›1.independentAn apparatus for handling a substrate, comprising: a contact surface having an aperture; a pusher having an engaged condition wherein the pusher press…+4
An apparatus for handling a substrate, comprising: a contact surface having an aperture; a pusher having an engaged condition wherein the pusher presses the substrate against the contact surface so that the substrate covers the contact surface aperture and having a disengaged condition wherein the pusher does not press the substrate against the contact surface; and a pressure sensor coupled to the contact surface aperture so as to detect whether the contact surface aperture is covered by the substrate, wherein the pressure sensor comprises a pressure transducer.
›2.↳ 1The apparatus of claim 1, further comprising a housing defining a channel constructed to couple the contact surface aperture to a vacuum source.d2
The apparatus of claim 1, further comprising a housing defining a channel constructed to couple the contact surface aperture to a vacuum source.
›3.↳ 1The apparatus of claim 1 further comprising: at least one edge restraint; wherein, in the engaged condition of the pusher, the pusher presses against …d2
The apparatus of claim 1 further comprising: at least one edge restraint; wherein, in the engaged condition of the pusher, the pusher presses against a first peripheral edge portion of the substrate so as to urge a second peripheral edge portion of the substrate against the at least one edge restraint.
›4.↳ 1The apparatus of claim 1 wherein: the pusher includes a body and a face, wherein the face of the pusher is adapted to contact a peripheral edge portio…d2
The apparatus of claim 1 wherein: the pusher includes a body and a face, wherein the face of the pusher is adapted to contact a peripheral edge portion of the substrate; a biasing member having a first end coupled to the pusher and having a second end; and a housing defining a first channel within which the body of the pusher and the biasing member are disposed, with the second end of the biasing member being coupled to the housing, and the body of the pusher being movable within the first channel, the housing further defining a second channel constructed to couple the contact surface aperture to a vacuum source.
›5.↳ 1The apparatus of claim 1, wherein, when the pusher is in said engaged condition, the contact surface abuts a rear surface of the substrate.d2
The apparatus of claim 1, wherein, when the pusher is in said engaged condition, the contact surface abuts a rear surface of the substrate.
›6.independentAn apparatus for handling a substrate, comprising: at least one support surface constructed to support the substrate at a substrate support position; …+5
An apparatus for handling a substrate, comprising: at least one support surface constructed to support the substrate at a substrate support position; a pusher having a body and a face the face being adapted to contact the substrate; a housing having a first channel within which the body of the pusher is disposed, the body of the pusher being movable within the first housing channel; and a vacuum source coupled to the first channel.
›7.↳ 6The apparatus of claim 6 wherein: the housing includes a second channel having an aperture through which the second channel communicates with the firs…d2+3
The apparatus of claim 6 wherein: the housing includes a second channel having an aperture through which the second channel communicates with the first channel; the second channel is coupled to ambient pressure; and the aperture of the second channel is positioned within the first channel so that when the face of the pusher is in contact with the substrate at said substrate support position, the body of the pusher covers the aperture, and when the face of the pusher enters said substrate support position in the absence of a substrate at said substrate support position, the body of the pusher does not cover the aperture so that the first housing channel is exposed to ambient pressure.
›8.↳ 7The apparatus of claim 7 further comprising: an edge restraint adapted to contact a first peripheral edge portion of the substrate to limit substrate …d3
The apparatus of claim 7 further comprising: an edge restraint adapted to contact a first peripheral edge portion of the substrate to limit substrate movement toward the edge restraint; and a biasing member coupled to the pusher so as to press the pusher against a second peripheral edge portion of the substrate and press the first peripheral edge portion of the substrate against the edge restraint, the aperture of the second housing channel being covered by the pusher when the substrate is pressed between the edge restraint and the pusher.
›9.↳ 7The apparatus of claim 7 wherein: the body of the pusher is movable between a retracted position and an extended position within the first channel, wh…d3
The apparatus of claim 7 wherein: the body of the pusher is movable between a retracted position and an extended position within the first channel, wherein the pusher is in the extended position when the face of the pusher contacts the substrate; the housing includes a second channel having an aperture through which the second channel communicates with the first channel; the second channel is coupled to ambient pressure; and the aperture of the second channel is positioned within the first channel so that the body of the pusher covers the aperture of the second channel only when the pusher is positioned substantially at the retracted position and so that through which the first housing channel is exposed to ambient pressure when the pusher is unable to completely retract within the first housing channel.
›10.↳ 7The apparatus of claim 7, further comprising: a pressure sensor coupled to the first channel so as to sense an increase in pressure within the first c…d3
The apparatus of claim 7, further comprising: a pressure sensor coupled to the first channel so as to sense an increase in pressure within the first channel when the pusher enters said substrate support position in the absence of a substrate at said substrate support position.
›11.↳ 6The apparatus of claim 6 further comprising: a contact surface having an aperture that is covered by the substrate when the substrate is in the substr…d2
The apparatus of claim 6 further comprising: a contact surface having an aperture that is covered by the substrate when the substrate is in the substrate support position; a second channel extending from the aperture of the contact surface to an aperture of the first channel; wherein the pusher covers the aperture of the first channel so as to obstruct the second channel from communication with the vacuum source when the pusher is retracted within the first housing channel beyond a threshold distance.
›12.independentAn apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at…+2
An apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at least one edge restraint member and a contact surface; pusher that is movably mounted to the transfer head, the pusher being movable between a disengaged condition and an engaged condition wherein in the disengaged condition the pusher does not press against the substrate, and in the engaged condition; the pusher presses against a first portion of the peripheral edge of the substrate so that a second portion of the peripheral edge presses against the at least one edge restraint; and a vacuum source for supplying a controllable level of vacuum to the pusher, the vacuum source being coupled to the pusher so as to move the pusher between its disengaged condition and its engaged condition in response to the level of vacuum supplied by the vacuum source.
›13.↳ 12The apparatus of claim 12, wherein: the vacuum source controllably supplies either a low level or a high level of vacuum to the pusher; and the vacuum…d2
The apparatus of claim 12, wherein: the vacuum source controllably supplies either a low level or a high level of vacuum to the pusher; and the vacuum source is coupled to the pusher so as to move the pusher into the disengaged condition in response to said low level of vacuum and into the engaged condition in response to said high level of vacuum.
›14.↳ 12The apparatus of claim 12, wherein the pusher includes a face and a body, the face being adapted to press against said first portion of the peripheral…d2
The apparatus of claim 12, wherein the pusher includes a face and a body, the face being adapted to press against said first portion of the peripheral edge of the substrate; the apparatus further comprises a housing having a channel within which the body of the pusher is movable, a biasing member coupled to the pusher so as to urge the body of the pusher to extend out from the housing; and the vacuum source is coupled to the housing so as to urge the body of the pusher to retract into the housing.
›15.independentAn apparatus for handling a substrate, comprising a movable transfer arm having an edge restraint adapted to contact a first peripheral edge portion o…+3
An apparatus for handling a substrate, comprising a movable transfer arm having an edge restraint adapted to contact a first peripheral edge portion of the substrate to limit substrate movement toward the edge restraint; a pusher having a face and a body, the face being adapted to contact a second peripheral edge portion of the substrate; a housing defining a channel within which the body of the pusher is disposed, with the body of the pusher being movable within the channel; a biasing member coupled to the pusher so as to urge the body of the pusher to extend outward from the channel; and a vacuum source coupled to the channel so as to urge the body of the pusher to retract into the channel.
›16.↳ 15The apparatus of claim 15 further comprising: a flow restrictor coupled to the vacuum source; and a valve connected to selectively couple the housing …d2
The apparatus of claim 15 further comprising: a flow restrictor coupled to the vacuum source; and a valve connected to selectively couple the housing channel to the vacuum source directly or through the flow restrictor.
›17.↳ 15The apparatus of claim 15, further comprising: a valve for controlling the level of vacuum coupled to the channel from the vacuum source; wherein the …d2+1
The apparatus of claim 15, further comprising: a valve for controlling the level of vacuum coupled to the channel from the vacuum source; wherein the valve controllably provides to the channel a level of vacuum ranging between a first level and a second level, the second level being high enough to retract the body of the pusher into the channel, and the first level being low enough to permit the biasing member to move the body of the pusher outward from the channel.
›18.↳ 17The apparatus of claim 17 wherein, when the valve provides said first level of vacuum to the channel, the pusher extends outward from the channel suff…d3
The apparatus of claim 17 wherein, when the valve provides said first level of vacuum to the channel, the pusher extends outward from the channel sufficiently for the face of the pusher to press against the second peripheral edge portion of the substrate so that the first peripheral edge portion of the substrate presses against the edge restraint.
›19.independentA method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a pusher, and a contact surface having an a…
A method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a pusher, and a contact surface having an aperture; providing a first channel coupling the contact surface aperture to a vacuum source; monitoring the pressure inside the first channel; and said pusher pressing a substrate against the contact surface so that the substrate covers the contact surface aperture.
›20.independentA method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a first channel, and a pusher having a face…+5
A method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a first channel, and a pusher having a face and a body; movably mounting the body of the pusher within the first channel; applying sufficient vacuum to the first channel to retract the pusher; and after the step of applying vacuum to retract the pusher, positioning the substrate on the transfer arm.
›21.↳ 20The method of claim 20 further comprising the steps of: applying to the pusher a bias force directed so as to urge the pusher toward the substrate; an…d2+2
The method of claim 20 further comprising the steps of: applying to the pusher a bias force directed so as to urge the pusher toward the substrate; and decreasing the vacuum applied to the first channel in response to a decrease in the monitored first channel pressure upon the positioning of the substrate on the transfer arm, the decrease in applied vacuum being sufficient to permit the bias force to press the pusher against the substrate.
›22.↳ 21The method of claim 21 further comprising after the applied vacuum is decreased, re-positioning the substrate on the transfer arm when the monitored f…d3
The method of claim 21 further comprising after the applied vacuum is decreased, re-positioning the substrate on the transfer arm when the monitored first channel pressure is higher than a predetermined maximum value.
›23.↳ 21The method of claim 21, further comprising the step of: after the step of decreasing the applied vacuum, increasing the vacuum applied to the first ch…d3
The method of claim 21, further comprising the step of: after the step of decreasing the applied vacuum, increasing the vacuum applied to the first channel so as to retract the pusher.
›24.↳ 20The method of claim 20, further comprising the steps of: providing a second channel having an aperture through which the second channel communicates w…d2
The method of claim 20, further comprising the steps of: providing a second channel having an aperture through which the second channel communicates with the first channel; coupling the second channel to ambient pressure; positioning the aperture of the second channel within the first channel so that the body of the pusher covers the aperture of the second channel only when the body of the pusher is retracted substantially completely within the first channel and so that the first channel is exposed to ambient pressure when the body of the pusher is unable to completely retract within the first channel.
›25.↳ 20The method of claim 20, further comprising the steps of providing a second channel having an aperture through which the second channel communicates wi…d2
The method of claim 20, further comprising the steps of providing a second channel having an aperture through which the second channel communicates with the first channel; coupling the second channel to ambient pressure; positioning the aperture of the second channel within the first channel so that when the face of the pusher is in contact with the substrate at said substrate support position, the body of the pusher covers the aperture, and when the face of the pusher enters said substrate support position in the absence of a substrate at said substrate support position the body of the pusher does not cover the aperture so that the first channel is exposed to ambient pressure.
›26.independentAn apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at…+3
An apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at least one edge restraint member and a contact surface; and a pusher that is movably mounted to the transfer head, the pusher having a front surface, and the pusher being movable between a disengaged condition and an engaged condition; wherein, in the disengaged condition, the pusher does not press against the substrate; wherein, in the engaged condition; the front surface of the pusher presses against only a first portion of the peripheral edge of the substrate so that a second portion of the peripheral edge presses against the at least one edge restraint and so that a portion of the rear surface of the substrate presses against the contact surface; and wherein said first portion of the peripheral edge against which the pusher presses adjoins the front surface of the substrate and does not adjoin the rear surface of the substrate.
›27.↳ 26The apparatus of claim 26, further comprising a sensor, coupled to the contact surface, for detecting whether the substrate is pressing against the co…d2
The apparatus of claim 26, further comprising a sensor, coupled to the contact surface, for detecting whether the substrate is pressing against the contact surface.
›28.↳ 26The apparatus of claim 26, wherein, when the pusher is in its engaged condition, the front surface of the pusher is oriented at an acute angle relativ…d2
The apparatus of claim 26, wherein, when the pusher is in its engaged condition, the front surface of the pusher is oriented at an acute angle relative to the front surface of the substrate.
›29.↳ 26The apparatus of claim 26, wherein, when the pusher is in its engaged condition, the front surface of the pusher is oriented at an angle of 75 to 85 d…d2
The apparatus of claim 26, wherein, when the pusher is in its engaged condition, the front surface of the pusher is oriented at an angle of 75 to 85 degrees relative to the front surface of the substrate.
›30.independentAn apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at…+2
An apparatus for handling a substrate having a front surface and a rear surface bounded by a peripheral edge, comprising: a transfer head including at least one edge restraint member and a contact surface; a pusher that is movably mounted to the transfer head, the pusher having a front surface, and the pusher being movable between a disengaged condition and an engaged condition; wherein, in the disengaged condition, the pusher does not press against the substrate; wherein, in the engaged condition; the front surface of the pusher presses against a first portion of the peripheral edge of the substrate so that a second portion of the peripheral edge presses against the at least one edge restraint and so that a portion of the rear surface of the substrate presses against the contact surface; wherein, when the pusher is in its engaged condition, the front surface of the pusher is oriented at an acute angle relative to the front surface of the substrate.
›31.↳ 30The apparatus of claim 30, wherein said angle is in the range of 75 to 85 degrees.d2
The apparatus of claim 30, wherein said angle is in the range of 75 to 85 degrees.
›32.↳ 30The apparatus of claim 30, further comprising a sensor, coupled to the contact surface, for detecting whether the substrate is pressing against the co…d2
The apparatus of claim 30, further comprising a sensor, coupled to the contact surface, for detecting whether the substrate is pressing against the contact surface.
›33.independentAn apparatus for handling a substrate, comprising: a movable transfer arm including a contact surface having an aperture, and at least one support sur…
An apparatus for handling a substrate, comprising: a movable transfer arm including a contact surface having an aperture, and at least one support surface positioned so as to support a substrate so that the substrate covers the contact surface aperture; a housing defining a channel that extends from the contact surface aperture to a vacuum source; and a pressure sensor coupled to the contact surface aperture; wherein the vacuum source and pressure sensor are directly coupled to the contact surface aperture so that the pressure sensor senses a decrease in pressure when the substrate covers the contact surface aperture and senses an increase in pressure when the substrate does not cover the contact surface aperture.
›34.independentA method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a channel, and a pusher having a face and a…+1
A method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a channel, and a pusher having a face and a body; movably mounting the body of the pusher within the channel; applying to the pusher a bias force directed so as to extend the pusher toward the substrate; and applying sufficient vacuum to the channel to retract the pusher.
›35.↳ 34The method of claim 34 further comprising after the substrate is positioned on the transfer arm, de-energizing the clamping member sufficiently to ena…d2
The method of claim 34 further comprising after the substrate is positioned on the transfer arm, de-energizing the clamping member sufficiently to enable the clamping member to extend toward the substrate and thereby restrain the substrate from moving relative to the transfer arm.
›36.independentA method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a channel, and a pusher having a face and a…
A method of transferring a substrate, comprising the steps of: providing a movable transfer arm comprising a channel, and a pusher having a face and a body, the face being adapted to contact an edge of the substrate; movably mounting the body of the pusher within the channel; applying to the pusher a bias force directed so as to extend the body of the pusher outward from the channel; and applying sufficient vacuum to the channel to retract the body of the pusher into the channel.
