Inventor
SIQING LU
Inventor
US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices22%
C23CCoating metallic material13%
LOC134%
PatentTitleYear
12,400,833Methods and apparatus for processing a substrate202512,106,945Plasma processing apparatus and method of manufacturing semiconductor device using the same202412,100,579Deposition ring for thin substrate handling via edge clamping2024D1038049Cover ring for use in semiconductor processing chamber202411,996,315Thin substrate handling via edge clamping202411,881,375Common substrate and shadow ring lift apparatus202411,728,198Electrostatic chuck and wafer etching device including the same202311,538,697Substrate processing apparatus202211,244,839Plasma processing apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2022–2024Based in KR· patent location history
2024–2025Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history
2024–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 5 | 2024–2025 |
| SAMSUNG ELECTRONICS CO LTD | 4 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2024–2025 |
| KR | 4 | 2022–2024 |