Sputter target for a physical vapor deposition chamber
Granted 22 Nov 2022 · 1 office action
Assignee: Applied Materials, Inc.
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Inventors: Martin Riker, Srinivasa Rao Yedla, William Fruchterman, Kirankumar Neelasandra Savandaiah +1 · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the application
5 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right elevation view thereof.
FIG. 5 is a left elevation view thereof.
FIG. 6 is a front elevation view thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8 - 8 in FIG. 2 .
The dashed lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.
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