Inventor

Ganming Qin

Inventor
Chandler, AZ, US

Overview

24→
Patents
2002–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices42%
H01LSemiconductor devices35%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G06FElectric digital data processing2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
10,811,502Method of manufacture of super-junction power semiconductor device202010,672,902Bidirectional power MOSFET structure with a cathode short structure202010,644,146Vertical bi-directional switches and method for making same202010,431,678Termination design for trench superjunction power MOSFET201910,297,684Bidirectional power MOSFET structure with a cathode short structure201910,153,357Superjunction power semiconductor device and method for forming201810,103,257Termination design for trench superjunction power MOSFET201810,074,743Trench MOSFET shield poly contact20189,680,003'Trench MOSFET shield poly contact'20179,553,184'Edge termination for trench gate FET'20179,515,178'Shielded trench semiconductor devices and related fabrication methods'20169,419,128'Bidirectional trench FET with gate-based resurf'20169,397,213'Trench gate FET with self-aligned source contact'20169,368,620'Trench gate FET with self-aligned source contact'20169,362,394'Power device termination structures and methods'20169,324,800'Bidirectional MOSFET with suppressed bipolar snapback and method of manufacture'20169,293,535'Power MOSFET current sense structure and method'20169,178,027'Bidirectional trench FET with gate-based resurf'20158,895,394'Trench FET with source recess etch'20148,143,126'Method for forming a vertical MOS transistor'20128,030,153'High voltage TMOS semiconductor device with low gate charge structure and method of making'20117,602,014'Superjunction power MOSFET'20097,378,317'Superjunction power MOSFET'20086,424,083'Field emission device having an improved ballast resistor'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2020Based in Chandler, AZ, US· patent location history
2008–2017Patents assigned to FREESCALE SEMICONDUCTOR INC (14)· patent assignee history
2012–2016Patents assigned to QIN GANMING (6)· patent assignee history
2012–2016Patents assigned to KU PON SUNG (5)· patent assignee history
2012–2016Patents assigned to DE FRESART EDOUARD D (3)· patent assignee history
2017–2020Patents assigned to NXP USA INC (10)· patent assignee history
2018–2019Based in Austin, TX, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FREESCALE SEMICONDUCTOR INC142008–2017
NXP USA INC102017–2020
QIN GANMINGself62012–2016
KU PON SUNG52012–2016
DE FRESART EDOUARD D32012–2016
Locations
LocationPatentsSpan
Chandler, AZ, US222002–2020
Austin, Texas, US22018–2019