Inventor

Sou Anzai

Inventor

Hitachi, JP

Overview

2010–2017

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary

C09GPolishing compositions21%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%

C09KMaterials for miscellaneous applications, not provided for elsewhere18%

C23FNon-mechanical removal of metallic material from surface15%

H01LSemiconductor devices9%

B24BMachines, devices, or processes for grinding or polishing6%

C11DDetergent compositions3%

H05KPrinted circuits3%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2010–2017Patents assigned to HITACHI CHEMICAL CO LTD (7)· patent assignee history

2010–2017Based in Hitachi, JP· patent location history

2011–2017Patents assigned to ANZAI SOU (6)· patent assignee history

2011–2017Patents assigned to AMANOKURA JIN (5)· patent assignee history

2011–2014Patents assigned to SAKURADA TAKAFUMI (5)· patent assignee history

2011–2013Patents assigned to FUKASAWA MASATO (3)· patent assignee history

2011Based in Ibaraki, JP· patent location history

2014Based in Mito, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations