Top plate for reactor for manufacturing semiconductor
Granted 6 Mar 2012 · no office action yet
Assignee: Tokyo Electron Limited
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: Manabu Honma, Katsuyuki Hishiya · Examiner: Selina Sikder · AU 2912 · TC 2900
Life of the patent
2 dated eventsDescription
1 parts›FIG. 1 is front perspective view of a…
FIG. 1 is front perspective view of a top plate for reactor for manufacturing semiconductor illustrating our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom view thereof;
FIG. 8 is a reference front view indicating the plane upon which a sectional view is taken; and,
FIG. 9 is a sectional view taken along line 9 - 9 - 9 of FIG. 8 .
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2 members · 2 offices›IP5 & PCT — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D655257-S | S1 | 6 Mar 2012 | 13 Apr 2011 | granted | Top plate for reactor for manufacturing semiconductor |
›Other offices — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D146037-S | S | 21 Mar 2012 | 14 Apr 2011 | published | 半導體製造用反應爐之頂盤zh |
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