Process shield for a substrate processing chamber
Granted 18 Jan 2022 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Inventors: Ilya Lavitsky, Keith A Miller, Goichi Yoshidome · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the patent
2 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to the first embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a left side elevation view thereof.
FIG. 5 is a right side elevation view thereof.
FIG. 6 is a rear elevation view thereof.
FIG. 7 is a front elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8 - 8 ′ of FIG. 2 .
FIG. 9 is a top isometric view of a process shield for a substrate processing chamber, according to the second embodiment of the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a left side elevation view thereof.
FIG. 13 is a right side elevation view thereof.
FIG. 14 is a rear elevation view thereof.
FIG. 15 is a front elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16 - 16 ′ of FIG. 10 .
The dashed lines in FIGS. 1-16 represent unclaimed environment forming no part of the claimed design.
Claims
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5 members · 3 offices›IP5 & PCT — 3 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D941371-S | S1 | 18 Jan 2022 | 20 Mar 2020 | granted | Process shield for a substrate processing chamber |
| JP | JP-1696666-S | S | 11 Oct 2021 | 14 Sep 2020 | granted | no title held |
| JP | JP-1696763-S | S | 11 Oct 2021 | 14 Sep 2020 | granted | no title held |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D215400-S | S | 21 Nov 2021 | 18 Sep 2020 | published | 基板處理腔室的製程護罩zh |
| TW | TW-D215401-S | S | 21 Nov 2021 | 18 Sep 2020 | published | 基板處理腔室的製程護罩zh |
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