Gas nozzle substrate processing apparatus
Granted 11 Apr 2017 · no office action yet
Current assignee: Kokusai Electric Co. Ltd. · originally Hitachi, Ltd.
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Attorney: Attorney · Log in to unlock
Inventors: Ryota Sasajima, Toshiki Fujino, Kosuke Takagi · Examiner: Robin V Webster · AU 2923 · TC 2900
Life of the patent
6 dated eventsDescription
1 parts›FIG. 1 is a perspective view of a…
FIG. 1 is a perspective view of a gas nozzle substrate processing apparatus showing my new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a right side elevational view thereof;
FIG. 8 is an enlarged right side elevational view thereof; and
FIG. 9 is an enlarged portion view taken along line 9 - 9 in FIG. 2 ;
FIG. 10 is a cross sectional view take along line 10 - 10 in FIG. 9 ; and,
FIG. 11 is a cross sectional view take along line 11 - 11 in FIG. 9 .
Claims
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3 members · 3 offices›IP5 & PCT — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D783351-S | S1 | 11 Apr 2017 | 9 Nov 2015 | granted | Gas nozzle substrate processing apparatus |
| JP | JP-1547057-S | S | 4 Apr 2016 | 28 May 2015 | granted | no title held |
›Other offices — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D176076-S | S | 1 Jun 2016 | 17 Nov 2015 | published | 基板處理裝置用氣體供給噴嘴zh |
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