USPatentGranted

Microwave introducing antenna for a plasma processing apparatus

Granted 24 Mar 2009 · 2 office actions

Assignee: Tokyo Electron Limited

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Inventors: Atsushi Ueda, Cai Zhong Tian · Examiner: T. Chase Nelson · AU 2914 · TC 2900

Application

29/281,070

filed 14 Jun 2007

Publication

Not published

not published

Patent· this page

US D589034

granted 24 Mar 2009

term adjustment not held

none

Litigation

checked

Classifications

Citations

17 cites · 0 cited by

Life of the patent

7 dated events

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Description

1 parts

›FIG. 1 is a front view of a…

FIG. 1 is a front view of a microwave introducing antenna for a plasma processing apparatus showing our new design:

FIG. 2 is a right side view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a sectional view taken along line 4 — 4 of FIG. 1 thereof; and,

FIG. 5 is a perspective view thereof.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1

1 granted claims

›1.independentThe ornamental design for a microwave introducing antenna for a plasma processing apparatus, as shown.

Classifications

2 codes

USPC · US Patent Classification

D14/230D14/233

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File wrapper

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Pendency

1.8 y

649 days filing → grant

Office actions

non-final + final

Responses

no RCE

Examiner

T. Chase Nelson

art unit 2914 · TC 2900

Law firm

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Citations: 17 back · 0 forward

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Worldwide family

2 members · 2 offices

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Members

DOCDB simple family 40457620

Offices

Granted

1 of 2

grant date present

›IP5 & PCT — 1 members

Office	Publication	Kind	Published	Filed	Status	Title
USthis patent	US-D589034-S	S1	24 Mar 2009	14 Jun 2007	granted	Microwave introducing antenna for a plasma processing apparatus

›Other offices — 1 members

Office	Publication	Kind	Published	Filed	Status	Title
TW	TW-D123705-S1	S1	11 Jul 2008	14 Jun 2007	published	A microwave introducing antenna for a plasma processing apparatus

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Citations

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