(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
Granted 12 Aug 2014 · 2 office actions
Current assignee: NEC Corporation · originally AT&T Company
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Attorney: Attorney · Log in to unlock
Inventors: Etsuo Hasegawa, Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa · Examiner: Karuna P Reddy · AU 1764 · TC 1700
Life of the patent
10 dated eventsAbstract
A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.
Claims
2 · 1 independent · depth 2Classifications
21 codes- C08F134/02
- C08F20/28
- C08F34/02
- C08F8/00
- C08F118/02
- C08F2/00
- C08F234/02
- C08F32/08
- C08F120/28
- C07D307/93
- G03F7/039
- G03F7/004
- G03F7/038
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1 priority documents›Priority documents — 1
| Type | Document | Date |
|---|---|---|
| related publication | US 20130122419 A1 | 16 May 2013 |
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