Inventor
Yukio Inazuki
Inventor
Joetsu-shi, JP
Overview
Patents· 92 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
C23CCoating metallic material8%
Y10TTechnical subjects covered by former us classification7%
H01JElectric discharge tubes or discharge lamps2%
H01LSemiconductor devices2%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
C01BNon-metallic elements2%
C03CChemical composition of glasses, glazes or vitreous enamels2%
C22CAlloys2%
PatentTitleYear
11,131,920Photomask blank, and method of manufacturing photomask202110,989,999Halftone phase shift mask blank and halftone phase shift mask202110,859,904Halftone phase shift photomask blank, making method, and halftone phase shift photomask202010,809,611Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus202010,788,747Photomask blank and method for producing photomask202010,782,609Photomask blank and photomask202010,782,608Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium target202010,747,098Halftone phase shift photomask blank202010,712,654Photomask blank202010,678,125Photomask blank and method for preparing photomask202010,670,957Halftone phase shift photomask blank, making method, and halftone phase shift photomask202010,656,516Photomask blank, and preparation method thereof202010,585,345Photomask blank, method for manufacturing photomask, and mask pattern formation method202010,564,537Photomask blank, and preparation method thereof202010,545,401Phase shift mask blank, phase shift mask, and blank preparing method202010,488,750Mask blank and making method201910,466,583Halftone phase shift mask blank and halftone phase shift mask201910,466,582Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus201910,459,333Halftone phase shift photomask blank and making method201910,372,030Halftone phase shift mask blank and halftone phase shift mask201910,146,122Halftone phase shift photomask blank and making method201810,120,274Method of manufacturing photomask blank and photomask blank201810,078,260Phase shift mask blank, phase shift mask, and blank preparing method20189,927,695'Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method'20189,880,459'Photomask blank and method for preparing photomask'20189,864,266'Photomask blank'20189,812,300'Silicon target for sputtering film formation and method for forming silicon-containing thin film'20179,798,229'Designing of photomask blank and photomask blank'20179,778,559'Method for preparing halftone phase shift photomask blank'20179,709,885'Photomask blank and method for manufacturing photomask blank'20179,689,066'Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method'20179,651,858'Binary photomask blank, preparation thereof, and preparation of binary photomask'20179,645,485'Halftone phase shift photomask blank and making method'20179,618,838'Photomask blank'20179,581,892'Method of manufacturing photomask blank and photomask blank'20179,541,823'Photomask blank'20179,488,907'Photomask blank, process for production of photomask, and chromium-containing material film'20169,488,906'Photomask blank and method for manufacturing photomask blank'20169,400,422'Method for manufacturing photomask blank'20169,366,951'Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method'20169,164,374'Photomask making method, photomask blank and dry etching method'20159,091,931'Photomask blank and method for manufacturing photomask'20158,992,788'Evaluation of etching conditions for pattern-forming film'20158,980,503'Binary photomask blank and binary photomask making method'20158,968,972'Photomask blank, process for production of photomask, and chromium-containing material film'20158,920,666'Etching method and photomask blank processing method'20148,841,048'Photomask blank, photomask, and making method'20148,753,787'Light pattern exposure method, photomask, and photomask blank'20148,753,786'Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank'20148,709,686'Photomask blank, process for production of photomask, and chromium-containing material film'20148,475,978'Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film'20138,417,018'Method for inspecting and judging photomask blank or intermediate thereof'20138,309,277'Photomask making method'20128,304,146'Photomask making method, photomask blank and dry etching method'20128,168,351'Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank'20128,148,036'Photomask blank and photomask'20128,012,654'Photomask blank and photomask'20118,007,964'Photomask blank and photomask'20118,003,284'Photomask blank and photomask'20117,989,124'Photomask blank and photomask making method'20117,790,339'Photomask blank'20107,767,367'Photomask blank and photomask making method'20107,767,366'Photomask blank and photomask'20107,736,824'Photomask blank, photomask, and method of manufacture'20107,691,546'Photomask blank and photomask'20107,632,609'Fabrication method of photomask-blank'20097,625,677'Half-tone stacked film, photomask-blank, photomask and fabrication method thereof'20097,625,676'Photomask blank, photomask and fabrication method thereof'20097,622,227'Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof'20097,618,753'Photomask blank, photomask and method for producing those'20097,598,004'Film-depositing target and preparation of phase shift mask blank'20097,556,892'Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method'20097,419,749'Halftone phase shift mask blank, halftone phase shift mask and their preparation'20087,351,505'Phase shift mask blank, phase shift mask, and pattern transfer method'20087,344,806'Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask'20087,329,474'Photomask blank, photomask, and method of manufacture'20087,195,846'Methods of manufacturing photomask blank and photomask'20077,179,567'Phase shift mask blank, phase shift mask, and method of manufacture'20077,037,625'Phase shift mask blank and method of manufacture'20066,733,930'Photomask blank, photomask and method of manufacture'20046,727,027'Photomask blank and photomask'20046,641,958'Phase shift mask blank, phase shift mask, and methods of manufacture'20036,589,699'Photomask blank and photomask'20036,514,642'Phase shift mask and method of manufacture'20036,503,668'Phase shift mask blank, phase shift mask, and method of manufacture'20036,503,669'Photomask blank, photomask and method of manufacture'20036,362,076'Method of fabricating an SOI wafer by hydrogen ion delamination without independent bonding heat treatment'20026,352,801'Phase shift mask and making process'20026,140,210'Method of fabricating an SOI wafer and SOI wafer fabricated thereby'20005,180,554'Method of detecting the presence of moisture in a gas'19935,007,243'Vessel for making high-purity fine particles of active metals'19914,971,258'Method of making high-purity fine particles of reactive metals and manufacturing vessel therefor'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–1993Based in Sayama, JP· patent location history
2002–2021Patents assigned to SHINETSU CHEMICAL CO (85)· patent assignee history
2002–2007Based in Nishikamo-gun, JP· patent location history
2003–2018Based in Niigata, JP· patent location history
2008–2015Patents assigned to TOPPAN PRINTING CO LTD (18)· patent assignee history
2008–2021Based in Joetsu-shi, JP· patent location history
2012–2015Patents assigned to INAZUKI YUKIO (11)· patent assignee history
2012–2015Patents assigned to YOSHIKAWA HIROKI (10)· patent assignee history
2012–2015Patents assigned to KANEKO HIDEO (8)· patent assignee history
2016–2017Based in Jyoetsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 85 | 2002–2021 |
| TOPPAN PRINTING CO LTD | 18 | 2008–2015 |
| INAZUKI YUKIOself | 11 | 2012–2015 |
| YOSHIKAWA HIROKI | 10 | 2012–2015 |
| KANEKO HIDEO | 8 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 58 | 2008–2021 |
| Niigata, JP | 19 | 2003–2018 |
| Nishikamo-gun, JP | 5 | 2002–2007 |
| Jyoetsu, JP | 3 | 2016–2017 |
| Sayama, JP | 3 | 1990–1993 |