Electronic device and method of manufacturing the same

This application claims priority to and the benefits of Korean Patent Application No. 10-2017-0065587, filed on May 26, 2017 under 35 U.S.C. § 119, the disclosure of which is herein incorporated by reference in its entirety.

1. Field

Embodiments of the present disclosure relate to an electronic device and, more particularly, to an electronic device with improved visibility and a method of manufacturing the same.

2. Description of the Related Art

An electronic device is activated by an electrical signal applied thereto. An electronic device may include a display device that is configured to display an image or a touch screen that is configured to sense a touch provided from the outside.

An electronic device may include various electrode patterns to be activated by an electrical signal. An area in which electrode patterns are activated may display information or may respond by a touch provided from the outside.

Embodiments of the present disclosure may provide an electronic device capable of preventing touch sensors from being viewed by reflection of external light.

Embodiments of the present disclosure may also provide a method of manufacturing an electronic device that is capable of forming a touch sensor with improved visibility.

In an aspect, an electronic device includes a display member including a plurality of display elements and divided into light emitting areas, in which the display elements are respectively disposed, and a peripheral area adjacent to the light emitting areas when viewed from a plan view, and a sensing member including a first sensing pattern disposed on the display member and a second sensing pattern disposed on the display member and capacitively coupled to the first sensing pattern. Each of the first and second sensing patterns includes a plurality of mesh lines disposed in the peripheral area to define a plurality of openings overlapping with the light emitting areas, respectively. Each of the first and second sensing patterns includes a unit mesh pattern including a central opening and a plurality of peripheral openings surrounding the central opening. The central opening and the peripheral openings are included in the plurality of openings. A plurality of cutting lines, each of which opens at least two adjacent openings of the plurality of peripheral openings to each other, are defined in the unit mesh pattern. The cutting lines are arranged in a direction surrounding the central opening.

Each of the cutting lines may be defined to connect centers of some of the peripheral openings, and portions of the mesh lines that overlap with the cutting lines may be cut to open the peripheral openings.

The peripheral openings may be arranged to surround the central opening in the unit mesh pattern, and the unit mesh pattern may have a shape corresponding to a shape of the opening.

The unit mesh pattern may include a central mesh pattern in which the central opening is defined, the central mesh pattern having a quadrilateral shape, and a sub-mesh pattern in which the peripheral openings are defined, the sub-mesh pattern having a frame shape surrounding the central mesh pattern. The cutting lines may be spaced apart from each other in the sub-mesh pattern and may be arranged in a clockwise direction or counterclockwise direction around the central mesh pattern.

The sub-mesh pattern may include first sub-mesh patterns that are respectively adjacent to four sides of the central mesh pattern, wherein first cutting lines are defined in the first sub-mesh patterns, and second sub-mesh patterns that are respectively adjacent to four vertexes of the central mesh pattern, wherein second cutting lines are defined in the second-sub-mesh patterns. In such an embodiment, i peripheral openings may be defined in each of the first sub-mesh patterns where ‘i’ is a natural number, and i×i peripheral openings may be defined in each of the second sub-mesh patterns.

Each of the first cutting lines may have a line shape that extends in a direction intersecting adjacent one of the four sides of the central mesh pattern.

Each of the second cutting lines may have a closed-loop shape.

Each of the second cutting lines may have an X-shape.

The sub-mesh pattern may include a first sub-mesh pattern that has a quadrilateral frame shape surrounding an edge of the central mesh pattern, wherein first cutting lines are defined in the first sub-mesh pattern, and a second sub-mesh pattern that has a quadrilateral frame shape surrounding the first sub-mesh pattern, wherein second cutting lines are defined in the second sub-mesh pattern. Each of the first cutting lines may have a straight line shape, and each of the first cutting lines may extend in parallel to adjacent one of four sides of the central mesh pattern.

The second cutting lines may have the same shapes as the first cutting lines, and each of the second cutting lines may extend in parallel to adjacent one of four sides of the first sub-mesh pattern.

Each of the second cutting lines may have a bent line shape, and the second cutting lines may be respectively adjacent to four vertexes of the first sub-mesh pattern and are arranged to surround the four vertexes.

A plurality of unit mesh patterns may be arranged. and outermost mesh lines of adjacent unit mesh patterns overlap with each other.

A plurality of unit mesh patterns may be arranged, and at least one of the cutting lines of one unit mesh pattern is connected to a corresponding one of the cutting lines of another unit mesh pattern that is adjacent to the one unit mesh pattern.

In another aspect, a method of manufacturing an electronic device includes providing an initial mesh substrate including first mesh lines extending in parallel to each other in a first direction and second mesh lines extending in parallel to each other in a second direction that intersects the first direction, the initial mesh substrate including a plurality of unit mesh patterns in which cutting lines that cut portions of the first and second mesh lines are defined, cutting the first and second mesh lines along a boundary line connecting at least some of the cutting lines to form a plurality of sensing patterns, and forming an insulating layer on the plurality of sensing patterns. The cutting lines include a line that extends in the first direction or the second direction and links centers of two openings adjacent to each other.

The unit mesh pattern may include a central mesh pattern in which a central opening is defined, and a sub-mesh pattern in which peripheral openings that surround the central opening are defined. The cutting lines may be defined in the sub-mesh pattern to open at least two of the peripheral openings to each other.

The cutting lines may be spaced apart from each other and may be arranged in a clockwise direction or counterclockwise direction around the central mesh pattern.

At least one of the cutting lines may have a cross shape that includes a first pattern extending in the first direction and a second pattern extending in the second direction and crossing over the first pattern. A crossing point of the first and second patterns may be a center of one of the peripheral openings.

At least one of the cutting lines may have a closed-loop shape.

The cutting of the first and second mesh lines along the boundary line may include cutting the mesh lines disposed between the at least some of the cutting lines, and each of the at least some of the cutting lines may entirely overlap with the boundary line.

The method may further include forming a bridge pattern connecting some of the plurality of sensing patterns on the insulating layer. The forming of the insulating layer may include forming an insulating layer covering the plurality of sensing patterns, and forming a contact hole in the insulating layer.

The above and other aspects and features of the present disclosure will become more apparent by describing in further detail exemplary embodiments thereof with reference to the accompanying drawings, in which:

FIG. 1 is a perspective view illustrating an electronic device according to an embodiment of the present disclosure.

FIG. 2 is a plan view of the electronic device illustrated in FIG. 1 .

FIG. 3A is an enlarged plan view illustrating an area ‘XX’ of FIG. 2 .

FIG. 3B is a cross-sectional view taken along a line I-I′ of FIG. 3A .

FIG. 4A is an enlarged plan view illustrating some elements of FIG. 3A .

FIGS. 4B and 4C are plan views illustrating some elements of FIG. 4A .

FIG. 4D is a plan view illustrating another example of some elements of FIG. 4A .

FIG. 5A is a plan view illustrating a unit mesh pattern according to an embodiment of the present disclosure.

FIGS. 5B and 5C are plan views illustrating some elements of the unit mesh pattern of FIG. 5A .

FIG. 6A is a plan view illustrating a unit mesh pattern according to an embodiment of the present disclosure.

FIG. 6B is a plan view illustrating some elements of the unit mesh pattern of FIG. 6A .

FIGS. 7A, 7B, 7C, 7D, 7E and 7F are plan views related to a unit mesh pattern according to an embodiment of the present disclosure.

FIGS. 8A, 8B and 8C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure.

FIGS. 9A, 9B and 9C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure.

FIGS. 10A, 10B and 10C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure.

FIGS. 11A, 11B and 11C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure.

Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view illustrating an electronic device according to an embodiment of the present disclosure. An electronic device EA is activated by an electrical signal applied thereto. The electronic device EA may have an active area AA and a peripheral area NAA on a plane that is defined by a first direction D 1 and a second direction D 2 .

The active area AA may be electrically activated when an electrical signal is supplied thereto. The active area AA may be used to activate various function on the basis of a use of the electronic device EA.

For example, the active area AA may correspond to a sensing area that senses an input provided from the outside. As illustrated in FIG. 1 , the electronic device EA may sense an external input TC applied to the active area AA. In this regard, the electronic device EA may function as an input device.

The external input TC corresponds to a finger of a user in FIG. 1 . However, embodiments of the present disclosure are not limited thereto. The external input TC may be provided in various forms. For example, the external input TC may be, but not limited to, a contact or a touch of a portion of a human body (e.g., a finger of a user), a force, a pressure, and/or light.

The active area AA may correspond to, for example, a display area that displays predetermined information. The electronic device EA may display an image on the active area AA, and a user may obtain information through the image. In this regard, the electronic device EA may function as an output device.

The peripheral area NAA is disposed to be adjacent to the active area AA. Even though an electrical signal is applied, the peripheral area NAA may neither display an image nor sense an external input.

Signal lines and/or driving elements may be disposed in the peripheral area NAA. The signal lines may be provided for applying signals from the outside to the active area AA, and the driving elements may be provided for driving the active area AA. The peripheral area NAA may be disposed to be adjacent to a side of the active area AA.

In the present embodiment, the peripheral area NAA has a frame shape that surrounds the active area AA. However, embodiments of the present disclosure are not limited thereto. In one embodiment, the peripheral area NAA may be omitted in the electronic device EA. In some embodiments, the shape of the peripheral area NAA may be variously defined and may not be limited to a specific shape.

FIG. 1 illustrates a touch screen device as an example of the electronic device EA. However, embodiments of the present disclosure are not limited thereto. In a certain embodiment, a display function may be omitted in the electronic device EA.

FIG. 2 is a plan view of the electronic device illustrated in FIG. 1 . FIG. 3A is an enlarged plan view illustrating an area ‘XX’ of FIG. 2 , and FIG. 3B is a cross-sectional view taken along a line I-I′ of FIG. 3A . For the purpose of ease and convenience in description and illumination, some elements are omitted in FIGS. 2, 3A , and 3 B. Hereinafter, an electronic device EA according to an embodiment of the present disclosure will be described in detail with reference to FIGS. 2, 3A, and 3B .

As illustrated in FIG. 3B , the electronic device EA includes a display member DM and a sensing member SM. In the present embodiment, the sensing member SM is disposed on the display member DM. In the present embodiment, the sensing member SM is illustrated as a single-layered sensing member. However, embodiments of the present disclosure are not limited thereto.

The sensing member SM includes first touch electrodes TE 1 - 1 , TE 1 - 2 , TE 1 - 3 , and TE 1 - 4 , second touch electrodes TE 2 - 1 , TE 2 - 2 , TE 2 - 3 , TE 2 - 4 , and TE 2 - 5 , first touch signal lines SL 1 - 1 , SL 1 - 2 , SL 1 - 3 , and SL 1 - 4 that are respectively connected to the first touch electrodes TE 1 - 1 , TE 1 - 2 , TE 1 - 3 , and TE 1 - 4 , second touch signal lines SL 2 - 1 , SL 2 - 2 , SL 2 - 3 , SL 2 - 4 , and SL 2 - 5 that are respectively connected to the second touch electrodes TE 2 - 1 , TE 2 - 2 , TE 2 - 3 , TE 2 - 4 , and TE 2 - 5 , touch pads PADa, and a cover layer CVL.

The first touch electrodes TE 1 - 1 , TE 1 - 2 , TE 1 - 3 , and TE 1 - 4 and the second touch electrodes TE 2 - 1 , TE 2 - 2 , TE 2 - 3 , TE 2 - 4 , and TE 2 - 5 may be disposed in the active area AA. The first touch signal lines SL 1 - 1 , SL 1 - 2 , SL 1 - 3 , and SL 1 - 4 , the second touch signal lines SL 2 - 1 , SL 2 - 2 , SL 2 - 3 , SL 2 - 4 , and SL 2 - 5 , and the touch pads PADa may be disposed in the peripheral area NAA.

The first touch electrodes TE 1 - 1 , TE 1 - 2 , TE 1 - 3 , and TE 1 - 4 extend in the second direction D 2 and are arranged in the first direction D 1 . Each of the first touch electrodes TE 1 - 1 , TE 1 - 2 , TE 1 - 3 , and TE 1 - 4 may include a plurality of first sensing patterns SP 1 . The first sensing patterns SP 1 are arranged in the second direction D 2 and are connected to each other through first connection portions CP 1 .

The second touch electrodes TE 2 - 1 , TE 2 - 2 , TE 2 - 3 , TE 2 - 4 , and TE 2 - 5 extend in the first direction D 1 and are arranged in the second direction D 2 . Each of the second touch electrodes TE 2 - 1 , TE 2 - 2 , TE 2 - 3 , TE 2 - 4 , and TE 2 - 5 may include a plurality of second sensing patterns SP 2 . The second sensing patterns SP 2 are insulated from and intersect the first sensing patterns SP 1 . The second sensing patterns SP 2 are arranged in the first direction D 1 and are connected to each other through second connection portions CP 2 .

The touch pads PADa are connected to the first touch signal lines SL 1 - 1 , SL 1 - 2 , SL 1 - 3 , and SL 1 - 4 and the second touch signal lines SL 2 - 1 , SL 2 - 2 , SL 2 - 3 , SL 2 - 4 , and SL 2 - 5 . The sensing member SM transmits/receives electrical signals through the first touch signal lines SL 1 - 1 , SL 1 - 2 , SL 1 - 3 , and SL 1 - 4 and the second touch signal lines SL 2 - 1 , SL 2 - 2 , SL 2 - 3 , SL 2 - 4 , and SL 2 - 5 to activate the first sensing patterns SP 1 and the second sensing patterns SP 2 .

In one embodiment, the first sensing patterns SP 1 and the second sensing patterns SP 2 are capacitively coupled to each other. The sensing member SM may sense information of the external input TC (see FIG. 1 ) by measuring variations in capacitance between the first sensing patterns SP 1 and the second sensing patterns SP 2 caused by the external input TC.

Referring to FIG. 3A , each of the first sensing patterns SP 1 and the second sensing patterns SP 2 may have a mesh shape. In more detail, each of the first and second sensing patterns SP 1 and SP 2 includes a plurality of mesh lines defining a plurality of touch openings TS-OP.

FIG. 3A illustrates planar arrangement relation between the display member DM and the sensing member SM. For the purpose of ease and convenience in description and illumination, planar shapes of light emitting areas PXA are illustrated together with the first sensing patterns SP 1 and the second sensing patterns SP 2 in FIG. 3A .

Each of the light emitting areas PXA may display a red color, a green color, or a blue color. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the light emitting areas PXA may further include light emitting areas, each of which displays a magenta color, a cyan color, or a white color. Sizes (or areas) of the light emitting areas PXA may be different from each other on the basis of the colors displayed by the light emitting areas PXA.

In the present embodiment, the light emitting areas PXA may be arranged in a fourth direction D 4 and a fifth direction D 5 . The fourth direction D 4 intersects the first and second directions D 1 and D 2 , and the fifth direction intersects the fourth direction D 4 . In the present embodiment, each of the light emitting areas PXA may have a diamond shape having sides that are defined by the fourth and fifth directions D 4 and D 5 .

In FIG. 3A , the first and second sensing patterns SP 1 and SP 2 are shaded for the purpose of easy identification. The first and second sensing patterns SP 1 and SP 2 are disposed to overlap with a non-light emitting area NPXA.

As described above, each of the first and second sensing patterns SP 1 and SP 2 includes the plurality of mesh lines. The mesh lines are disposed in the non-light emitting area NPXA.

In more detail, each of the first sensing patterns SP 1 includes a plurality of first mesh lines MSL 1 -A extending in the fourth direction D 4 and spaced apart from each other in the fifth direction D 5 , and a plurality of second mesh lines MSL 2 -A extending in the fifth direction D 5 and spaced apart from each other in the fourth direction D 4 . The second mesh lines MSL 2 -A are cross-linked to the first mesh lines MSL 1 -A. Each of the second sensing patterns SP 2 includes a plurality of first mesh lines MSL 1 -B and a plurality of second mesh lines MSL 2 -B that are cross-linked to the first mesh lines MSL 1 -B.

The first mesh lines MSL 1 -A and the second mesh lines MSL 2 -A define the touch openings TS-OP. Likewise, the first mesh lines MSL 1 -B and the second mesh lines MSL 2 -B also define the touch openings TS-OP.

The touch openings TS-OP may have diamond shapes corresponding to the shapes of the light emitting areas PXA and may be defined in areas respectively corresponding to the light emitting areas PXA. Areas of the touch openings TS-OP may be equal to or greater than areas of the light emitting areas PXA when viewed in a plan view. Each of the touch openings TS-OP may entirely overlap with a corresponding one of the light emitting areas PXA.

Referring to FIG. 3B , the display member DM may include a base layer BSL, a pixel defining layer PDL, display elements DEM, and a sealing layer EC. FIG. 3B illustrates a first light emitting area PXA 1 and a second light emitting area PXA 2 of the light emitting areas PXA.

Even though not shown in the drawings, the base layer BSL may include a plurality of insulating layers and a plurality of conductive layers. Thin film transistors and capacitors that are connected to the display elements DEM may be formed in the plurality of conductive layers and the plurality of insulating layers.

Each of the display elements DEM is disposed on the base layer BSL. The display element DEM may emit light in response to an electrical signal transmitted through the connected thin film transistor and capacitor, thereby displaying an image.

Various display elements may be used as the display element DEM. For example, the display element DEM may be an electrophoretic element, a liquid crystal capacitor, an electro-wetting element, or an organic light emitting element. In the present embodiment, the organic light emitting element is described as an example of the display element DEM.

The pixel defining layer PDL is disposed on the base layer BSL. Openings OP are defined in the pixel defining layer PDL. Each of the openings OP may define an area in which one display element DEM is formed.

The display element DEM includes a first electrode ELL a light emitting layer EML, and a second electrode EL 2 . The display element DEM may activate the light emitting layer EML by a potential difference between the first and second electrodes EL 1 and EL 2 , thereby emitting light. Thus, the light emitting areas PXA may correspond to areas in which the light emitting layers EML are disposed.

On the other hand, a size (or an area) of the first light emitting area PXA 1 may be different from that of the second light emitting area PXA 2 . In the present embodiment, the size (or the area) of the second light emitting area PXA 2 is greater than that of the first light emitting area PXA 1 . This is because a color of light emitted from the first light emitting area PXA 1 is different from a color of light emitted from the second light emitting area PXA 2 as described above. Thus, it is possible to improve light efficiencies of the light emitting areas that emit lights of different colors.

The sealing layer EC covers the display elements DEM and the pixel defining layer PDL. The sealing layer EC may include a plurality of organic and/or inorganic layers. The sealing layer EC prevents moisture from permeating into the display element DEM and protects the display element DEM. In addition, the sealing layer EC electrically isolates the display member DM from the sensing member.

The sensing member SM is disposed on the sealing layer EC of the display member DM. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the sensing member SM may be disposed under the sealing layer EC, or a member (not shown) such as a color filter may be disposed between the sensing member SM and the sealing layer EC.

The sensing member SM may include the cover layer CVL, as described above. The cover layer CVL is disposed on the sensing patterns SP 1 and SP 2 to protect the sensing patterns SP 1 and SP 2 . The cover layer CVL includes an insulating material.

As illustrated in FIG. 3B , the first mesh line MSL 1 -B and the second mesh line MSL 2 -B are disposed to overlap with the pixel defining layer PDL when viewed in a plan view. The first mesh line MSL 1 -B and the second mesh line MSL 2 -B do not overlap with the light emitting areas PXA 1 and PXA 2 .

Thus, the influence of the sensing patterns SP 1 and SP 2 on displaying characteristics of the electronic device EA may be reduced, and the mesh lines MSL 1 -B and MSL 2 -B can be formed of an opaque material to increase or improve the degree of freedom for selecting a material of the sensing patterns SP 1 and SP 2 .

Meanwhile, in the present embodiment, each of the mesh lines may have a shape that is partially cut. In more detail, as illustrated in FIG. 3A , each of the first mesh lines MSL 1 -A and MSL 1 -B includes first cutting portions TS-CP 1 that are partially cut. Each of the second mesh lines MSL 2 -A and MSL 2 -B includes second cutting portions TS-CP 2 that are partially cut. Thus, a cut space CC may be formed as illustrated in FIG. 3B . The cut space CC may correspond to a region that is defined by the cutting portion formed by removing a portion of the mesh line.

The sensing patterns SP 1 and SP 2 according to an embodiment of the present disclosure include the cut spaces CC including the first cutting portions TS-CP 1 and the second cutting portions TS-CP 2 , thereby reducing differences in reflectivity between the insides of the sensing patterns SP 1 and SP 2 and boundaries of the sensing patterns SP 1 and SP 2 . As a result, a problem that sensing patterns SP 1 and SP 2 are viewed by reflection of external light may be prevented to realize the electronic device EA with improved visibility.

Referring again to FIG. 2 , even though not shown in detail in the drawings, the first touch signal lines SL 1 - 1 to SL 1 - 4 and the second touch signal lines SL 2 - 1 to SL 2 - 5 may also include mesh lines. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the first touch signal lines SL 1 - 1 to SL 1 - 4 and the second touch signal lines SL 2 - 1 to SL 2 - 5 may be, but not limited to, linear conductive patterns.

FIG. 4A is an enlarged plan view illustrating some elements of FIG. 3A . FIGS. 4B and 4C are plan views illustrating some elements of FIG. 4A . For the purpose of ease and convenience in description and illumination, FIGS. 4B and 4C illustrate elements included in layers different from each other.

In more detail, FIG. 4B illustrates elements, included in a first layer A 1 , among elements illustrated in FIG. 4A , and FIG. 4C illustrates elements, included in a second layer A 2 , among the elements illustrated in FIG. 4A . The second layer A 2 is disposed on the first layer A 1 . Hereinafter, an embodiment of the present disclosure will be described with reference to FIGS. 4A to 4C . Meanwhile, the same elements as described with reference to FIGS. 1, 2, 3A, and 3B are indicated by the same reference designators, and the descriptions thereof are omitted for the purpose of ease and convenience in description and illumination.

FIG. 4A is an enlarged view that illustrates the connection portion connecting the first sensing patterns SP 1 and the connection portion connecting the second sensing patterns SP 2 . A first bottom-side sensing pattern SSP 1 _ 1 and a first top-side sensing pattern SSP 1 _ 2 are illustrated as some of the first sensing patterns SP 1 in FIG. 4A , and a second right-side sensing pattern SSP 2 _ 1 and a second left-side sensing pattern SSP 2 _ 2 are illustrated as some of the sensing patterns SP 2 in FIG. 4A .

Each of the first sensing patterns SP 1 and the second sensing patterns SP 2 includes first mesh lines MSL 1 extending in the fourth direction D 4 and second mesh lines MSL 2 extending in the fifth direction D 5 . Meanwhile, sizes (or areas) of the touch openings TS-OP defined by the first mesh lines MSL 1 and the second mesh lines MSL 2 are shown to be equal to each other in FIGS. 4A and 4B for the purpose of ease and convenience in description and illumination.

In the present embodiment, the first connection portion CP 1 is disposed in a layer different from a layer in which the first sensing patterns SP 1 , the second sensing patterns SP 2 , and the second connection portion CP 2 are disposed. Referring to FIGS. 4A and 4B , the first sensing patterns SP 1 , the second sensing patterns SP 2 , and the second connection portion CP 2 have mesh shapes and are included in the first layer A 1 .

Some of the mesh lines MSL 1 and MSL 2 of the second right-side sensing pattern SSP 2 _ 1 and the second left-side sensing pattern SSP 2 _ 2 extend to define the second connection portion CP 2 . In the present embodiment, the second connection portion CP 2 may have a mesh shape having two touch openings TS-OP and may extend in the first direction D 1 . The first bottom-side sensing pattern SSP 1 _ 1 and the first top-side sensing pattern SSP 1 _ 2 are spaced apart from each other with the second connection portion CP 2 interposed therebetween.

The first sensing patterns SP 1 and the second sensing patterns SP 2 include the cutting portions TS-CP, as described above. Each of the first bottom-side sensing pattern SSP 1 _ 1 and the first top-side sensing pattern SSP 1 _ 2 includes the cutting portions TS-CP that are spaced apart from each other and are formed in the first mesh lines MSL 1 and/or the second mesh lines MSL 2 . Likewise, the cutting portions TS-CP are formed in the second right-side sensing pattern SSP 2 _ 1 and the left-side sensing pattern SSP 2 _ 2 .

Meanwhile, areas from which the touch openings TS-OP are removed exist in the second right-side sensing pattern SSP 2 _ 1 and the second left-side sensing pattern SSP 2 _ 2 . In other words, each of the second right-side sensing pattern SSP 2 _ 1 and the second left-side sensing pattern SSP 2 _ 2 has portions in which the first mesh lines MSL 1 and the second mesh lines MSL 2 are removed.

These removed portions of the mesh lines may be provided in areas where the first connection portion CP 1 is placed preventing overlapping between the first connection portion CP 1 and the second sensing patterns SP 2 . Since the portions of the mesh lines of the second right-side and left-side sensing patterns SSP 2 _ 1 and SSP 2 _ 2 are removed in areas that overlap with the first connection portion CP 1 , the first connection portion CP 1 may not overlap with the second sensing patterns SP 2 , thereby preventing occurrence of a parasitic capacitor or a short between the first connection portion CP 1 and the second sensing patterns SP 2 , and improving reliability of the electronic device.

Referring to FIGS. 4A and 4C , the first connection portion CP 1 is disposed in the layer different from the layer in which the first sensing patterns SP 1 are disposed. In the present embodiment, the first connection portion CP 1 is disposed in the second layer A 2 .

Thus, the first connection portion CP 1 is connected to the first sensing patterns SP 1 through contact holes CH. The first bottom-side sensing pattern SSP 1 _ 1 and the first top-side sensing pattern SSP 1 _ 2 that are spaced apart from each other are electrically connected to each other through the first connection portion CP 1 .

The first connection portion CP 1 includes a first extension EX 1 and a second extension EX 2 that are spaced apart from each other in the first direction D 1 with the second connection portion CP 2 interposed therebetween when viewed in a plan view. The first extension EX 1 and the second extension EX 2 may be symmetrical with respect to the second connection portion CP 2 .

Each of the first extension EX 1 and the second extension EX 2 may be provided in plurality. In more detail, there are two first extensions EX 1 including first, second, third, and fourth sub-extensions EX 1 _ 1 , EX 1 _ 2 , EX 1 _ 3 , and EX 1 _ 4 . The first sub-extension EX 1 _ 1 and the third sub-extension EX 1 _ 3 are connected to each other to constitute one of the first extensions EX 1 , and the second sub-extension EX 1 _ 2 and the fourth sub-extension EX 1 _ 4 are connected to each other to constitute the other of the first extensions EX 1 .

Similarly, there are two second extensions EX 2 including fifth, sixth, seventh, and eighth sub-extensions EX 2 _ 1 , EX 2 _ 2 , EX 2 _ 3 , and EX 2 _ 4 . The fifth sub-extension EX 2 _ 1 and the seventh sub-extension EX 2 _ 3 are connected to each other to constitute one of the second extensions EX 2 , and the sixth sub-extension EX 2 _ 2 and the eighth sub-extension EX 2 _ 4 are connected to each other to constitute the other of the second extensions EX 2 .

Each of the first and second extensions EX 1 and EX 2 is connected to the first sensing patterns SP 1 through a respective contact hole CH. Since the first sensing patterns SP 1 are electrically connected to each other through the plurality of extensions EX 1 and EX 2 , an electrical signal can be transmitted between the first sensing patterns SP 1 while reducing electrical noise and improving touch sensitivity.

On the other hand, as illustrated in FIG. 4D , a first connection portion CP 1 - 1 according to another embodiment may include first extensions EX 1 - 1 that are connected to each other, and second extensions EX 2 - 1 that are connected to each other.

The first extensions EX 1 - 1 may include first, second, third, and fourth sub-extensions EX 1 - 1 _ 1 , EX 1 - 1 _ 2 , EX 1 - 1 _ 3 , and EX 1 - 1 _ 4 respectively corresponding to the first, second, third, and fourth sub-extensions EX 1 _ 1 , EX 1 _ 2 , EX 1 _ 3 , and EX 1 _ 4 illustrated in FIG. 4C and may further include first and second connection extensions EX 1 - 1 _ 5 and EX 1 - 1 _ 6 . The first connection extension EX 1 - 1 _ 5 extends in the fourth direction D 4 to connect the third and fourth sub-extensions EX 1 - 1 _ 3 and EX 1 - 1 _ 4 to each other, and the second connection extension EX 1 - 1 _ 6 extends in the fifth direction D 5 to connect the first and second sub-extensions EX 1 - 1 _ 1 and EX 1 - 1 _ 2 . Thus, the first extensions EX 1 - 1 may be connected to each other to constitute a single electrode pattern.

The second extensions EX 2 - 1 and the first extensions EX 1 - 1 are symmetrical with respect to an imaginary line extending in the second direction D 2 therebetween. Thus, the second extensions EX 2 - 1 may include fifth, sixth, seventh, and eighth sub-extensions EX 2 - 1 _ 1 , EX 2 - 1 _ 2 , EX 2 - 1 _ 3 , and EX 2 - 1 _ 4 respectively corresponding to the fifth, sixth, seventh, and eighth sub-extensions EX 2 _ 1 , EX 2 _ 2 , EX 2 _ 3 , and EX 2 _ 4 illustrated in FIG. 4C and may further include third and fourth connection extensions EX 2 - 1 _ 5 and EX 2 - 1 _ 6 . Thus, the second extensions EX 2 - 1 may be connected to each other to constitute a single electrode pattern.

An electronic device according to an embodiment of the present disclosure may include at least one of electrode patterns having various shapes and may not be limited to a specific embodiment.

FIG. 5A is a plan view illustrating a unit mesh pattern according to an embodiment of the present disclosure. FIGS. 5B and 5C are plan views illustrating some elements of the unit mesh pattern of FIG. 5A .

FIG. 5A illustrates a partial area, corresponding to a unit mesh pattern UN, among the first sensing patterns SP 1 and the second sensing patterns SP 2 illustrated in FIG. 2A . Each of the first and second sensing patterns SP 1 and SP 2 may have a shape in which the unit mesh patterns UN are repeatedly and continuously arranged.

Referring to FIG. 5A , the unit mesh pattern UN may be defined by eight mesh lines intersecting each other. In more detail, the unit mesh pattern UN may be defined by first to fourth mesh lines MSL 11 , MSL 12 , MSL 13 , and MSL 14 extending in parallel to each other in the fourth direction D 4 and fifth to eighth mesh lines MSL 21 , MSL 22 , MSL 23 , and MSL 24 extending in parallel to each other in the fifth direction D 5 .

The first to fourth mesh lines MSL 11 , MSL 12 , MSL 13 , and MSL 14 may substantially correspond to some of the first mesh lines MSL 1 illustrated in FIG. 4A , and the fifth to eighth mesh lines MSL 21 , MSL 22 , MSL 23 , and MSL 24 may substantially correspond to some of the second mesh lines MSL 2 illustrated in FIG. 4A .

The unit mesh pattern UN according to an embodiment of the present disclosure may include a plurality of openings. The number of the plurality of openings may be (2N+1)×(2N+1) where ‘N’ is a natural number, and the plurality of openings may be arranged in a matrix form defined by the fourth and fifth directions D 4 and D 5 .

For example, as illustrated in FIG. 5A , the unit mesh pattern UN may include nine openings that are arranged in a 3×3 matrix form. The openings may include a central opening OP 10 and peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c.

The central opening OP 10 may be disposed at a center of the unit mesh pattern UN. The second and third mesh lines MSL 12 and MSL 13 among the first to fourth mesh lines MSL 11 to MSL 14 may be relatively close to the center of the unit mesh pattern UN, and the sixth and seventh mesh lines MSL 22 and MSL 23 among the fifth to eighth mesh lines MSL 21 to MSL 24 may be relatively close to the center of the unit mesh pattern UN. The central opening OP 10 may be defined by the second and third mesh lines MSL 12 and MSL 13 and the sixth and seventh mesh lines MSL 22 and MSL 23 that intersect the second and third mesh lines MSL 12 and MSL 13 .

The second, third, sixth, and seventh mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the central opening OP 10 may define a first sub-mesh pattern 10 . FIG. 5B illustrates the first sub-mesh pattern 10 .

As illustrated in FIGS. 5A and 5B , the first sub-mesh pattern 10 may be a pattern that defines the central opening OP 10 . The first sub-mesh pattern 10 has a diamond shape when viewed in a plan view. Portions of the second, third, sixth, and seventh mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 may correspond to four sides of the first sub-mesh pattern 10 , respectively.

Here, the portions of the second, third, sixth, and seventh mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the first sub-mesh pattern 10 do not include a cut portion. Thus, the central opening OP 10 may not be connected to neighboring openings but may be defined as a closed area that is surrounded by the second, third, sixth, and seventh mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 .

Referring again to FIG. 5A , the peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c may be arranged along an edge of the central opening OP 10 . The peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c may be defined by the intersection of the first to fourth mesh lines MSL 11 to MSL 14 and the fifth to eighth mesh lines MSL 21 to MSL 24 .

The first to fourth mesh lines MSL 11 to MSL 14 and the fifth to eighth mesh lines MSL 21 to MSL 24 defining the peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c may define a second sub-mesh pattern 20 . FIG. 5C illustrates the second sub-mesh pattern 20 for the purpose of ease and convenience in description.

As illustrated in FIGS. 5A and 5C , the second sub-mesh pattern 20 has the peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c . The second sub-mesh pattern 20 has a quadrilateral frame shape that surrounds the first sub-mesh pattern 10 . The first to fourth mesh lines MSL 11 to MSL 14 and the fifth to eighth mesh lines MSL 21 to MSL 24 may correspond to sides which define the frame shape of the second sub-mesh pattern 20 .

In more detail, outer sides of the frame shape may correspond to portions of the first and fourth mesh lines MSL 11 and MSL 14 , disposed relatively outside, among the first to fourth mesh lines MSL 11 , MSL 12 , MSL 13 , and MSL 14 and portions of the fifth and eighth mesh lines MSL 21 and MSL 24 , disposed relatively outside, among the fifth to eighth mesh lines MSL 21 , MSL 22 , MSL 23 , and MSL 24 . Inner sides of the frame shape may correspond to portions of the second and third mesh lines MSL 12 and MSL 13 , disposed relatively inside, among the first to fourth mesh lines MSL 12 , MSL 12 , MSL 13 , and MSL 13 and portions of the sixth and seventh mesh lines MSL 22 and MSL 23 , disposed relatively inside, among the fifth to eighth mesh lines MSL 22 , MSL 22 , MSL 23 , and MSL 23 .

The four mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the inner sides may additionally divide the quadrilateral frame shape of the second sub-mesh pattern 20 into a plurality of areas. Thus, the first to fourth mesh lines MSL 11 to MSL 14 and the fifth to eighth mesh lines MSL 21 to MSL 24 may define eight peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c , arranged to surround the central opening OP 10 , in the second sub-mesh pattern 20 .

Meanwhile, the four mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the inner sides of the second sub-mesh pattern 20 may be the four mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the four sides of the first sub-mesh pattern 10 . In other words, the four mesh lines MSL 12 , MSL 13 , MSL 22 , and MSL 23 defining the inner sides may be included in or shared by both the first sub-mesh pattern 10 and the second sub-mesh pattern 20 . Thus, the shape of the second sub-mesh pattern 20 is substantially the same as the shape of the unit mesh pattern UN.

The second sub-mesh pattern 20 may include a plurality of cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d . The cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may be imaginary lines that cut portions of the mesh lines, respectively.

Each of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may have a line shape that links two centers of two openings adjacent to each other with a predetermined mesh line interposed therebetween. The cutting portion TS-CP is defined in a portion of the mesh line that overlaps with each of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d . In FIG. 5C , the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d are shown as dark lines for the purpose of ease and convenience in description and illumination.

In the present embodiment, the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d are spaced apart from each other. The cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d are arranged to surround the central opening OP 10 in the second sub-mesh pattern 20 .

A longitudinal direction of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may be different from that of others cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d . For example, the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may include first and third cutting lines CT 1 _ a and CT 1 _ c that extend in the fifth direction D 5 , and second and fourth cutting lines CT 1 _ b and CT 1 _ d that extend in the fourth direction D 4 .

The cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may be arranged along the quadrilateral frame shape of the second sub-mesh pattern 20 . In addition, the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d may be arranged in such a way that each of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d extends in a direction parallel to an outer side adjacent thereto.

Thus, the fourth and second cutting lines CT 1 _ d and CT 1 _ b adjacent to the outer sides defined by the first and fourth mesh lines MSL 11 and MSL 14 may extend in the fourth direction D 4 . The first and third cutting lines CT 1 _ a and CT 1 _ c adjacent to the outer sides defined by the fifth and eighth mesh lines MSL 21 and MSL 24 may extend in the fifth direction D 5 .

The first to fourth cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d are disposed along a clockwise direction in the second sub-mesh pattern 20 to cut four mesh lines MSL 12 , MSL 22 , MSL 13 , and MSL 23 among the mesh lines defining a plurality of the openings.

In more detail, as illustrated in FIG. 5C , the first cutting line CT 1 _ a cuts the second mesh line MSL 12 . The second cutting line CT 1 _ b is spaced apart from the first cutting line CT 1 _ a with the third mesh line MSL 13 interposed therebetween and cuts the sixth mesh line MSL 22 . The third cutting line CT 1 _ c is spaced apart from the second cutting line CT 1 _ b with the seventh mesh line MSL 23 interposed therebetween and cuts the third mesh line MSL 13 . The fourth cutting line CT 1 _ d is spaced apart from the third cutting line CT 1 _ c with the second mesh line MSL 12 interposed therebetween and cuts the seventh mesh line MSL 23 .

Referring again to FIG. 5A , as a result, the unit mesh pattern UN may include the plurality of peripheral openings surrounding the central opening OP 10 , and two adjacent peripheral openings among the peripheral openings may be connected or opened to each other through the cutting portion TS-CP. The peripheral openings may include first to third openings OP 20 _ a , OP 20 _ b , and OP 20 _ c adjacent to each other. The second and third openings OP 20 _ b and OP 20 _ c among the first to third openings OP 20 _ a , OP 20 _ b , and OP 20 _ c may be connected or opened to each other through the cutting portion TS-CP. The cutting portion TS-CP connecting the second and third openings OP 20 _ b and OP 20 _ c may be a cutting portion formed by the third cutting line CT 1 _ c illustrated in FIG. 5C .

The first and second openings OP 20 _ a and OP 20 _ b among the first to third openings OP 20 _ a , OP 20 _ b , and OP 20 _ c are not connected or opened to each other. A portion of the second mesh line MSL 12 that is disposed between the first and second openings OP 20 _ a and OP 20 _ b does not overlap with the cutting line. However, the first opening OP 20 _ a may be connected or opened to another peripheral opening that is adjacent thereto with the seventh mesh line MSL 23 interposed therebetween, through a cutting portion formed by the first cutting line CT 1 _ d.

The unit mesh pattern UN according to an embodiment of the present disclosure may be provided in plurality, and the plurality of unit mesh patterns UN may constitute each of the first and second sensing patterns SP 1 and SP 2 . The cutting portions TS-CP control visibility in the sensing patterns SP 1 and SP 2 . Due to the cutting portions TS-CP defined sporadically, it may be difficult for a user to distinguish between a boundary of each of the sensing patterns SP 1 and SP 2 and the inside of each of the sensing patterns SP 1 and SP 2 . Thus, a problem that the sensing patterns SP 1 and SP 2 are visible to a user may be prevented improving the visibility of the electronic device.

FIG. 6A is a plan view illustrating a unit mesh pattern according to an embodiment of the present disclosure. FIG. 6B is a plan view illustrating some elements of the unit mesh pattern of FIG. 6A .

FIG. 6A illustrates a partial area, corresponding to a unit mesh pattern UN- 1 , of the first and second sensing patterns SP 1 and SP 2 illustrated in FIG. 2A . Each of the first sensing patterns SP 1 and the second sensing patterns SP 2 may have a shape in which the unit mesh patterns UN- 1 are continuously arranged.

Referring to FIG. 6A , the unit mesh pattern UN- 1 may be defined by twelve mesh lines intersecting each other. In more detail, the unit mesh pattern UN- 1 may be defined by first to sixth mesh lines MSL 11 , MSL 12 , MSL 13 , MSL 14 , MSL 15 , and MSL 16 extending in the fourth direction D 4 in parallel to each other and seventh to twelfth mesh lines MSL 21 , MSL 22 , MSL 23 , MSL 24 , MSL 25 , and MSL 26 extending in the fifth direction D 5 in parallel to each other.

The first to sixth mesh lines MSL 11 , MSL 12 , MSL 13 , MSL 14 , MSL 15 , and MSL 16 may substantially correspond to some of the first mesh lines MSL 1 illustrated in FIG. 4A , and the seventh to twelfth mesh lines MSL 21 , MSL 22 , MSL 23 , MSL 24 , MSL 25 , and MSL 26 may substantially correspond to some of the second mesh lines MSL 2 illustrated in FIG. 4A . The unit mesh pattern UN- 1 may have a diamond shape defined by the fourth direction D 4 and the fifth direction D 5 .

The unit mesh pattern UN- 1 may include a plurality of openings. The openings may include a central opening OP 11 , a plurality of first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c , and a plurality of second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c.

The central opening OP 11 may be disposed at a center of the unit mesh pattern UN- 1 . The third and fourth mesh lines MSL 13 and MSL 14 among the first to sixth mesh lines MSL 11 to MSL 16 may be relatively close to the center of the unit mesh pattern UN- 1 , and the ninth and tenth mesh lines MSL 23 and MSL 24 among the seventh to twelfth mesh lines MSL 21 to MSL 26 may be relatively close to the center of the unit mesh pattern UN- 1 . The central opening OP 11 may be defined by the third and fourth mesh lines MSL 13 and MSL 14 and the ninth and tenth mesh lines MSL 23 and MSL 24 that intersect the third and fourth mesh lines MSL 13 and MSL 14 .

Meanwhile, the third, fourth, ninth, and tenth mesh lines MSL 13 , MSL 14 , MSL 23 , and MSL 24 defining the central opening OP 11 may define a predetermined sub-mesh pattern. The sub-mesh pattern defined by the third, fourth, ninth, and tenth mesh lines MSL 13 , MSL 14 , MSL 23 , and MSL 24 may be substantially the same as the first sub-mesh pattern 10 illustrated in FIG. 5B , and thus detailed descriptions thereof are omitted.

The first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c may be arranged along an edge of the central opening OP 11 . The first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c may be defined by the intersection of the second to fifth mesh lines MSL 12 to MSL 15 among the first to sixth mesh lines MSL 11 to MSL 16 and the eighth to eleventh mesh lines MSL 22 to MSL 25 among the seventh to twelfth mesh lines MSL 21 to MSL 26 .

The first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c are adjacent to four sides and four vertexes of the central opening OP 11 , respectively. In FIG. 6A , three openings OP 21 _ a , OP 21 _ b , and OP 21 _ c among the first peripheral openings are represented as an example by dotted lines.

Meanwhile, the second to fifth and eighth to eleventh mesh lines MSL 12 to MSL 15 and MSL 22 to MSL 25 defining the first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c may define a predetermined sub-mesh pattern. The sub-mesh pattern defined by the second to fifth and eighth to eleventh mesh lines MSL 12 to MSL 15 and MSL 22 to MSL 25 may be substantially the same as the second sub-mesh pattern 20 illustrated in FIG. 5C , and thus detailed descriptions thereof are omitted.

The second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c may be arranged along outer edges of the first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c . In other words, the second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c may be arranged along an edge of the sub-mesh pattern including the first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c.

The second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c may be defined by the intersection of the first to sixth mesh lines MSL 11 , MSL 12 , MSL 13 , MSL 14 , MSL 15 , and MSL 16 and the seventh to twelfth mesh lines MSL 21 , MSL 22 , MSL 23 , MSL 24 , MSL 25 , and MSL 26 . For the purpose of ease and convenience in description and illumination, FIG. 6B illustrates a third sub-mesh pattern 30 in which the second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c are disposed.

As illustrated in FIGS. 6A and 6B , the third sub-mesh pattern 30 may be a pattern in which the second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c are defined. The third sub-mesh pattern 30 may have a quadrilateral frame shape that surrounds the sub-mesh pattern in which the first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c are defined.

The quadrilateral frame shape corresponding to an outward shape of the third sub-mesh pattern 30 may be defined by the first, second, fifth, and sixth mesh lines MSL 11 , MSL 12 , MSL 15 , and MSL 16 , disposed relatively outside, among the first to sixth mesh lines MSL 11 to MSL 16 and the seventh, eighth, eleventh, and twelfth mesh lines MSL 21 , MSL 22 , MSL 25 , and MSL 26 , disposed relatively outside, among the seventh to twelfth mesh lines MSL 21 to MSL 26 .

In more detail, portions of the second, fifth, eighth, and eleventh mesh lines MSL 12 , MSL 15 , MSL 22 , and MSL 25 may define inner sides of the quadrilateral frame shape of the third sub-mesh pattern 30 , and portions of the first, sixth, seventh, and twelfth mesh lines MSL 11 , MSL 16 , MSL 21 , and MSL 26 may define outer sides of the quadrilateral frame shape of the third sub-mesh pattern 30 . The second, fifth, eighth, and eleventh mesh lines MSL 12 , MSL 15 , MSL 22 , and MSL 25 may also define outer sides of the sub-mesh pattern in which the first peripheral openings OP 21 _ a , OP 21 _ b , and OP 21 _ c are defined.

The first to sixth mesh lines MSL 11 , MSL 12 , MSL 13 , MSL 14 , MSL 15 , and MSL 16 and the seventh to twelfth mesh lines MSL 21 , MSL 22 , MSL 23 , MSL 24 , MSL 25 , and MSL 26 may intersect the quadrilateral frame shape corresponding to the outward shape of the third sub-mesh pattern 30 , thereby defining the second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c . The second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c may be defined in the third sub-mesh pattern 30 .

On the other hand, the third sub-mesh pattern 30 may include a plurality of cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 _ g , and CT 2 _ h . Each of the cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 _ g , and CT 2 _ h may be an imaginary line cutting a portion of the mesh line and may have a line shape that links centers of two second peripheral openings adjacent to each other with a predetermined mesh line interposed therebetween.

Each of the cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 g , and CT 2 _ h may cut the mesh line to connect or open the two second peripheral openings adjacent to each other. Thus, some openings of the second peripheral openings OP 30 _ a , OP 30 _ b , and OP 30 _ c may be connected or opened to each other through the cutting portion TS-CP.

The cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 _ g , and CT 2 _ h may be arranged along the frame shape. In addition, each of the cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 g , and CT 2 _ h may extend in parallel to the outer side adjacent thereto in the third sub-mesh pattern 30 .

Thus, first, fourth, fifth, and eighth cutting lines CT 2 _ a , CT 2 _ d , CT 2 _ e , and CT 2 _ h adjacent to the outer sides defined by the first and sixth mesh lines MSL 11 and MSL 16 may extend in the fourth direction D 4 , and second, third, sixth, and seventh cutting lines CT 2 _ b , CT 2 _ c , CT 2 _ f , and CT 2 _ g adjacent to the outer sides defined by the seventh and twelfth mesh lines MSL 21 and MSL 26 may extend in the fifth direction D 5 .

The cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 _ g , and CT 2 _ h may have arrangement that substantially corresponds to the arrangement of the cutting lines in the second sub-mesh pattern 20 illustrated in FIG. 5C . Thus, detailed descriptions to the cutting lines CT 2 _ a to CT 2 _ h are omitted.

The unit mesh pattern UN- 1 according to an embodiment of the present disclosure may include 25 openings. However, the electronic device according to an embodiment of the present disclosure may include the mesh patterns having various numbers may not be limited to the unit mesh pattern having a specific number.

In addition, since the electronic device according to an embodiment of the present disclosure includes a plurality of the unit mesh patterns UN- 1 improving the visibility of the electronic device. This will be described later in more detail.

FIGS. 7A to 7F are plan views related to a unit mesh pattern according to an embodiment of the present disclosure. FIGS. 7A and 7B are plan views illustrating a unit mesh pattern UN- 2 according to an embodiment of the present disclosure, and FIG. 7C is a plan view illustrating one of the cutting lines illustrated in FIG. 7B . FIGS. 7D to 7F are plan views illustrating a portion of a sensing pattern in which the unit mesh pattern UN- 2 of FIGS. 7A and 7B is provided in plurality. Hereinafter, an electronic device according to an embodiment of the present disclosure will be described with reference to FIGS. 7A to 7F .

FIG. 7A illustrates a partial area, corresponding to a unit mesh pattern UN- 2 , of the first and second sensing patterns SP 1 and SP 2 illustrated in FIG. 2A . Each of the first sensing patterns SP 1 and the second sensing patterns SP 2 may have a shape in which the unit mesh patterns UN- 2 are continuously arranged.

Referring to FIG. 7A , the unit mesh pattern UN- 2 is illustrated as a portion cut by a quadrilateral (or square) shape defined by the first direction D 1 and the second direction D 2 . As illustrated in FIG. 7A , the unit mesh pattern UN- 2 may have a shape different from the diamond shape defined by the fourth and fifth directions D 4 and D 5 . However, embodiments of the present disclosure are not limited to a particular shape.

The unit mesh pattern UN- 2 may be defined by 16 mesh lines intersecting each other. In more detail, the unit mesh pattern UN- 2 may be defined by eight first mesh lines MSL 1 extending in the fourth direction D 4 in parallel to each other and eight second mesh lines MSL 2 extending in the fifth direction D 5 to intersect the eight first mesh lines MSL 1 .

The unit mesh pattern UN- 2 may include a plurality of openings. The openings may include a central opening OP 12 and peripheral openings disposed outside the central opening OP 12 . Adjacent ones of the peripheral openings may be connected or opened to each other. The peripheral openings may include first peripheral openings arranged along an edge of the central opening OP 12 , and second peripheral openings arranged along an edge of a sub-mesh pattern in which the first peripheral openings are defined.

The central opening OP 12 may be disposed at a center of the unit mesh pattern UN- 2 . The central opening OP 12 may substantially correspond to the central opening OP 10 illustrated in FIG. 5B , and the first sub-mesh pattern 10 of FIG. 5B may be included in the unit mesh pattern UN- 2 even though a reference designator for the first sub-mesh pattern 10 is not shown in FIG. 7A .

The first peripheral openings surrounding the central opening OP 12 may substantially correspond to the peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c illustrated in FIGS. 5A and 5C . Thus, even though reference designators for the peripheral openings OP 20 _ a , OP 20 _ b , and OP 20 _ c are not shown in FIG. 7A , the first peripheral openings and the second sub-mesh pattern 20 (see FIG. 5B ) in which the first peripheral openings are defined may be included in the unit mesh pattern UN- 2 .

As described above, the second sub-mesh pattern 20 in which the first peripheral openings are defined may include a plurality of first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d . In FIG. 7B , the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d are shown as dark lines. Adjacent two of the first peripheral openings may be connected or opened to each other through a cutting portion defined by each of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d.

The first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d have substantially the same shapes as the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d illustrated in FIG. 5C . However, it is noted that arrangement positions of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d may be different from the arrangement positions of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d illustrated in FIG. 5C .

For example, the arrangement of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d may correspond to arrangement in which the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d of FIG. 5C are shifted with respect to the central opening OP 10 (see FIG. 5A ) in a counterclockwise direction by a width of the peripheral opening. Thus, in FIG. 7B , the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d may cut the mesh lines corresponding to the mesh lines that are not cut in the first sub-mesh pattern 20 of FIG. 5C .

However, the arrangement of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d illustrated in FIG. 7C is an example. In certain embodiments, the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d of FIG. 7B may be disposed at the same positions of the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d of FIG. 5C , respectively. However, embodiments of the present disclosure are not limited thereto.

The second peripheral openings may be arranged along an edge of the second sub-mesh pattern 20 in which the first peripheral openings are defined. For the purpose of ease and convenience in description and illumination, first to fifth openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e among the second peripheral openings are represented by dotted lines in FIG. 7A . However, these are illustrated as an example. The following descriptions to the first to fifth openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e may be applied in common to others second peripheral openings.

The first to fifth openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e may be sequentially arranged around the central opening OP 12 in a counterclockwise direction. At least one of the first to fifth openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e may be partially illustrated in the unit mesh pattern UN- 2 .

In the present embodiment, the fourth opening OP 31 _ d may be defined as an opening having an incomplete shape in the unit mesh pattern UN- 2 . The fourth opening OP 31 _ d may be surrounded by two intersecting mesh lines MSL 1 and MSL 2 and a quadrilateral boundary of the unit mesh pattern UN- 2 . Thus, the fourth opening OP 31 _ d may have a triangular shape. Even though not shown in FIG. 7A , the fourth opening OP 31 _ d may be connected to an opening of another unit mesh pattern UN- 2 to be defined as a quadrilateral opening.

The second peripheral openings including the first to fifth openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e may define a predetermined sub-mesh pattern that has a quadrilateral frame shape surrounding the edge of the sub-mesh pattern in which the first peripheral openings are defined. Hereinafter, the reference designators OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e will be used as both the reference designators of the second peripheral openings and the reference designators of the first to fifth openings.

The shape of the sub-mesh pattern in which the second peripheral openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e are defined may be substantially the same as the shape of the third sub-mesh pattern 30 illustrated in FIG. 6B . However, shapes and/or arrangement of cutting lines and cutting portions in the sub-mesh pattern according to the present embodiment may be different from those of the cutting lines and the cutting portions in the third sub-mesh pattern 30 of FIG. 6B .

In detail, referring to FIGS. 7A and 7B , a plurality of second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d are defined in the sub-mesh pattern having the second peripheral openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e . Each of the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , CT 21 _ d are shown as a combination of dark lines in FIG. 7B .

Shapes of the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d are different from those of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d . Thus, in the unit mesh pattern UN- 2 , arrangement of the cutting portions formed in the sub-mesh pattern having the second peripheral openings is different from the arrangement of the cutting portions formed in the sub-mesh pattern having the first peripheral openings.

FIG. 7C illustrates the second cutting line CT 21 _ a of the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d . As illustrated in FIG. 7C , the second cutting line CT 21 _ a may include first, second, and third portions P 1 , P 2 , and P 3 .

Each of the first to third portions P 1 , P 2 , and P 3 may be a line that links centers of two adjacent openings. Thus, each of the first to third portions P 1 , P 2 , and P 3 may have substantially the same shape as each of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d . In addition, each of the second cutting line CT 21 _ a may substantially correspond to three first cutting lines that are connected to each other.

At least two of the first to third portions P 1 , P 2 , and P 3 may extend in directions different from each other. In the present embodiment, an extending direction of the first portion P 1 is different from an extending direction of each of the second and third portions P 2 and P 3 . The second portion P 2 is connected between the first portion P 1 and the third portion P 3 . Thus, the second cutting line CT 21 _ a may have a “¬” shape having a bent portion.

Referring again to FIGS. 7A and 7B , the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d are arranged around the central opening OP 12 in a clockwise direction. Adjacent two of the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d are spaced apart from each other with one mesh line interposed therebetween.

Thus, each of four second peripheral openings overlapping with each of the second cutting lines CT 21 _ a to CT 21 _ d can be connected or opened to one(s), adjacent thereto, of the corresponding four second peripheral openings. In the present embodiment, each of the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d connects or opens the four second peripheral openings to each other.

The second to fifth openings OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e among the second peripheral openings may be opened and connected to each other by one second cutting line CT 21 _ c . The first opening OP 31 _ a of the first to fifth openings OP 31 _ a to OP 31 _ e is opened and connected to another second peripheral opening adjacent thereto by another second cutting line CT 21 _ d.

Since lengths of the second cutting lines CT 21 _ a to CT 21 _ d are longer than those of the first cutting lines CT 11 _ a to CT 11 _ d , the second cutting lines CT 21 _ a to CT 21 _ d may induce continuous arrangement of the cutting portions. Thus, it is possible to increase similarity between the cutting portion and the boundary of a sensor (e.g., the sensing pattern) in which the cutting portions of the mesh lines are continuously formed. As a result, it is difficult to distinguish between the boundary of the sensor and the inside of the sensor, thereby improving the visibility of the electronic device.

On the other hand, the unit mesh pattern UN- 2 may further include third peripheral openings disposed outside the second peripheral openings OP 31 _ a , OP 31 _ b , OP 31 _ c , OP 31 _ d , and OP 31 _ e . In the present embodiment, the third peripheral openings may include one diamond-shaped opening and three triangular openings that are disposed adjacent to each of vertexes of the quadrilateral shape of the unit mesh pattern UN- 2 . However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the arrangement and shapes of the third peripheral openings may be variously modified depending on the size and shape of the unit mesh pattern UN- 2 .

Dummy cutting lines CT_D may be defined in the third peripheral openings. Each of the dummy cutting lines CT_D may have the same shape as each of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d . In addition, each of the dummy cutting lines CT_D may be parallel to a corresponding one of the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d . The dummy cutting line CT_D and the first cutting line CT 11 _ a , CT 11 _ b , CT 11 _ c , or CT 11 _ d corresponding to each other may cut the same mesh line.

For example, another portion of the mesh line MSL 1 that is cut by one (e.g., CT 11 _ b ) of the first cutting lines CT 11 _ a to CT 11 _ d may be cut by the dummy cutting line CT_D parallel to the first cutting line CT 11 _ b . However, this is illustrated as an example, and embodiments of the present disclosure are not limited thereto. In certain embodiments, the shapes and arrangement of the dummy cutting lines included in the unit mesh pattern UN- 2 may be variously modified.

Referring to FIGS. 7D to 7F , a sensing pattern including a plurality of the unit mesh patterns UN- 2 is illustrated. FIG. 7D illustrates a first unit mesh pattern UN- 21 and a second unit mesh pattern UN- 22 that are connected to each other in the first direction D 1 .

Each of the first and second unit mesh patterns UN- 21 and UN- 22 may be substantially the same as the unit mesh pattern UN- 2 illustrated in FIGS. 7A and 7B . First cutting lines CT 11 illustrated in each of the first and second unit mesh patterns UN- 21 and UN- 22 may correspond to the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d illustrated in FIG. 7B , and second cutting lines CT 21 illustrated in each of the first and second unit mesh patterns UN- 21 and UN- 22 may correspond to the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d illustrated in 7 B.

According to one embodiment, the second cutting lines CT 21 may be a connection point of adjacent unit mesh patterns. As illustrated in FIG. 7D , the second unit mesh pattern UN- 22 is disposed adjacent to a side of the first unit mesh pattern UN- 21 in the first direction D 1 , and thus a second cutting line of the first unit mesh pattern UN- 21 that is adjacent to the side in the first direction D 1 may be connected to another second cutting line of the second unit mesh pattern UN- 22 .

Thus, two second cutting lines CT 21 may be connected to each other at a boundary between the first and second unit mesh patterns UN- 21 and UN- 22 to form a new combination cutting line CT-S. The combination cutting line CT-S may include a first line extending in the fifth direction D 5 to open three openings, and a second line extending in the fourth direction D 4 to open five openings. The first line intersects the second line.

FIGS. 7E and 7F illustrate sensing patterns in which two or more mesh patterns UN- 2 are arranged to correspond to the arrangement illustrated in FIG. 7D . As illustrated in FIG. 7E , the first cutting lines CT 11 may be arranged to surround each of the central openings.

As described above, each of the second cutting lines CT 21 (see FIG. 7D ) may function as a connection point at which adjacent unit mesh patterns UN- 2 are connected to each other. Thus, the combination cutting lines CT-S are shown in the sensing pattern in which a plurality of unit mesh patterns UN- 2 are connected to each other. As a result, the sensing pattern may include a plurality of cutting portions formed by the first cutting lines CT 11 and the combination cutting lines CT-S.

Since the electronic device according to an embodiment of the present disclosure includes the unit mesh patterns in which various cutting lines are defined, the sensing pattern including the cutting portions that are arranged in various forms may be provided in the electronic device. As a result, it is possible to effectively prevent a problem that the sensing pattern is visible to a user.

FIGS. 8A to 8C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure. FIGS. 8A to 8C illustrate substantially the same area. In FIGS. 8A and 8B , cutting lines are represented by dark lines to distinguish the cutting lines from mesh lines. In addition, in FIG. 8C , some of the mesh lines are shaded to distinguish the sensing patterns from each other.

Hereinafter, a method of manufacturing an electronic device according to an embodiment of the present disclosure will be described with reference to FIGS. 8A to 8C . In addition, the same elements as described with reference to FIGS. 1 to 7F will indicated by the same reference numerals or designators, and the descriptions thereof will be omitted or mentioned briefly for the purpose of ease and convenience in description and illumination.

A partial area of an initial mesh substrate IMS is illustrated in FIGS. 8A and 8B . The initial mesh substrate IMS according to an embodiment of the present disclosure may include a plurality of mesh lines intersecting each other and a plurality of cutting lines. As described above, the cutting lines partially cut the mesh lines. Thus, the mesh lines of the initial mesh substrate IMS may be a single conductive pattern and may be electrically connected to each other.

As illustrated in FIG. 8A , the initial mesh substrate IMS is provided. The initial mesh substrate IMS may include a plurality of unit mesh patterns UN 10 . The unit mesh patterns UN 10 may be repeatedly and continuously arranged. One of the plurality of unit mesh patterns UN 10 is represented by the reference designator UN 10 in FIG. 8A .

The unit mesh pattern UN 10 may include a first sub-mesh pattern 10 , a second sub-mesh pattern 20 , and a third sub-mesh pattern 30 . The second sub-mesh pattern 20 may have a quadrilateral frame shape surrounding an edge of the first sub-mesh pattern 10 , and the third sub-mesh pattern 30 may have a quadrilateral frame shape surrounding an outer edge of the second sub-mesh pattern 20 .

In the present embodiment, the unit mesh pattern UN 10 may be substantially the same as the unit mesh pattern UN- 1 illustrated in FIG. 6A . Thus, the first sub-mesh pattern 10 may substantially correspond to the first sub-mesh pattern 10 illustrated in FIG. 5B , the second sub-mesh pattern 20 may substantially correspond to the second sub-mesh pattern 20 illustrated in FIG. 5C , and the third sub-mesh pattern 30 may substantially correspond to the third sub-mesh pattern 30 illustrated in FIG. 6B .

Likewise, the plurality of cutting lines illustrated in FIGS. 8A and 8B may substantially the same as the cutting lines CT 1 _ a , CT 1 _ b , CT 1 _ c , and CT 1 _ d illustrated in FIG. 5C and the cutting lines CT 2 _ a , CT 2 _ b , CT 2 _ c , CT 2 _ d , CT 2 _ e , CT 2 _ f , CT 2 _ g , and CT 2 _ h illustrated in FIG. 6B . Thus, detailed descriptions thereof are omitted.

Thereafter, as illustrated in FIG. 8B , a boundary line BL is formed on the initial mesh substrate IMS. In FIG. 8B , the boundary line BL is shaded to distinguish the boundary line BL from the cutting lines. Some of the cutting lines may be connected to each other to form the boundary line BL. The boundary line BL formed by connecting some of the cutting lines of the second sub-mesh patterns 20 of the unit mesh patterns UN 10 is illustrated as an example in FIG. 8B .

The mesh lines overlapping with the boundary line BL may be additionally cut along the boundary line BL, and thus a plurality of first sensing patterns SP 1 - 1 and a plurality of second sensing patterns SP 2 - 1 may be formed as illustrated in FIG. 8C . The first sensing patterns SP 1 - 1 and the second sensing patterns SP 2 - 1 are distinguished from each other by different shades in FIG. 8C . The first sensing patterns SP 1 - 1 and the second sensing patterns SP 2 - 1 are spaced apart from each other by the boundary line BL and are electrically insulated from each other.

Since the boundary line BL is defined as a diagonal shape passing the cutting lines of the second sub-mesh pattern 20 in the present embodiment, the first and second sensing patterns SP 1 - 1 and SP 2 - 1 illustrated in FIG. 8C are formed. However, these are illustrated as an example, and embodiments of the present disclosure are not limited thereto. In certain embodiments, the shapes of the first and second sensing patterns SP 1 - 1 and SP 2 - 1 may be variously modified, and the shape of the boundary line BL may also be variously modified. For example, the boundary line BL may have a zigzag shape.

A plurality of the cutting portions may be defined in each of the first and second sensing patterns SP 1 - 1 and SP 2 - 1 . The cutting portions may function optical compensation patterns that reduce a difference in light reflectance between a boundary area between the first and second sensing patterns SP 1 - 1 and SP 2 - 1 and the inside of each of the first and second sensing patterns SP 1 - 1 and SP 2 - 1 .

Thus, it is difficult for a user to sense a difference between the inside of each of the first and second sensing patterns SP 1 - 1 and SP 2 - 1 and the boundary area between the first and second sensing patterns SP 1 - 1 and SP 2 - 1 . As a result, a problem that the first and second sensing patterns SP 1 - 1 and SP 2 - 1 are visible to a user may be solved or improved.

On the other hand, even though not shown in the drawings, the boundary line BL may be provided in plurality, and thus dummy patterns may be formed between the first sensing patterns SP 1 - 1 and the second sensing patterns SP 2 - 1 . According to an embodiment of the present disclosure, even though the dummy patterns are formed, the cutting portions formed by the cutting lines may also be formed in the dummy patterns since the dummy patterns are formed through the initial mesh substrate IMS.

As a result, the inside of the dummy pattern, an interval between the dummy and sensing patterns, and the inside of the sensing pattern include the cutting portions that are formed by the cutting lines having substantially the same regularity, and thus poor visibility of the electronic device is solved or improved without an additional layer or pattern for optical compensation.

In the method of manufacturing the electronic device according to an embodiment of the present disclosure, the initial mesh substrate IMS on which the cutting lines are defined may be provided, and the boundary line BL may be formed by connecting desired cutting lines among the cutting lines. Various-shaped sensing patterns required by a user may be formed by the combination of the cutting lines that can be variously arranged and correspond to extending directions of the mesh lines.

In addition, the cutting lines that are not included in the boundary line BL in the initial mesh substrate IMS remain in the sensing pattern. The cutting lines remaining in the sensing pattern may control the sensing pattern in such a way that light reflectance in the sensing pattern becomes similar to light reflectance at a boundary of the sensing pattern by optical compensation. Thus, it is difficult to distinguish between the boundary line BL and the inside of the sensing pattern, thereby improving the visibility of the electronic device.

Furthermore, in the method of manufacturing the electronic device according to an embodiment of the present disclosure, the initial mesh substrate IMS may be provided to form a sensor including an optical compensation pattern by only the process of forming the boundary line BL. Thus, a process of designing an optical compensation pattern can be omitted to simplify manufacturing processes while reducing a process cost.

FIGS. 9A to 9C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure. FIGS. 9A to 9C illustrate substantially the same area. In FIGS. 9A and 9B , cutting lines are represented by dark lines to distinguish the cutting lines from mesh lines. In addition, in FIG. 9C , some of the mesh lines are shaded to distinguish the sensing patterns from each other.

FIGS. 9A and 9B illustrate a partial area of an initial mesh substrate IMS- 1 , and FIG. 9C illustrates a partial area of an electronic device. Hereinafter, a method of manufacturing an electronic device according to an embodiment of the present disclosure will be described with reference to FIGS. 9A to 9C . In addition, the same elements as described with reference to FIGS. 1 to 8C will indicated by the same reference numerals or designators, and the descriptions thereof will be omitted or mentioned briefly for the purpose of ease and convenience in description and illumination.

As illustrated in FIG. 9A , the initial mesh substrate IMS- 1 is provided. The initial mesh substrate IMS- 1 may include a plurality of unit mesh patterns UN 20 . The unit mesh patterns UN 20 may be repeatedly and continuously arranged. One of the plurality of unit mesh patterns UN 20 is represented by the reference designator UN 20 in FIG. 9A .

The unit mesh pattern UN 20 may include a first sub-mesh pattern 10 , a second sub-mesh pattern 20 - 1 , and a third sub-mesh pattern 30 - 1 . In the present embodiment, the unit mesh pattern UN 20 may partially correspond to the unit mesh pattern UN- 2 illustrated in FIG. 7A .

The unit mesh pattern UN 20 may correspond to the unit mesh pattern UN- 2 of FIG. 7A , except for the areas in which the dummy cutting lines CT_D are defined in FIG. 7A . Thus, first cutting lines CT 11 defined in the second sub-mesh pattern 20 - 1 of the unit mesh pattern UN 20 may substantially correspond to the first cutting lines CT 11 _ a , CT 11 _ b , CT 11 _ c , and CT 11 _ d illustrated in FIG. 7B , and second cutting lines CT 21 defined in the third sub-mesh pattern 30 - 1 may substantially correspond to the second cutting lines CT 21 _ a , CT 21 _ b , CT 21 _ c , and CT 21 _ d illustrated in 7 B.

In the present embodiment, the unit mesh patterns UN 20 may be arranged using the mesh lines, defining a boundary of each unit mesh pattern UN 20 , as boundary lines. Thus, even though the unit mesh pattern UN 20 includes the first to third sub-mesh patterns 10 , 20 - 1 , and 30 - 1 that are the same as those of the unit mesh pattern UN- 2 illustrated in FIG. 7A , the sensing pattern different from the sensing pattern of FIG. 7D may be formed on the initial mesh substrate IMS- 1 . The shapes of the mesh patterns of the electronic device according to an embodiment of the present disclosure may be variously modified depending on the shapes and/or arrangement of the cutting lines and the arrangement of the unit mesh patterns, and thus embodiments of the present disclosure are not limited to a specific one of the various shapes of the mesh patterns.

Thereafter, as illustrated in FIGS. 9B and 9C , a boundary line BL- 1 may be formed on the initial mesh substrate IMS- 1 to form a plurality of first sensing patterns SP 1 - 2 and a plurality of second sensing patterns SP 2 - 2 . As described above, the boundary line BL- 1 may be formed by connecting some of the cutting lines CT 11 and CT 21 . In the present embodiment, the boundary line BL- 1 may have a diagonal shape that extends along at least portions of some of the second cutting lines CT 21 defined in the third sub-mesh patterns 30 - 1 .

However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 1 may be formed along at least portions of some of the first cutting lines CT 11 or may be formed to have a line shape that connects portions of the first cutting lines CT 11 and portions of the second cutting lines CT 21 . In addition, the boundary line BL- 1 having the diagonal shape is illustrated in the present embodiment for the purpose of ease and convenience in description and illumination. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 1 may have another shape such as a zigzag shape.

A plurality of cutting portions formed by remaining cutting lines may be defined in the first and second sensing patterns SP 1 - 2 and SP 2 - 2 . Thus, the electronic device with improved visibility may be manufactured.

FIGS. 10A to 10C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure. FIGS. 10A to 10C illustrate substantially the same area. In FIGS. 10A and 10B , cutting lines are represented by dark lines to distinguish the cutting lines from mesh lines. In addition, in FIG. 10C , some of the mesh lines are shaded to distinguish the sensing patterns from each other.

FIGS. 10A and 10B illustrate a partial area of an initial mesh substrate IMS- 2 , and FIG. 10C illustrates a partial area of an electronic device. Hereinafter, a method of manufacturing an electronic device according to an embodiment of the present disclosure will be described with reference to FIGS. 10A to 10C . In addition, the same elements as described with reference to FIGS. 1 to 9C will indicated by the same reference numerals or designators, and the descriptions thereof will be omitted or mentioned briefly for the purpose of ease and convenience in description and illumination.

As illustrated in FIG. 10A , the initial mesh substrate IMS- 2 is provided. The initial mesh substrate IMS- 2 may include a plurality of unit mesh patterns repeatedly and continuously arranged. Each of the unit mesh patterns may include a first sub-mesh pattern 10 , a plurality of fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d , and a plurality of fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d . The first sub-mesh pattern 10 may be substantially the same as the first sub-mesh pattern 10 illustrated in FIG. 5B , and thus the descriptions thereof are omitted.

The fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d and the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may be arranged to surround the edge of the first sub-mesh pattern 10 . The fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d are disposed adjacent to four sides of the first sub-mesh pattern 10 extending from the first-sub-mesh pattern 10 outwardly, respectively.

Each of the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d may include three peripheral openings. A fourth cutting line CT 4 is defined in each of the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d.

The fourth cutting line CT 4 may be a straight line that links centers of the three peripheral openings. The fourth cutting line CT 4 opens the three peripheral openings. The fourth cutting line CT 4 may extend in a direction perpendicular to one, adjacent thereto, of the fourth sides of the first sub-mesh pattern 10 .

The fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d are disposed adjacent to four vertexes of the first sub-mesh pattern 10 having a diamond shape, respectively. Each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may have a diamond shape, and one vertex of each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may be connected to each of the vertexes of the first sub-mesh pattern 10 . Thus, the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d and the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may be alternately arranged around the first sub-mesh pattern 10 .

The number of peripheral openings included in each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may be changed depending on the number of the peripheral openings included in each of the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d . When each of the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d includes N peripheral openings (where ‘N’ is a natural number), each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may include N×N peripheral openings that are arranged in an N×N matrix form.

In the present embodiment, each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d may include nine peripheral openings arranged in a 3×3 matrix form. A fifth cutting line CT 5 is defined in each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d.

The fifth cutting line CT 5 may have a closed-loop shape that links centers of the peripheral openings. In the present embodiment, the fifth cutting line CT 5 opens four peripheral openings. Each of the peripheral openings overlapping with the fifth cutting line CT 5 may be opened to two peripheral openings adjacent thereto.

The fifth cutting line CT 5 may be disposed at one of various positions in each of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d . In the present embodiment, the fifth cutting line CT 5 may be disposed adjacent to the first sub-mesh pattern 10 . Alternatively, the fifth cutting line CT 5 may be disposed away from the first sub-mesh pattern 10 . However, embodiments of the present disclosure are not limited to a specific example.

Thereafter, as illustrated in FIGS. 10B and 10C , a boundary line BL- 2 may be formed on the initial mesh substrate IMS- 2 to form a plurality of first sensing patterns SP 1 - 3 and a plurality of second sensing patterns SP 2 - 3 . As described above, the boundary line BL- 2 may be formed by connecting some of the cutting lines CT 4 and CT 5 . In the present embodiment, the boundary line BL- 2 may have a diagonal shape that extends along some of the fourth cutting lines CT 4 .

However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 2 may be formed along portions of the fifth cutting lines CT 5 or may be formed to have a line shape that connects portions of the fourth cutting lines CT 4 and portions of the fifth cutting lines CT 5 . In addition, the boundary line BL- 2 having the diagonal shape is illustrated in the present embodiment for the purpose of ease and convenience in description and illumination. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 2 may have another shape such as a zigzag shape.

A plurality of cutting portions formed by remaining cutting lines may be defined in the first and second sensing patterns SP 1 - 3 and SP 2 - 3 . Thus, the electronic device with improved visibility may be manufactured.

FIGS. 11A to 11C are plan views illustrating a method of manufacturing an electronic device, according to an embodiment of the present disclosure. FIGS. 11A to 11C illustrate substantially the same area. In FIGS. 11A and 11B , cutting lines are represented by dark lines to distinguish the cutting lines from mesh lines. In addition, in FIG. 11C , some of the mesh lines are shaded to distinguish the sensing patterns from each other.

FIGS. 11A and 11B illustrate a partial area of an initial mesh substrate IMS- 3 , and FIG. 11C illustrates a partial area of an electronic device. Hereinafter, a method of manufacturing an electronic device according to an embodiment of the present disclosure will be described with reference to FIGS. 11A to 11C . In addition, the same elements as described with reference to FIGS. 1 to 10C will indicated by the same reference numerals or designators, and the descriptions thereof will be omitted or mentioned briefly for the purpose of ease and convenience in description and illumination.

As illustrated in FIG. 11A , the initial mesh substrate IMS- 3 is provided. The initial mesh substrate IMS- 3 may include a plurality of unit mesh patterns repeatedly and continuously arranged. Each of the unit mesh patterns may include a first sub-mesh pattern 10 , a plurality of fourth sub-mesh patterns 41 _ a , 41 _ b , 41 _ c , and 41 _ d , and a plurality of fifth sub-mesh patterns 51 _ a , 51 _ b , 51 _ c , and 51 _ d . The first sub-mesh pattern 10 may be substantially the same as the first sub-mesh pattern 10 illustrated in FIG. 5B , and thus the descriptions thereof are omitted.

The fourth sub-mesh patterns 41 _ a , 41 _ b , 41 _ c , and 41 _ d and the fifth sub-mesh patterns 51 _ a , 51 _ b , 51 _ c , and 51 _ d may be arranged to surround the edge of the first sub-mesh pattern 10 . The fourth sub-mesh patterns 41 _ a , 41 _ b , 41 _ c , and 41 _ d are disposed adjacent to four sides of the first sub-mesh pattern 10 extending from the first sub-mesh pattern 10 outwardly, respectively.

The fourth sub-mesh patterns 41 _ a , 41 _ b , 41 _ c , and 41 _ d may substantially correspond to or may be the same as the fourth sub-mesh patterns 40 _ a , 40 _ b , 40 _ c , and 40 _ d illustrated in FIG. 10A , respectively. Fourth cutting lines CT 41 defined in the fourth sub-mesh patterns 41 _ a , 41 _ b , 41 _ c , and 41 _ d may substantially correspond to or may be the same as the fourth cutting lines CT 4 illustrated in FIG. 10A . Thus, detailed descriptions thereof are omitted.

The fifth sub-mesh patterns 51 _ a , 51 _ b , 51 _ c , and 51 _ d are disposed adjacent to four vertexes of the first sub-mesh pattern 10 having a diamond shape, respectively. Shapes and arrangement of the fifth sub-mesh patterns 51 _ a , 51 _ b , 51 _ c , and 51 _ d may substantially correspond to or may be the same as those of the fifth sub-mesh patterns 50 _ a , 50 _ b , 50 _ c , and 50 _ d illustrated in FIG. 10A . Thus, detailed descriptions thereof are omitted.

A sixth cutting line CT 51 A and a seventh cutting line CT 51 B may be disposed in each of the fifth sub-mesh patterns 51 _ a , 51 _ b , 51 _ c , and 51 _ d . The sixth cutting line CT 51 A and the seventh cutting line CT 51 B may have straight line shapes having an equal length and may intersect each other. Thus, the sixth cutting line CT 51 A and the seventh cutting line CT 51 B may constitute an X-shaped pattern.

Each of the sixth and seventh cutting lines CT 51 A and CT 51 B has the same length and shape as the fourth cutting line CT 41 . Thus, each of the sixth and seventh cutting lines CT 51 A and CT 51 B opens three peripheral openings. In the present embodiment, the sixth and seventh cutting lines CT 51 A and CT 51 B are disposed to open five peripheral openings in each of the fifth sub-mesh patterns 51 _ a to 51 _ d , and one of the five peripheral openings may be connected or opened to four peripheral openings adjacent thereto.

However, these are illustrated as an example, and embodiments of the present disclosure are not limited thereto. In certain embodiments, the shapes and arrangement of the sixth and seventh cutting lines CT 51 A and CT 51 B may be variously modified, and thus the peripheral openings of each of the fifth sub-mesh patterns 51 _ a to 51 _ d may be connected or opened to adjacent peripheral openings in various forms.

Thereafter, as illustrated in FIGS. 11B and 11C , a boundary line BL- 3 may be formed on the initial mesh substrate IMS- 3 to form a plurality of first sensing patterns SP 1 - 4 and a plurality of second sensing patterns SP 2 - 4 . As described above, the boundary line BL- 3 may be formed by connecting some of the cutting lines CT 41 , CT 51 A, and CT 51 B. In the present embodiment, the boundary line BL- 3 may have a diagonal shape that extends along some of the fourth cutting lines CT 41 .

However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 3 may be formed along portions of the sixth cutting lines CT 51 A or the seventh cutting lines CT 51 B or may be formed to have a line shape that connects portions of the fourth cutting lines CT 41 and portions of the sixth cutting lines CT 51 A or the seventh cutting lines CT 51 B. In addition, the boundary line BL- 3 having the diagonal shape is illustrated in the present embodiment for the purpose of ease and convenience in description and illumination. However, embodiments of the present disclosure are not limited thereto. In certain embodiments, the boundary line BL- 3 may have another shape such as a zigzag shape.

A plurality of cutting portions formed by remaining cutting lines may be defined in the first and second sensing patterns SP 1 - 4 and SP 2 - 4 . Thus, the electronic device with improved visibility may be manufactured.

According to embodiments of the present disclosure, various-shaped sensing patterns may be formed through an initial mesh substrate in which the cutting lines variously arranged and corresponding to extending directions of the mesh lines are defined.

In addition, since the optical compensation patterns are formed, it is difficult to distinguish sensors from each other. Thus, the visibility of the electronic device may be improved.

Furthermore, according to the manufacturing method according to the present disclosure, the sensor having the optical compensation pattern may be formed by only the process of forming the boundary line, and thus manufacturing processes may be simplified, and a process cost may be reduced.

While the present disclosure has been described with reference to example embodiments, it will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirits and scopes of the present disclosure. Therefore, it should be understood that the above embodiments are not limiting, but illustrative. Thus, the scopes of the present disclosure are to be determined by the broadest permissible interpretation of the following claims and their equivalents, and shall not be restricted or limited by the foregoing description.