USPatentGranted
B2

Projection exposure apparatus with optimized adjustment possibility

Granted 6 Jan 2015 · 8 office actions

Current assignee: Carl Zeiss SMT GmbH · originally Carl-Zeiss-Stiftung

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Inventors: Matthias Roesch, Boris Bittner, Holger Walter · Examiner: Christina Riddle · AU 2882 · TC 2800

Life of the patent

4 dated events
⤢ drag to zoom2009201020112012201320142015Prosecution
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Abstract

A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.

Claims

64 · 3 independent · depth 5
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64 granted claims

Classifications

11 codes
IPC · International Patent Classification
Section G — Physics
  • G03B27/52
  • G03F7/20
  • G03B27/42
  • G03B27/68
  • G03B27/72
  • G03B27/54
USPC · US Patent Classification
355/55355/52355/71355/67355/53

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File wrapper

Pendency
2.8 y
1,020 days filing → grant
Office actions
4
non-final + final
Responses
4
2 RCE
Interviews
3
examiner interview summaries
Examiner
Christina Riddle
art unit 2882 · TC 2800
Citations: 119 back · 0 forward

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Priority chain

2 priority documents
Priority
25 Sep 2008
earliest claimed
›Priority documents — 2
TypeDocumentDate
provisionalUS 6109994825 Sep 2008
related publicationUS 20120188524 A126 Jul 2012

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Citations

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