Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers

A method for fabricating an etch mask on a substrate, comprising:nforming a layer of an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer in a trench having sidewalls and a floor, wherein the amphiphilic agent forms a layer selectively on the sidewalls of the trench and the polymer selectively wets the floor of the trench;causing the polymer to form a hydrogel; andremoving the layer of the amphiphilic agent to form an opening between the hydrogel and the sidewalls of the trench and expose the floor of the trench.

A method for fabricating an etch mask on a substrate, comprising:ndepositing an aqueous emulsion comprising an amphiphilic surfactant and a water-soluble, hydrogel-forming polymer into a trench having hydrophobic sidewalls and a hydrophilic floor defined by a substrate, such that the surfactant forms a layer selectively on the sidewalls and the polymer orients selectively to the floor of the trench;forming the polymer into a hydrogel; andremoving the surfactant layer to form a gap between the hydrogel and the trench sidewalls and expose the substrate at the floor of the trench.

A method for fabricating an etch mask on a substrate, comprising:nselectively forming a hydrophobic layer on sidewalls of a trench and a hydrophilic layer on a floor of the trench;forming a layer of an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer in the trench, wherein the amphiphilic agent forms a layer selectively on the sidewalls of the trench and the polymer orients selectively to the floor of the trench;causing the polymer to form a hydrogel; andselectively removing the layer of the amphiphilic agent to form an opening between the hydrogel and the sidewalls of the trench and expose the floor of the trench.

A method for fabricating an etch mask on a substrate, comprising:nselectively forming a hydrophobic layer on sidewalls of a trench and a hydrophilic layer on a floor of the trench;forming a layer of an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer in the trench, wherein the amphiphilic agent forms a layer selectively on the sidewalls of the trench and the polymer orients selectively to the floor of the trench;crosslinking the polymer to form a hydrogel; andremoving the layer of the amphiphilic agent to form an opening between the hydrogel and the sidewalls of the trench and expose the floor of the trench.

A method for fabricating an etch mask on a substrate, comprising:nforming a layer of a self-assembled lamellar-phase block copolymer within a first trench having sidewalls and a floor defined by a substrate;selectively removing one of the blocks of the self-assembled layer to form openings in the layer exposing the substrate at the floor of the trench;etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor;depositing an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer into the second trenches such that the amphiphilic agent forms a layer selectively on the sidewalls and the polymer orients selectively to the floor of the second trenches;forming the polymer into a hydrogel; andremoving the amphiphilic agent layer to form a gap between the hydrogel and the trench sidewalls and expose the substrate at the floor of the second trenches.

A method for fabricating an etch mask on a substrate, comprising:nforming a layer of a self-assembled, lamellar-phase block copolymer within a first trench defined by a substrate and having sidewalls that are preferential wetting to one block of the block copolymer, a floor that is neutral wetting to both blocks of the block copolymer, a width and a length, the self-assembled polymer layer comprising alternating lamellar blocks spanning the width of the trench and oriented perpendicular to the trench floor and substantially parallel to the sidewalls;selectively removing one of the blocks of the self-assembled layer to form openings in the polymer layer exposing the substrate at the floor of the trench;etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor;depositing an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer into the second trenches such that the amphiphilic agent forms a layer selectively on the sidewalls and the polymer orients selectively to the floor of the second trenches;forming the polymer into a hydrogel; andremoving the amphiphilic agent layer to form a gap between the hydrogel and the trench sidewalls and expose the substrate at the floor of the second trenches.

A method for fabricating an etch mask on a substrate, comprising:nforming a film comprising a self-assembled lamellar-phase block copolymer within a first trench in a substrate to a thickness of about Lo, the block copolymer comprising first and second polymer blocks, and the trench having sidewalls that are preferential wetting to one block of the block copolymer, a floor that is neutral wetting to both blocks of the block copolymer, a width of about nLo and a length; the self-assembled polymer film comprising a single array of perpendicular-oriented lamellar polymer domains spanning the width and extending the length of the trench in a substantially parallel orientation to the sidewalls;selectively removing one of the blocks of the self-assembled layer to form openings in the polymer layer exposing the substrate at the floor of the trench;etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor;depositing an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer into the second trenches such that the amphiphilic agent forms a layer selectively on the sidewalls and the polymer orients selectively to the floor of the second trenches;forming the polymer into a hydrogel; andremoving the amphiphilic agent layer to form a gap between the hydrogel and the trench sidewalls and expose the substrate at the floor of the second trenches.

A method for fabricating an etch mask on a substrate, comprising:nforming a material layer over a substrate having a surface being neutral wetting to both blocks of a lamellar-phase block copolymer;forming a first trench in the material layer having a floor, sidewalls, ends, a width and a length, to expose the neutral wetting surface of the substrate at the floor of the first trench, the sidewalls being preferential wetting to one of the blocks of the lamellar-phase block copolymer;forming a layer of the lamellar-phase block copolymer within the first trench;causing the copolymer layer to self-assemble into a film comprising alternating lamellar blocks spanning the width of the trench and oriented perpendicular to the trench floor and substantially parallel to the sidewalls;selectively removing one of the lamellar blocks of the self-assembled film to form openings exposing the substrate at the floor of the trench;etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor;depositing an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer into the second trenches wherein the amphiphilic agent forms a layer selectively on the sidewalls and the polymer selectively wets the floor of the second trenches;causing the polymer to form a hydrogel; andremoving the layer of the amphiphilic agent to form a gap between the hydrogel and the trench sidewalls and expose the substrate at the floor of the second trenches.

A method for fabricating channels in a substrate, comprising:nforming a layer of an aqueous emulsion comprising an amphiphilic agent and a water-soluble, hydrogel-forming polymer in a trench having sidewalls and a floor, wherein the amphiphilic agent forms a layer selectively on the sidewalls of the trench and the polymer selectively wets the floor of the trench;causing the polymer to form a hydrogel;removing the layer of the amphiphilic agent to form an opening between the hydrogel and the sidewalls of the trench and expose the floor of the trench; andetching an underlying substrate through the openings to form the channels in the substrate.

A method for fabricating an etch mask on a substrate, comprising:nforming a layer of an aqueous emulsion comprising an amphiphilic material in a trench having hydrophobic sidewalls and a floor, wherein the amphiphilic material forms a layer selectively on the sidewalls of the trench;crosslinking the amphiphilic material layer;drying the amphiphilic material layer;filling the trench with an inorganic material; andremoving the amphiphilic material layer to form an opening between the inorganic material and the sidewalls of the trench and expose the floor of the trench.