Substrate processing apparatus and substrate processing method

A substrate processing apparatus for processing a substrate, comprising:na chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening of said chamber body by said chamber cover;a substrate holding part disposed in said internal space of said chamber, for holding a substrate horizontally;a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis oriented in a vertical direction;a processing liquid discharge part for discharging a processing liquid supplied onto said substrate to the outside of said chamber,a plurality of lift pins arranged in a circumferential direction about said central axis and protruding downward from said chamber cover; anda lift pin moving mechanism for moving said plurality of lift pins in said vertical direction relative to said chamber cover,wherein said substrate rotating mechanism comprises:an annular rotor part disposed in said internal space of said chamber, to which said substrate holding part is attached; anda stator part disposed around said rotor part outside said chamber, for generating a rotating force between itself and said rotor part,wherein respective tip portions of said plurality of lift pins are moved down from an escape position to a transfer position by said lift pin moving mechanism, and said substrate is transferred between said plurality of lift pins and said substrate holding part at said transfer position.

A substrate processing apparatus for processing a substrate, comprising:na chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening of said chamber body by said chamber cover;a substrate holding part disposed in said internal space of said chamber, for holding a substrate horizontally;a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis oriented in a vertical direction; anda processing liquid discharge part for discharging a processing liquid supplied onto said substrate to the outside of said chamber,wherein said substrate rotating mechanism comprises:an annular rotor part disposed in said internal space of said chamber, to which said substrate holding part is attached; anda stator part disposed around said rotor part outside said chamber, for generating a rotating force between itself and said rotor part,wherein said substrate holding part comprises:a plurality of substrate supporting parts for supporting said substrate from below; anda plurality of substrate retaining parts for retaining said substrate from above,each substrate supporting part of said plurality of substrate supporting parts is rotatable about a first rotation axis oriented horizontally between a first waiting position and a first holding position and rotates from said first waiting position to said first holding position by placing said substrate on a first substrate contact part, to thereby support said substrate from below, andeach substrate retaining part of said plurality of substrate retaining parts is rotatable about a second rotation axis oriented horizontally between a second waiting position and a second holding position and rotates from said second waiting position to said second holding position by centrifugal force due to rotation performed by said substrate rotating mechanism, to thereby retain said substrate from above at a second substrate contact part.