USPatentGranted
I4

Scanning optical system adapted for linewidth measurement in semiconductor devices

Granted 3 Aug 1982 · no office action yet

Assignee: Kirk Joseph P

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Inventors: Josef Predatsch, Lo-Soun Su, Joseph P. Kirk · Examiner: · AU 257 · TC 2500

Application
173535
filed 30 Jul 1980
Publication
Not published
not published
Patent· this page
US T102104
granted 3 Aug 1982

Life of the patent

3 dated events
⤢ drag to zoom19801982198419861988199019921994199619982000ProsecutionTerm & fees
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Abstract

The present invention is directed to an optical system particularly adapted for measuring the linewidth of conductors. The particular arrangement of the various components of the optical system provide a simple system with high resolution for use in measuring very small linewidths. The optical system of the present invention utilizes a DC signal which is simpler and easier to control than an AC signal used with some optical measurement systems. More particularly, the optical system of the present invention utilizes a principle used for accurate focusing or for topographical measurements to enhance the ability of the optical system to measure small linewidths. The optical system of the claimed invention includes a high intensity light source 18, such as a laser. Means are provided for defining and focusing a spot of the light source upon a surface 12 having features to be measured. The spot defining and focusing means include in sequence between the light source and the surface, a first lens 24, an aperture 26 and a second lens 32. The arrangement of the first and second lenses and the aperture is such that the light source is focused at the aperture by the first lens to provide a spot and the spot is focused on the surface 12 by the second lens. With this arrangement, the surface is located at the focal point of the second lens so that reflected light is refocused back in the plane of the aperture. The system further includes scanning means for selectively moving the spot across the surface to encounter the features to be measured. Light collection means 60, 62 are positioned proximate to the surface for detecting varying levels of light reflected from the surface as the spot is scanned over the edges of the features of interest. An electrical DC output is produced in response to the scanning. Means are provided for analyzing the output of the light sensitive means for providing high accuracy measurements of the distance between the detected edges of the features scanned by the spot.

Classifications

5 codes
IPC · International Patent Classification
Section G — Physics
  • G01B11/02
  • G01B11/30
  • G01B11/00
USPC · US Patent Classification
356/387356/371

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Pendency
2.0 y
734 days filing → grant
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0
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Worldwide family

6 members · 4 offices
US1EP3JP1DE1
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
6
DOCDB simple family 25522294
Offices
4
US · EP · JP
Granted
3 of 6
grant date present
Non-English titles
2
shown as filed, never translated
›IP5 & PCT — 5 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-T102104-I4I43 Aug 198230 Jul 1980grantedScanning optical system adapted for linewidth measurement in semiconductor devices
EPEP-0013325-A2A223 Jul 198027 Nov 1979publishedOptische Messeinrichtung zur Bestimmung des Abstands zwischen kantenförmigen Strukturen auf Oberflächende
EPEP-0013325-A3A36 Aug 198027 Nov 1979publishedMeasuring device with optical scanning
EPEP-0013325-B1B13 Mar 198227 Nov 1979grantedDispositif de mesure optique pour la détermination de l'écart existant entre des arètes disposées sur des surfacesfr
JPJP-S5587904-AA3 Jul 198019 Oct 1979publishedScanning type optical apparatus for micromeasurement
›Other offices — 1 members
OfficePublicationKindPublishedFiledStatusTitle
DEDE-2962243-D1D11 Apr 198227 Nov 1979grantedOptical measuring arrangement for determining the distance between edge shaped structures on surfaces

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