Target profile for a physical vapor deposition chamber target
Granted 25 Aug 2020 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: William Johanson, Siew Kit Hoi, Kirankumar Savandaiah, Prashant Prabhakar Prabhu +1 · Examiner: Susan Bennett Hattan · AU 2922 · TC 2900
Life of the patent
5 dated eventsDescription
1 parts›FIG. 1 is a top perspective view of…
FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, according to the new design.
FIG. 2 is a bottom perspective view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a right side elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a front elevation view thereof.
FIG. 8 is a back elevation view thereof; and,
FIG. 9 is an enlarged cross sectional view taken along line 9 - 9 in FIG. 4 .
Dashed lines in FIGS. 1-9 represent features of the target profile for a physical vapor deposition chamber target that form no part of the claimed design.
Claims
1 · 1 independent · depth 1Classifications
1 codesClaim changes
SoonSee which claims were amended, added or cancelled during examination, with every added and removed word marked.
The published claims of this patent are not paired with the granted ones in what we hold.
File wrapper
See the full prosecution history — every USPTO and applicant action on this file, in order.
Log in to unlockChain of title
See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.
Log in to unlockTerm & fees
See the term timeline — pendency span, in-force span, the maintenance fees paid and both computed expiry dates.
Log in to unlockValidity challenges
See the validity challenges on record — reexaminations, IPRs and PGRs, with their institution decisions and outcomes.
Log in to unlockCitations
See every patent this one cites and every patent that cites it back — publication, assignee, and how each one was found.
Log in to unlock