Target profile for a physical vapor deposition chamber target
Granted 26 Nov 2019 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Attorney: Attorney · Log in to unlock
Inventors: Fuhong Zhang, Martin Lee Riker, Zheng Wang · Examiner: Kevin K Rudzinski · AU 2923 · TC 2900
Life of the patent
6 dated eventsDescription
1 parts›FIG. 1 is a top perspective view of…
FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right side plan view thereof.
FIG. 5 is a left side plan view thereof.
FIG. 6 is a front view thereof.
FIG. 7 is a back view thereof; and,
FIG. 8 is an enlarged cross sectional view taken along line 8 - 8 in FIG. 2 .
Claims
1 · 1 independent · depth 1Classifications
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6 members · 3 offices›IP5 & PCT — 4 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D868124-S | S1 | 26 Nov 2019 | 11 Dec 2017 | granted | Target profile for a physical vapor deposition chamber target |
| US | US-D946638-S | S1 | 22 Mar 2022 | 25 Nov 2019 | granted | Target profile for a physical vapor deposition chamber target |
| JP | JP-1637543-S | S | 29 Jul 2019 | 8 Jun 2018 | granted | no title held |
| JP | JP-1651698-S | S | 27 Jan 2020 | 8 Jun 2018 | granted | no title held |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D197321-S | S | 1 May 2019 | 1 Jun 2018 | published | Target profile for a physical vapor deposition chamber target |
| TW | TW-D197322-S | S | 1 May 2019 | 1 Jun 2018 | published | Target profile for a physical vapor deposition chamber target |
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