Semiconductor package and method of manufacturing the same

This application claims the benefit of Korean Patent Application Nos. 10-2017-0079955, filed on Jun. 23, 2017, and 10-2018-0008955, filed on Jan. 24, 2018, in the Korean Intellectual Property Office, the disclosures of which are hereby incorporated by reference in their entirety.

The inventive concept relates to a semiconductor package, and more particularly, to a semiconductor package to which a fan-out packaging technique is applied and to a method of manufacturing the same.

Electronic products are required to process large amounts of data while being miniaturized. Accordingly, there is a growing need to increase the integration of semiconductor devices used in such electronic products. To this end, semiconductor chips are being stacked and electrically connected to one another using various packaging technologies. For example, semiconductor packages containing chips are stacked and electrically connected by wires in a process known as a wire bonding process. However, the use of a wire bonding process in this type of application requires the overall semiconductor package be rather thick, and it is difficult to stack more than 4 layers, and T-topology may appear when a redistribution layer is used for more than 2 loads. Recently, panel level package (PLP) and wafer level package (WLP) technologies for increasing integration and reducing unit cost are being researched and developed.

According to an aspect of the inventive concept, there is provided a semiconductor package including a first layer comprising a first panel of the semiconductor package and one or more first semiconductor chips, each of the one or more first semiconductor chips having one or more first pads exposed at a first surface of the one or more first semiconductor chips, a second layer disposed over the first layer, the second layer comprising a second panel of the semiconductor package and one or more second semiconductor chips, each of the one or more second semiconductor chips having one or more second pads exposed at a second surface of the one or more second semiconductor chips, and a first redistribution layer interposed between the first layer and the second layer and electrically connected to the one or more first pads. The first layer further comprises one or more first through panel vias (TPVs) extending through the first panel in a vertical direction, corresponding to a direction of thickness of the first panel, and electrically connected to the first redistribution layer.

According to another aspect of the inventive concept, there is provided a semiconductor package including a first layer comprising a first semiconductor chip having one or more first pads exposed at a first surface of the first semiconductor chip, a first panel having a first accommodating portion accommodating the first semiconductor chip, and one or more first through panel vias (TPVs) extending through the first panel in a vertical direction corresponding to a direction of thickness of the first panel, a first redistribution layer disposed on the first layer in the vertical direction and electrically connected to the one or more first pads and the one or more first TPVs, and a second layer stacked in the vertical direction on the first redistribution layer and including a second semiconductor chip having one or more second pads exposed at a second surface of the second semiconductor chip, and a second panel including a second accommodating portion accommodating the second semiconductor chip.

According to another aspect of the inventive concept, there is provided a semiconductor package including a first layer comprising a first semiconductor chip having one or more first pads and a first surface at which the one or more first pads are exposed, a first panel having a first accommodating portion accommodating the first semiconductor chip, and one or more first through panel vias (TPVs) extending through the first panel in a vertical direction, a first redistribution layer disposed on the first layer and electrically connected to the one or more first pads and the one or more first TPVs, and a second layer stacked on the first redistribution layer and comprising a second semiconductor chip having one or more second pads and a second surface at which one or more second pads electrically connected to the first redistribution layer are exposed, a second panel comprising a second accommodating portion for accommodating the second semiconductor chip, and a second TPV extending through the second panel and electrically connected to the first redistribution layer.

According to another aspect of the inventive concept, there is provided a semiconductor package including a first panel having opposite sides and one or more chip accommodating portions therein, each of the one or more chip accommodating portions open at one of the opposite sides of the first panel, a respective first semiconductor chip received in each of the one or more chip accommodating portions, the first semiconductor chip having a surface exposed at said one of the opposite sides of the first panel, a redistribution layer (RDL) comprising a wiring pattern extending along said one of the opposite sides of the first panel and over the surface of the first semiconductor chip, the wiring pattern of the RDL being electrically connected to the first semiconductor chip at said surface of the first semiconductor chip, a through panel via (TPV) extending vertically through the first panel from one of the opposite sides thereof to the other of the opposite sides thereof, the wiring pattern of the RDL extending over and electrically connected to the TPV, a second panel disposed directly on the RDL and having one or more chip accommodating portions therein, each of the one or more chip accommodating portions of the second panel open at one of the opposite sides of the second panel, and a respective second semiconductor chip received in each of the one or more chip accommodating portions of the second panel, the second semiconductor chip having a surface exposed at said one of the opposite sides of the second panel. The second semiconductor chip is electrically connected to the wiring pattern of the RDL.

According to another aspect of the inventive concept, there is provided a method of manufacturing a semiconductor package, the method including: forming a first layer by disposing one or more first semiconductor chips each having a first surface on which one or more first pads are exposed and one or more first through panel vias (TPVs) extending through a first panel on the first panel; forming a second layer by disposing one or more second semiconductor chips each having a second surface on which one or more second pads are exposed on a second panel; forming a first redistribution layer electrically connected to the one or more first pads and the one or more first TPVs on the first layer; and forming a first stack structure by stacking the second layer in the vertical direction on the first redistribution layer.

The inventive concept will be more clearly understood from the following detailed description of examples thereof taken in conjunction with the accompanying drawings in which:

FIG. 1A is a cross-sectional view of an example of a semiconductor package according to the inventive concept;

FIG. 1B is an enlarged view of the cross section of region A of the device of FIG. 1 ;

FIGS. 2A, 2B, 2C and 2D are enlarged views of other examples of cross sections of semiconductor packages according to the inventive concept each corresponding to the cross section of region A of the device of FIG. 1 ;

FIG. 3A is a cross-sectional view of an example of a semiconductor package according to the inventive concept;

FIG. 3B is an enlarged view of the cross section of region B of the device of FIG. 1 ;

FIGS. 4A, 4B, 4C and 4D are enlarged views of other examples of cross sections of semiconductor packages according to the inventive concept each corresponding to the cross section of region B of the device of FIG. 3B ;

FIG. 5 is a cross-sectional view of an example of a semiconductor package according to the inventive concept;

FIG. 6 is a cross-sectional view of an example of a semiconductor package according to the inventive concept;

FIGS. 7A through 7D illustrate an example of a process of manufacturing a semiconductor package according to the inventive concept, with FIG. 7A being a flow chart of the process, and FIGS. 7B and 7C each being a cross-sectional view of the components of the package during the course of its manufacture and FIG. 7D being a cross-sectional view of the completed package;

FIGS. 8A through 8D illustrate an example of a process of manufacturing a semiconductor package according to the inventive concept, with FIG. 8A being a flow chart of the process, and FIGS. 8B and 8C each being a cross-sectional view of the package during the course of its manufacture and FIG. 8D being a cross-sectional view of the completed package;

FIG. 9 is a cross-sectional view of an example of a semiconductor package according to the inventive concept; and

FIG. 10 is a schematic block diagram of an electronic system including a semiconductor package according to the inventive concept.

A semiconductor package 100 according to the inventive concept will now be described in detail with reference to FIGS. 1A and 1B .

Referring to FIG. 1A , the semiconductor package 100 may include solder balls SB, first and second layers L 1 and L 2 , and first and second redistribution layers RDL 1 and RDL 2 . A first layer L 1 may include one or more first semiconductor chips 110 and one or more first through panel vias (TPV) TPV 1 . The first layer L 1 may also include a first panel PNL 1 including a first accommodating portion AC 1 in which the first semiconductor chip 110 is accommodated, e.g., a region occupied by the first semiconductor chip 110 in the first panel PNL 1 . A second layer L 2 may include one or more second semiconductor chips 120 and one or more second TPVs TPV 2 . Furthermore, the second layer L 2 may also include a second panel PNL 2 including a second accommodating portion AC 2 in which the second semiconductor chip 120 is accommodated. Here, the term chip accommodating portion may be understood as referring to a chip-sized opening open at a side of the panel, e.g., a cavity open at only one side of the panel or a through-hole open at both sides of the panel.

The first semiconductor chip 110 may include one or more first pads 111 . According to an example, the first semiconductor chip 110 may have a first surface F 1 at which the one or more first pads 111 are exposed. For example, the first pad 111 may be exposed at the first surface F 1 and electrically connected to the first redistribution layer RDL 1 . Furthermore, it will be readily understood from the term “chip”, that the first semiconductor chip 110 may comprise a die, i.e., a chip body on which an integrated circuit (IC) is formed, and that the one or more first pads 111 is/are the input/output terminal(s) of the IC.

The second semiconductor chip 112 may include one or more second pads 121 . According to an example, the second semiconductor chip 120 may have a second surface F 2 at which the one or more second pads 121 are exposed. For example, the second pad 121 may be exposed at the second surface F 2 and electrically connected to the second redistribution layer RDL 2 . As with the first semiconductor chip 110 , it will be readily understood from the term “chip”, that the second semiconductor chip 120 may comprise a die, i.e., a chip body on which an integrated circuit (IC) is formed, and that the one or more first pads 121 is/are the input/output terminal(s) of the IC.

According to an example, the first and second pads 111 and 121 may include a metal. For example, the first and second pads 111 and 121 may be plated pads and may include any one of Au, Ni/Au, and Ni/Pd/Au.

The first and second semiconductor chips 110 and 120 may be, for example, non-volatile memory devices and, more particularly, may be (i.e., are not limited to) EEPROMs, flash memories, phase-change RAMs (PRAMs), resistive RAMs (RRAM)s, ferroelectric RAMs (FeRAMs), solid-state magnetic RAMs (MRAMs), polymer RAMs (PoRAMs), nano floating gate memories (NFGM), or molecular electronics memory devices. Furthermore, the first and second semiconductor chips 110 and 120 may be, for example, volatile memories, and more particularly, may be dynamic random access memories (DRAMs), static random access memories (SRAMs), SDRAMs, or rambus RAMs (RDRAM). That is, the ICs of the first and second semiconductor chips 110 and 120 may comprise an electronic memory and in particular, an array of memory cells.

Furthermore, the first and second semiconductor chips 110 and 120 may be logic chips and may be, for example, controllers for controlling memory chips. That is, the ICs of the first and second semiconductor chips 110 and 120 may comprise logic circuitry.

The first semiconductor chip 110 and the second semiconductor chip 120 may be semiconductor chips of the same or different type. Furthermore, when the first layer L 1 (or the second layer L 2 ) includes a plurality of first semiconductor chips 110 (or a plurality of second semiconductor chips 120 ), some of the first semiconductor chips 110 (or second semiconductor chips 120 ) may be of the same type of semiconductor chip and the remaining one(s) of the first semiconductor chips 110 (or semiconductor chips 120 ) may be of a different type of semiconductor chip from those of the same type. The plurality of first semiconductor chips 110 (or the plurality of second semiconductor chips 120 ) may be disposed close to or in contact with (i.e., adjacent to) the first layer L 1 (or the second layer L 2 ) as arrayed in a second direction Y and a third direction Z.

The first TPV TPV 1 may extend through the first layer L 1 in a first direction X, wherein a first end of the first TPV TPV 1 may be electrically connected to the solder ball SB, and a second end of the first TPV TPV 1 may be electrically connected to the first redistribution layer RDL 1 . Furthermore, the second TPV TPV 2 may extend through the second layer L 2 in the first direction X, wherein a first end of the second TPV TPV 2 may be electrically connected to the first redistribution layer RDL 1 , and a second end of the second TPV TPV 2 may be electrically connected to the second redistribution layer RDL 2 . The solder ball SB may be electrically connected to the first redistribution layer RDL 1 via the first TPV TPV 1 , and the first redistribution layer RDL 1 may be electrically connected to the second redistribution layer RDL 2 through the second TPV TPV 2 .

According to an example, the first TPV TPV 1 and the second TPV TPV 2 may each include at least one of copper (Cu) and tungsten (W). For example, the first TPV TPV 1 and the second TPV TPV 2 may each include at least one of copper (Cu), copper tin (CuSn), copper magnesium (CuMg), copper nickel (CuNi), copper zinc (CuZn), copper lead (CuPb), copper gold (CuAu), copper rhenium (CuRe), copper tungsten (CuW), and tungsten (W) alloys, but are not limited thereto. For example, the first TPV TPV 1 and the second TPV TPV 2 may be formed by at least one of processes including electroless plating, electroplating, sputtering, and printing.

The first panel PNL 1 may accommodate the one or more first semiconductor chips 110 through one or more first accommodating portions AC 1 , respectively. Furthermore, the second panel PNL 2 may accommodate the one or more second semiconductor chips 120 through one or more second accommodating portions AC 2 , respectively.

According to an example, the first and second panels PNL 1 and PNL 2 may include insulation substrates. An insulation substrate may include an insulation material and may include, for example, silicon, glass, ceramic, plastic, or polymer. The first and second panel PNL 1 and PNL 2 may be implemented to have flat panel rectangular shapes or various other shapes like circular shapes or polygonal shapes.

The first redistribution layer RDL 1 may be deposited on the first layer L 1 and the second layer L 2 may be stacked on the first redistribution layer RDL 1 . In other words, the first redistribution layer RDL 1 may be interposed between the first layer L 1 and the second layer L 2 . Furthermore, the second redistribution layer RDL 2 may be deposited on the second layer L 2 .

The first and second redistribution layers RDL 1 and RDL 2 may each include a conductive material. The conductive material may include a metal and, for example, may include copper (Cu), a Cu alloy, aluminum (Al), or an Al alloy. The first and second redistribution layers RDL 1 and RDL 2 may be respectively formed on the first layer L 1 and the second layer L 2 , for example, by a redistribution process.

The first and second redistribution layers RDL 1 and RDL 2 may respectively form redistribution wiring patterns on the first layer L 1 and the second layer L 2 , facilitating the miniaturizing of input/output terminals of the first and second semiconductor chips 110 and 120 , allowing for the number of input/output terminals to be increased, and enabling a fan-out structure. Furthermore, because the first and second redistribution layers RDL 1 and RDL 2 respectively form redistribution wiring patterns on the first layer L 1 and the second layer L 2 and a fan-out structure is enabled, the semiconductor package 100 may offer high performance and high-speed signal processing.

Referring to FIG. 1B , the first TPV TPV 1 and the first redistribution layer RDL 1 may be physically/electrically connected to each other, and the first redistribution layer RDL 1 and the second TPV TPV 2 may be physically/electrically connected to each other. For example, a top surface of the first TPV TPV 1 may contact a bottom surface of the first redistribution layer RDL 1 . According to an example, the top surface of the first TPV TPV 1 may lie in substantially the same plane as the bottom surface of the first redistribution layer RDL 1 , i.e., the first TPV TPV 1 and the first redistribution layer RDL 1 may have an interface.

Furthermore, a bottom surface of the second TPV TPV 2 may contact a top surface of the second redistribution layer RDL 2 . According to an example, the bottom surface of the second TPV TPV 2 may lie in substantially the same plane as the top surface of the second redistribution layer RDL 2 , i.e., the second TPV TPV 2 and the second redistribution layer RDL 2 may have an interface.

In a semiconductor package according to the inventive concept, semiconductor chips are electrically connected to one another by TPVs and redistribution layers and without wire bonding. For example, the first semiconductor chips 110 may be electrically connected to one another via the first redistribution layer RDL 1 . Furthermore, the first and second semiconductor chips 110 and 120 may be electrically connected to each other via the first redistribution layer RDL 1 , the second TPV TPV 2 , and the second redistribution layer RDL 2 . Furthermore, the first and second semiconductor chips 110 and 120 may be electrically connected to an external device via the solder balls SB. Therefore, the number of stacked layers is not limited, and the semiconductor package 100 may be relatively thin.

FIGS. 2A through 2D are partially enlarged cross-sectional views of a semiconductor package according to an example embodiment. For example, FIGS. 2A through 2D may respectively show embodiments of the region A of the semiconductor package 100 of FIG. 1A .

Referring to FIG. 2A , a discrete bump BP_V of material may be interposed between the first redistribution layer RDL 1 and the second TPV TPV 2 . Although one bump is shown in FIG. 2A , the number of bumps is not limited thereto. A cross section of the bump BP_V may be circular but is not limited thereto. Furthermore, overall the bump BP_V may be spherical, i.e., the bump BP_V may be a ball. The bump BP_V may include Cu, Au, Ni, Al, Ag, or an alloy including at least one of these metals. Therefore, the first redistribution layer RDL 1 and the second TPV TPV 2 may be electrically connected to each other via the bump BP_V.

Referring to the example shown in FIG. 2B , the second TPV TPV 2 may include a protrusion WDV_b protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GV_b receiving the protrusion WDV_b. According to an example, the protrusion WDV_b and the groove GV_b may have rectangular cross-sectional and complementary shapes. Although each of FIGS. 2B through 2D shows one protrusion and one groove receiving the protrusion, the numbers of protrusions and grooves are not limited thereto.

Referring to the example shown in FIG. 2C , the second TPV TPV 2 may include a protrusion WDV_c protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GV_c receiving the protrusion WDV_c. According to this example, a bottom surface of the protrusion WDV_c may has a convex profile, i.e., bulges toward the first redistribution layer RDL 1 . In other words, the first redistribution layer RDL 1 may include the groove GV_c having a concave bottom receiving the protrusion WDV_c having a convex end, and shapes that are complementary.

Referring to the example shown in FIG. 2D , the second TPV TPV 2 may include a protrusion WDV_d protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GV_d receiving the protrusion WDV_d. According to this example, the protrusion WDV_d and the groove GV_d have triangular cross-sectional shapes that are complementary.

FIGS. 3A and 3B are diagrams showing the structure of another example of a semiconductor package according to the inventive concept. Components shown in FIGS. 3A and 3B which are identical to those shown in and described above with reference to FIGS. 1A and 1B may not be described again in detail.

Referring to FIG. 3A , the semiconductor package 200 may include solder balls SB, first and second layers L 1 and L 2 , and a first redistribution layer RDL 1 . The first redistribution layer RDL 1 may be interposed between the first layer L 1 and the second layer L 2 , and each solder ball SB may be electrically connected to the first redistribution layer RDL 1 via a first TPV TPV 1 .

According to this example embodiment, a first semiconductor chip 210 and a second semiconductor chip 220 are arranged such that a first surface F 1 and a second surface F 2 of first semiconductor chip 210 and the second semiconductor chip 220 face each other, i.e., such that the chips 210 and 220 are disposed face-to-face, across the first redistribution layer RDL 1 . In this respect, the first panel PNL 1 and the second panel PNL 2 may be arranged such that the first accommodating portion AC 1 and the second accommodating portion AC 2 face each other across the first redistribution layer RDL 1 . Furthermore, the first layer L 1 and the second layer L 2 may be arranged such that the first semiconductor chip 210 and the second semiconductor chip 220 face each other while being symmetrical with respect to the first redistribution layer RDL 1 , i.e., about a plane intermediate the top and bottom surfaces of the redistribution layer RDL 1 . Therefore, the first semiconductor chip 210 and the second semiconductor chip 220 may share the first redistribution layer RDL 1 .

According to another example, a second redistribution layer may be formed on the second layer L 2 . In this case, the second layer L 2 may have one or more second TPVs. According to an example, the bottom surface of the second TPV may contact the top surface of the first second redistribution layer. Furthermore, a third layer including one or more semiconductor chips and/or one or more TPVs may be disposed on the second redistribution layer.

Referring back to FIG. 3B , a second pad 221 may be physically/electrically connected to the first redistribution layer RDL 1 . Furthermore, the second surface F 2 of the second semiconductor chip 220 may contact the top surface of the first redistribution layer RDL 1 . For example, a bottom surface of the second pad 221 may lie in substantially the same plane as the second surface F 2 of the second semiconductor chip 220 , i.e., the second semiconductor chip may have an interface with the first redistribution layer RDL 1 .

In a semiconductor package according to the inventive concept, semiconductor chips may be electrically connected to one another by TPVs and redistribution layers without wire bonding. Therefore, the number of stacked layers is not limited, and the semiconductor package may be relatively thin. Furthermore, as the semiconductor package has a structure in which a plurality of stacked semiconductor chips share a redistribution layer, signal integrity may be improved. Furthermore, a stack structure may be implemented by a redistribution process for a relatively small number of semiconductor chips.

FIGS. 4A through 4D are partially enlarged cross-sectional views of other examples of the portion B of the semiconductor package 200 of FIG. 3A .

Referring to FIG. 4A , a bump BP_P may be interposed between the first redistribution layer RDL 1 and a second pad 221 _ a . Therefore, the first redistribution layer RDL 1 and the second pad 221 _ a may be electrically connected to each other via the bump BP_P. Although one bump is shown in FIG. 4A , the number of bumps is not limited thereto. The bump BP_P may include Cu, Au, Ni, Al, Ag, or an alloy including at least one of these metals.

Referring to FIG. 4B , the second pad 221 _ b may include a protrusion WDP_b protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GR_b receiving the protrusion WDP_b. According to an example, the protrusion WDP_b and the groove GR_b may have rectangular cross-sectional shapes. As the protrusion WDP_b is inserted into the groove GR_b, the second surface F 2 of the second semiconductor chip 220 may contact the top surface of the first redistribution layer RDL 1 . Although each of FIGS. 4B through 4D shows one protrusion and one groove receiving the protrusion, the numbers of protrusions and grooves are not limited thereto.

Referring to FIG. 4C , a second pad 221 _ c may include a protrusion WDP_c protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GR_c receiving a (complementary) protrusion WDP_c. According to an example, a bottom surface of the protrusion WDP_c facing the first redistribution layer RDL 1 may have a convex profile. In other words, the first redistribution layer RDL 1 may include the groove GV_c having a bottom surface with a concave profile receiving the protrusion WDV_c whose end surface has a convex profile. As the protrusion WDP_c is inserted into the groove GR_c, the second surface F 2 of the second semiconductor chip 220 may contact the top surface of the first redistribution layer RDL 1 .

Referring to FIG. 4D , a second pad 221 _ d may include a protrusion WDP_d protruding toward the first redistribution layer RDL 1 . Furthermore, the first redistribution layer RDL 1 may include a groove GR_d receiving the protrusion WDP_d. According to an example, the protrusion WDP_d and the groove GR_d may have (complementary) triangular cross-sectional shapes. As the protrusion WDP_d is inserted into the groove GR_d, the second surface F 2 of the second semiconductor chip 220 may contact the top surface of the first redistribution layer RDL 1 .

FIG. 5 is a cross-sectional view of another example of a semiconductor package according to the inventive concept.

Referring to FIG. 5 , a semiconductor package 300 may include solder balls SB, a first stack structure ST_ 1 , and a second stack structure ST_ 2 . The second stack structure ST_ 2 may be stacked in the first direction X on the first stack structure ST_ 1 .

The first stack structure ST_ 1 may include first layer L 1 , first redistribution layer RDL 1 stacked on the first layer L 1 , and second layer L 2 stacked on the first redistribution layer RDL 1 . The first layer L 1 may include one or more first semiconductor chips 310 , a first TPV TPV 1 extending through the first layer L 1 , and first panel PNL 1 having first accommodating portion AC 1 accommodating the first semiconductor chip 310 . Additionally, the second layer L 2 may include one or more second semiconductor chips 320 , second TPV TPV 2 extending through the second layer L 2 , and second panel PNL 2 having second accommodating portion AC 2 accommodating the second semiconductor chip 320 .

The first semiconductor chip 310 may have a first surface F 1 on which a first pad 311 is exposed, and the second semiconductor chip 320 may have a second surface F 2 on which a second pad 321 is exposed. According to an example, the first semiconductor chip 310 and the second semiconductor chip 320 may be arranged such that the first surface F 1 and the second surface F 2 face each other across the first redistribution layer RDL 1 . The first panel PNL 1 and the second panel PNL 2 may be arranged such that the first accommodating portion AC 1 and the second accommodating portion AC 2 face each other across the first redistribution layer RDL 1 . Still further, the first layer L 1 and the second layer L 2 may be arranged such that the first semiconductor chip 310 and the second semiconductor chip 320 face each other while being symmetrical with respect to the first redistribution layer RDL 1 . Therefore, the first semiconductor chip 310 and the second semiconductor chip 320 may share the first redistribution layer RDL 1 .

The second stack structure ST_ 2 may include a third layer L 3 , second redistribution layer RDL 2 stacked on the third layer L 3 , and a fourth layer L 4 stacked on the second redistribution layer RDL 2 . The third layer L 3 may include one or more third semiconductor chips 330 , a third TPV TPV 3 extending through the third layer L 3 , and a third panel PNL 3 having a third accommodating portion AC 3 accommodating the third semiconductor chip 330 . Furthermore, the fourth layer L 4 may include one or more fourth semiconductor chips 340 , a fourth TPV TPV 4 extending through the fourth layer L 4 , and a fourth panel PNL 4 having a fourth accommodating portion AC 4 accommodating the fourth semiconductor chip 340 .

The third semiconductor chip 330 may have a third surface F 3 at which a third pad 331 is exposed, and the fourth semiconductor chip 340 may have a fourth surface F 4 at which a fourth pad 341 is exposed. According to an example, the third semiconductor chip 330 and the fourth semiconductor chip 340 may be arranged such that the third surface F 3 and the fourth surface F 4 face each other across the second redistribution layer RDL 2 . The third panel PNL 3 and the fourth panel PNL 4 may be arranged such that the third accommodating portion AC 3 and the fourth accommodating portion AC 4 face each other across the second redistribution layer RDL 2 . Moreover, the third layer L 3 and the fourth layer L 4 may be arranged such that the third semiconductor chip 330 and the fourth semiconductor chip 340 face each other while being symmetrical with respect to the second redistribution layer RDL 2 . Therefore, the third semiconductor chip 330 and the fourth semiconductor chip 340 may share the second redistribution layer RDL 2 .

In other words, the arrangement of the components included in the second stack structure ST_ 2 may be similar to the arrangement of the components included in the first stack structure ST_ 1 . Furthermore, the second TPV TPV 2 and the third TPV TPV 3 may be electrically connected to each other. Although not shown in FIG. 5 , bumps, protrusions, and the like including a conductive material may be interposed between the second TPV TPV 2 and the third TPV TPV 3 .

In other words, the first, second, and third semiconductor chips 310 , 320 , 330 , and 340 of the first stack structure ST_ 1 and the second stack structure ST_ 2 may exchange various signals via the electrical connection between the first stack structure ST_ 1 and the second stack structure ST_ 2 . Furthermore, when the solder balls SB are electrically connected to a device outside the semiconductor package 300 , the first, second, third, and fourth semiconductor chips 310 , 320 , 330 , and 340 may exchange various signals with the device outside the semiconductor package 300 .

FIG. 6 is a cross-sectional view of another example of a semiconductor package according to the inventive concept.

Referring to FIG. 6 , a semiconductor package 400 may include solder balls SB, a first stack structure ST_ 1 a , a second stack structure ST_ 2 a , and a first redistribution layer RDL 1 a . The second stack structure ST_ 2 a may be stacked in the first direction X on the first stack structure ST_ 1 a . The first redistribution layer RDL 1 a may be interposed between the first stack structure ST_ 1 a and the second stack structure ST_ 2 a.

The first stack structure ST_ 1 a may include a first layer L 1 a and a second layer L 2 a stacked on the first layer L 1 a . The first layer L 1 a may include one or more first semiconductor chips 410 , first TPV TPV 1 extending through the first layer L 1 a , and a first panel PNL 1 a having a first accommodating portion AC 1 _ a accommodating the first semiconductor chip 410 . The second layer L 2 a may include one or more second semiconductor chips 420 , second TPV TPV 2 extending through the second layer L 2 a , and a second panel PNL 2 a having a second accommodating portion AC 2 _ a accommodating the second semiconductor chip 420 .

According to this example, the first accommodating portion AC 1 _ a and the first panel PNL1a may have the same height or thickness, i.e., the same dimension in the first direction X. Furthermore, the second accommodating portion AC 2 _ a and the second panel PNL 2 a may have the same height or thickness. That is, the first accommodating portion AC 1 _ a in this example is an opening extending vertically through the first panel PNL 1 a . Likewise, the second accommodating portion AC 2 _ a in this example is an opening extending vertically through the second first panel PNL 2 a . Therefore, the first semiconductor chip 410 and the second semiconductor chip 420 may be respectively accommodated in the first accommodating portion AC 1 _ a and the second accommodating portion AC 2 _ a and may have the same dimensions as the first panel PNL1a and the second panel PNL 2 a in the first direction X, respectively.

Also, according to this example, the first stack structure ST_ 1 a may include one or more through silicon vias (TSVs). In more detail, the first stack structure ST_ 1 a may include one or more first TSVs TSV 1 extending through the first stack structure ST_ 1 a in the first direction X. The TSV is electrically connected to the ICs of the chip(s) through which the TSV extends.

For example, first TSV TSV 1 may extend through bodies of the first and second semiconductor chips 410 and 420 . Alternatively, when the second semiconductor chip 420 includes a pad (not shown) exposed at the second surface F 2 , the first TSV TSV 1 may extend in the first direction X from the pad exposed at the second surface F 2 through the remainder of the body of the second semiconductor chip 420 and through the body of the first semiconductor chip 410 .

The first TSV TSV 1 may include a conductive material. The conductive material may include a metal and, for example, may include at least one of copper (Cu), copper tin (CuSn), copper magnesium (CuMg), copper nickel (CuNi), copper zinc (CuZn), copper lead (CuPb), copper gold (CuAu), copper rhenium (CuRe), copper tungsten (CuW), and tungsten (W) alloys, but is not limited thereto. Although not shown, the first TSV TSV 1 may include a conductive plug and a via insulating film surrounding the conductive plug. The via insulating film may include, for example, an oxide film, a nitride film, a carbonized film, a polymer film, or a combination thereof.

The second stack structure ST_ 2 a may include a third layer L 3 a and a fourth layer L 2 a stacked on the third layer L 3 a . The third layer L 3 a may include one or more third semiconductor chips 430 , third TPV TPV 3 extending through the third layer L 3 a , and a third panel PNL 3 a having a third accommodating portion AC 3 _ a accommodating the third semiconductor chip 430 . Furthermore, the fourth layer L 4 a may include one or more fourth semiconductor chips 440 , fourth TPV TPV 4 extending through the fourth layer L 4 a , and a fourth panel PNL 4 a having a fourth accommodating portion AC 4 _ a accommodating the fourth semiconductor chip 440 .

According to this example, the third accommodating portion AC 3 _ a and the third panel PNL 3 a may have the same height or thickness, i.e., the same dimension in the first direction X. Furthermore, the fourth accommodating portion AC 4 _ a and the fourth panel PNL 4 a may have the same height or thickness, i.e., the same dimension in the first direction X. Therefore, the third semiconductor chip 430 and the fourth semiconductor chip 440 may be respectively accommodated in the third accommodating portion AC 3 _ a and the fourth accommodating portion AC 4 _ a and may have the same thicknesses as the third panel PNL 3 a and the fourth panel PNL 4 a , respectively.

According to this example, the second stack structure ST_ 2 a may include one or more TSVs. In more detail, the second stack structure ST_ 2 a may include one or more second TSVs TSV 2 extending through the second stack structure ST_ 2 a in the first direction X.

For example, the second TSV TSV 2 may extend through third and fourth semiconductor chips 430 and 440 . Alternatively, when the third semiconductor chip 430 includes a pad (not shown) exposed at the third surface F 3 , the second TSV TSV 2 may extend in the first direction X from the pad exposed at the third surface F 3 through the remainder of the third semiconductor chip 430 and through fourth semiconductor chip 440 .

According to this example, the arrangement of the components of the second stack structure ST_ 2 a may be similar to the arrangement of the components of the first stack structure ST_ 1 a . Furthermore, the first TSV TSV 1 and the second TSV TSV 2 may be electrically connected to the first redistribution layer RDL 1 a . Although not shown, bumps, protrusions, and the like including a conductive material may be interposed between the second TPV TPV 2 and the first redistribution layer RDL 1 a.

In other words, the first through fourth semiconductor chips 410 , 420 , 430 , and 440 of the first stack structure ST_ 1 a and the second stack structure ST_ 2 a may exchange various signals via the electrical connection between the first and second TSVs TSV 1 and TSV 2 of the first through fourth semiconductor chips 410 , 420 , 430 , and 440 and the first redistribution layer RDL 1 a . Furthermore, when the solder balls SB are electrically connected to a device outside the semiconductor package 400 , the first through fourth semiconductor chips 410 , 420 , 430 , and 440 may exchange various signals with the device outside the semiconductor package 400 .

FIGS. 7A through 7D illustrate an example of a process of manufacturing a semiconductor package according to the inventive concept. Components of the package similar to those already described, as indicated by like reference numerals, may not be described in detail.

Referring to FIG. 7A through 7D , first and second layers L 1 and L 2 may be formed by disposing the first and second semiconductor chips 310 and 320 and the TPVs TPV 1 and TPV 2 in the first and second panels PNL 1 and PNL 2 , respectively (operation S 10 ). For example, the first and second panels PNL 1 and PNL 2 may each be a portion of different panels or may be different portions of the same panel.

The first layer L 1 and/or the second layer L 2 may be formed by a wafer level package (WLP) process. Furthermore, the first layer L 1 and/or the second layer L 2 may be formed by a panel level package (PLP) process.

In the present embodiment, TPVs TPV 1 and TPV 2 are formed in the first and second panels PNL 1 and PNL 2 , but the inventive concept is not limited thereto. In other words, for example, a TPV may not be formed in the second panel PNL 2 .

In the illustrated example, though, the first and second TPVs TPV 1 and TPV 2 are respectively formed in the first and second panels PNL 1 and PNL 2 , and the first and second accommodating portions AC 1 and AC 2 for respectively accommodating the first and second semiconductor chips 310 and 320 are formed. For example, the first and second accommodating portions AC 1 and AC 2 are formed by forming cavities in the first and second panels PNL 1 and PNL 2 . After the first and second accommodating portions AC 1 and AC 2 are formed, the first and second semiconductor chips 310 and 320 may be placed in the cavities, respectively. The first semiconductor chip 310 may have the first surface F 1 at which the one or more first pads 311 are exposed. Furthermore, the second semiconductor chip 320 may have the second surface F 2 at which the one or more second pads 321 are exposed.

Next, the first redistribution layer RDL 1 may be formed on the first layer L 1 (operation S 20 ). For example, the first redistribution layer RDL 1 may be formed by various deposition processes like sputtering, electroplating, electroless plating, or printing. As a result, the first redistribution layer RDL 1 may be electrically connected to the first pad 311 and the first TPV TPV 1 .

Next, the first stack structure ST_ 1 may be formed by stacking the second layer L 2 on the first redistribution layer RDL 1 in the first direction X (operation S 30 ). In this step, the second layer L 2 may be stacked on the first redistribution layer RDL 1 such that the first surface F 1 and the second surface F 2 face each other across the first redistribution layer RDL 1 . Therefore, the first redistribution layer RDL 1 may be electrically connected to the first pad 311 and the second pad 321 . Furthermore, when the first layer L 1 and the second layer L 2 have the same configurations, the first layer L 1 and the second layer L 2 may be symmetric with respect to the first redistribution layer RDL 1 , i.e., about a plane intermediate the top and bottom surfaces of the first redistribution layer RDL 1 .

In one example, the top surface of the first redistribution layer RDL 1 and the bottom surface of the second pad 321 may each be planar and thus, the first redistribution layer RDL 1 and the second pad 321 may be electrically connected to each other only along a substantially planar interface. According to another example, the second pad 321 includes one or more protrusions that protrude toward the first redistribution layer RDL 1 , and the first redistribution layer RDL 1 include one or more grooves receiving the one or more protrusions. According to another example, one or more bumps are formed on the second pad 321 so as to become interposed between the second pad 321 and the first redistribution layer RDL 1 when the first redistribution layer RDL 1 is formed.

According to an example, the first redistribution layer RDL 1 may have a planar top surface and the second TPV TPV 2 may have a planar bottom surface, and the first redistribution layer RDL 1 is electrically connected to the second TPV TPV 2 along these planar surfaces, i.e., along a substantially planar interface. According to another example, the second TPV TPV 2 includes one or more protrusions that protrude toward the first redistribution layer RDL 1 , and the first redistribution layer RDL 1 has one or more grooves receiving the one or more protrusions. According to another example, one or more bumps may be formed on the bottom surface of the second TPV TPV 2 so as to become interposed between the second TPV TPV 2 and the first redistribution layer RDL 1 .

FIGS. 8A through 8D illustrate another example of a process of manufacturing a semiconductor package according to the inventive concept.

Referring to FIGS. 8A through 8D , the first stack structure ST_ 1 and the second stack structure ST_ 2 may be combined with each other (operation S 40 ). For example, the second stack structure ST_ 2 may be stacked in the first direction X on the first stack structure ST_ 1 .

According to an example, the second stack structure ST_ 2 may have a structure that is similar to that of the first stack structure ST_ 1 , i.e., may be fabricated by a process similar to the process of fabricating the first stack structure ST_ 1 . For example, the second stack structure ST_ 2 may include the third layer L 3 , the second redistribution layer RDL 2 formed on the third layer L 3 , and the fourth layer L 4 stacked on the second redistribution layer RDL 2 . The third and fourth layers L 3 and L 4 may include the third and fourth semiconductor chips 330 and 340 and the third and fourth TPVs TPV 3 and TPV 4 , respectively.

In the illustrated example, the fourth layer L 4 is stacked on the second redistribution layer RDL 2 such that the third surface F 3 of the third semiconductor chip 330 and the fourth surface F 4 of the fourth semiconductor chip 340 face each other across the second redistribution layer RDL 2 . For example, when the third layer L 3 and the fourth layer L 4 have the same configurations, the third layer L 3 and the fourth layer L 4 may be symmetric with respect to the second redistribution layer RDL 2 . Therefore, the second redistribution layer RDL 2 may be electrically connected to the third pad 331 of the third semiconductor chip 330 and the fourth pad 341 of the fourth semiconductor chip 340 .

Next, a laminating process for producing a structure in which the first stack structure ST_ 1 and the second stack structure ST_ 2 are made integral is performed (operation S 50 ). For example, the laminating process may include applying heat and pressure to a structure in which the second stack structure ST_ 2 is stacked on the first stack structure ST_ 1 such that the second stack structure ST_ 2 is attached to the first stack structure ST_ 1 .

Furthermore, a first insulation layer IL 1 may be formed on the second stack structure ST_ 2 . The first insulation layer IL 1 may include, for example, an oxide layer, a nitride layer, a polymer layer, or a combination thereof.

Next, solder balls SB may be bonded to the first stack structure ST_ 1 (operation S 60 ). For example, a solder ball SB may be bonded to the bottom (exposed) surface of each of the one or more first TPVs TPV 1 . The solder ball SB may provide an electrical connection path between the first and second stack structures ST_ 1 and ST_ 2 and an external chip or an external device, for example.

FIG. 9 shows an example of a semiconductor package 400 according to the inventive concept. Components of the example of FIG. 9 that are identical to those shown in and described above with reference to FIG. 5 may not be described in detail.

Referring to FIG. 9 , the semiconductor package 400 includes solder balls SB 1 and SB 2 , a fifth panel PNL 5 , third redistribution layer RDL 3 stacked in the first direction X on the fifth panel PNL 5 , fifth semiconductor chip 450 electrically connected to the third redistribution layer RDL 3 through a fifth pad 451 , and a molding layer MD covering the fifth semiconductor chip 450 . Furthermore, the semiconductor package 400 may further include a fifth TPV TPV 5 that is electrically connected to a solder ball SB 1 and the third redistribution layer RDL 3 by extending through the molding layer MD, and a sixth TPV TPV 6 that is electrically connected to the third redistribution layer RDL 3 and a solder ball SB 2 by extending through the fifth panel PNL 5 .

The molding layer MD may encapsulate the fifth semiconductor chip 450 and thereby mold the chip 450 to the fifth panel PNL 5 . At least a portion of the fifth TPV 5 TPV 5 may be exposed through the molding layer MD. The molding layer MD may include a polymer layer such as a resin-based layer. The molding layer MD may include, for example, an epoxy molding compound (EMC).

The fifth semiconductor chip 450 may be a memory chip or a logic chip. For example, when the first through fourth semiconductor chips 410 through 440 are memory chips, the fifth semiconductor chip 450 may include a memory controller for controlling the first through fourth semiconductor chips 410 through 440 . The semiconductor package 400 may constitute, for example, a system-on-chip (SoC) or a system-in-package (SIP).

The semiconductor package 400 may further include first insulation layer ILL a second insulation layer IL 2 , and an additional layer AD between the first insulation layer IL 1 and the second insulation layer IL 2 . According to an example, the additional layer AD includes an element such as a capacitor or an inductor. Alternatively, the additional layer AD is similar to any of the first through fourth layers L 1 through L 4 , thereby including additional semiconductor chips.

FIG. 10 illustrates an electronic system 1000 including a semiconductor package according to the inventive concept.

The electronic system 1000 includes a controller 1010 , an input unit 1020 , an output unit 1030 , and a storage 1040 , and may further include a communicator 1050 and/or a miscellaneous operation unit 1060 .

The controller 1010 may collectively control the electronic system 1000 and its components. The controller 1010 may be a central processing unit or a central controller. The input unit 1020 may output an electrical command signal to the controller 1010 . The input unit 1020 may be a keyboard, a keypad, a mouse, a touchpad, an image reader like a scanner, or various input sensors. The output unit 1030 may receive an electrical command signal from the controller 1010 and output results processed by the electronic system 1000 . The output unit 1030 may include a monitor, a printer, a beam irradiator, or various mechanical devices.

The storage 1040 may be a component for temporarily or permanently storing an electrical signal processed or to be processed by the controller 1010 . The storage 1040 may be physically and electrically connected or combined with the controller 1010 . The communicator 1050 may receive an electrical command signal from the controller 1010 and exchange an electrical signal with another electronic system. The miscellaneous operation unit 1060 may perform a physical or mechanical operation in response to a command from the controller 1010 .

At least one of the controller 1010 , the input unit 1020 , the output unit 1030 , the storage 1040 , the communicator 1050 , and the miscellaneous operation unit 1060 includes a semiconductor package of any of the examples shown in and described FIGS. 1A through 9 . Therefore, the volume of the electronic system 1000 may be minimal.

Although the inventive concept has been particularly shown and described with reference to various examples thereof, it will be understood that various changes in form and details may be made to such examples without departing from the spirit of the inventive concept and scope of the following claims.