USPatent applicationPatented

Showerhead for a semiconductor processing chamber

Granted 20 Jun 2017 · no office action yet

Current assignee: Applied Materials Israel · originally Applied Materials, Inc.

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Inventors: Aaron Miller, Lara Hawrylchak, Kong Lung Samuel Chan · Examiner: Robin V Webster · AU 2911 · TC 2900

Application· this page
29/560,680
filed 8 Apr 2016
Publication
Not published
not published
Patent
US D790039
granted 20 Jun 2017

Life of the application

5 dated events
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Description

1 parts
›FIG. 1 is an isometric top view of…

FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevational view thereof indicated by lines 5 - 5 of FIG. 3 , the rear elevational view being a mirror image.

FIG. 6 is a side elevational view thereof indicated by lines 6 - 6 of FIG. 3 , the opposite side elevational view being a mirror image.

FIG. 7 is a cross-sectional view thereof taken along lines 7 - 7 of FIG. 3 .

FIG. 8 is a cross-sectional view thereof taken along lines 8 - 8 of FIG. 3 .

FIG. 9 is an enlarged view of a portion of FIG. 7 .

FIG. 10 is an enlarged view of another portion of FIG. 7 ; and,

FIG. 11 is an enlarged view of a portion of FIG. 8 .

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims as granted

1 claim

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Classifications

1 codes
USPC · US Patent Classification
D23/213

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File wrapper

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Pendency
1.2 y
438 days filing → grant
Office actions
0
none on record
Examiner
Robin V Webster
art unit 2911 · TC 2900
Citations: 22 back · 0 forward

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Chain of title

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