Showerhead for a semiconductor processing chamber
Granted 20 Jun 2017 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Inventors: Aaron Miller, Lara Hawrylchak, Kong Lung Samuel Chan · Examiner: Robin V Webster · AU 2911 · TC 2900
Life of the application
5 dated eventsDescription
1 parts›FIG. 1 is an isometric top view of…
FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.
FIG. 2 is an isometric bottom view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevational view thereof indicated by lines 5 - 5 of FIG. 3 , the rear elevational view being a mirror image.
FIG. 6 is a side elevational view thereof indicated by lines 6 - 6 of FIG. 3 , the opposite side elevational view being a mirror image.
FIG. 7 is a cross-sectional view thereof taken along lines 7 - 7 of FIG. 3 .
FIG. 8 is a cross-sectional view thereof taken along lines 8 - 8 of FIG. 3 .
FIG. 9 is an enlarged view of a portion of FIG. 7 .
FIG. 10 is an enlarged view of another portion of FIG. 7 ; and,
FIG. 11 is an enlarged view of a portion of FIG. 8 .
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