Inventor
Eisuke Morisaki
Inventor
Nishikamo-gun, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
C23CCoating metallic material22%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light17%
C30BSingle-crystal growth11%
H10DInorganic electric semiconductor devices11%
H05BElectric heating6%
LOC136%
PatentTitleYear
D0766850'Wafer holder for manufacturing semiconductor'20168,696,814'Film deposition apparatus and film deposition method'20148,440,270'Film deposition apparatus and method'20138,409,460'Forming method of amorphous carbon film, amorphous carbon film, multilayer resist film, manufacturing method of semiconductor device, and computer-readable storage medium'20138,328,943'Film forming apparatus and method'20126,630,991'Thermal processing apparatus'20036,488,407'Radiation temperature measuring method and radiation temperature measuring system'20026,473,993'Thermal treatment method and apparatus'20026,467,952'Virtual blackbody radiation system and radiation temperature measuring system'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2016Patents assigned to TOKYO ELECTRON LTD (9)· patent assignee history
2002–2003Based in Kanagawa, JP· patent location history
2002Based in Sagamihara, JP· patent location history
2012–2014Patents assigned to MORISAKI EISUKE (4)· patent assignee history
2012–2014Patents assigned to KOBAYASHI HIROKATSU (3)· patent assignee history
2012–2014Based in Nishikamo-gun, JP· patent location history
2013–2014Patents assigned to YOSHIKAWA JUN (2)· patent assignee history
2013Based in Shiroyama, JP· patent location history
2014Patents assigned to AKETA MASATOSHI (1)· patent assignee history
2016Based in Nirasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 9 | 2002–2016 |
| MORISAKI EISUKEself | 4 | 2012–2014 |
| KOBAYASHI HIROKATSU | 3 | 2012–2014 |
| YOSHIKAWA JUN | 2 | 2013–2014 |
| AKETA MASATOSHI | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nishikamo-gun, JP | 2 | 2012–2014 |
| Kanagawa, JP | 2 | 2002–2003 |
| Sagamihara, JP | 2 | 2002 |
| Nirasaki, JP | 1 | 2016 |
| Shiroyama, JP | 1 | 2013 |