized adjustment possibility201810,042,265Lithographic projection objective201810,018,907Method of operating a microlithographic projection apparatus201810,001,631Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element20189,939,730Optical assembly20189,927,714'Projection exposure apparatus with at least one manipulator'20189,910,364'Projection exposure apparatus including at least one mirror'20189,846,367Projection exposure apparatus with at least one manipulator20179,829,800System correction from long timescales20179,817,316'Projection exposure method and projection exposure apparatus for microlithography'20179,760,019'Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus'20179,709,770'Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus'20179,606,446'Reflective optical element for EUV lithography and method of manufacturing a reflective optical element'20179,494,868'Lithographic projection objective'20169,470,872'Reflective optical element'20169,423,696'Projection exposure apparatus with optimized adjustment possibility'20169,377,694'Projection arrangement'20169,372,411'Projection objective of a microlithographic projection exposure apparatus'20169,354,524'Projection exposure apparatus with optimized adjustment possibility'20169,348,234'Microlithographic apparatus'20169,235,143'Microlithographic projection exposure apparatus'20169,170,497'Projection exposure apparatus with at least one manipulator'20159,164,402'Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus'20159,134,613'Illumination and displacement device for a projection exposure apparatus'20159,052,609'Projection exposure apparatus with optimized adjustment possibility'20158,928,858'Projection exposure apparatus with optimized adjustment possibility'20158,659,744'Method for correcting a lithography projection objective, and such a projection objective'20148,605,253'Lithographic projection objective'20138,203,696'Projection exposure apparatus with optimized adjustment possibility'20128,174,676'Method for correcting a lithography projection objective, and such a projection objective'20127,990,622'Projection objective of a microlithographic projection exposure apparatus'20117,830,611'Projection objective of a microlithographic projection exposure apparatus'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2021Based in Roth, DE· patent location history
2011–2021Patents assigned to ZEISS CARL SMT GMBH (38)· patent assignee history
2012–2016Patents assigned to BITTNER BORIS (6)· patent assignee history
2012–2016Patents assigned to WABRA NORBERT (3)· patent assignee history
2012–2014Patents assigned to GRAESCHUS VOLKER (2)· patent assignee history
2012–2014Patents assigned to GRUNER TORALF (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 38 | 2011–2021 |
| BITTNER BORISself | 6 | 2012–2016 |
| WABRA NORBERT | 3 | 2012–2016 |
| GRAESCHUS VOLKER | 2 | 2012–2014 |
| GRUNER TORALF | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Roth, DE | 40 | 2010–2021 |