USPatentGranted
S1

Ceiling heater for substrate processing apparatus

Granted 7 Mar 2023 · no office action yet

Application
29/773,972
filed 12 Mar 2021
Publication
Not published
not published
Patent· this page
US D980177
granted 7 Mar 2023

Life of the patent

2 dated events
⤢ drag to zoomApr 2021Jul 2021Oct 2021Jan 2022Apr 2022Jul 2022Oct 2022Jan 2023Apr 2023Prosecution
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Description

1 parts
›FIG. 1 is a front, top and right…

FIG. 1 is a front, top and right side perspective view of a ceiling heater for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a rear elevational view.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

Pendency
2.0 y
725 days filing → grant
Office actions
0
none on record
Examiner
Barbara Fox
art unit 2914 · TC 2900
Citations: 26 back · 0 forward

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Chain of title

⤢ drag to zoom20222024202620282030203220342036203820402042Owner 1
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Worldwide family

3 members · 3 offices
US1JP1TW1
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
3
DOCDB simple family 75802242
Offices
3
US · JP
Granted
2 of 3
grant date present
Non-English titles
2
shown as filed, never translated
›IP5 & PCT — 2 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D980177-SS17 Mar 202312 Mar 2021grantedCeiling heater for substrate processing apparatus
JPJP-1684468-SS10 May 202124 Sep 2020granted基板処理装置用天井ヒータja
›Other offices — 1 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D217779-SS21 Mar 20229 Mar 2021published基板處理裝置用置頂式加熱器zh

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Citations

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