USPatent applicationPatented

Gas diffusion plate for a plasma processing apparatus

Granted 3 Dec 2019 · no office action yet

Current assignee: Hitachi High-Tech Instruments Co., Ltd · originally Hitachi, Ltd.

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Inventors: Kazuumi Tanaka, Kouji Okuda · Examiner: Susan Bennett Hattan · AU 2924 · TC 2900

Application· this page
29/638,441
filed 27 Feb 2018
Publication
Not published
not published
Patent
US D868995
granted 3 Dec 2019

Life of the application

7 dated events
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Description

1 parts
›FIG. 1 is a front, bottom and right…

FIG. 1 is a front, bottom and right side perspective view of a gas diffusion plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8 - 8 of FIG. 2 ;

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 2 ; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8 .

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

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Claims as granted

1 claim

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Classifications

1 codes
USPC · US Patent Classification
D24/225

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File wrapper

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Pendency
1.8 y
644 days filing → grant
Office actions
0
none on record
Interviews
1
examiner interview summaries
Examiner
Susan Bennett Hattan
art unit 2924 · TC 2900
Citations: 12 back · 0 forward

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Documents

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Chain of title

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