Solid-state image capture element and electronic device enabled to eliminate asymmetry of a light reception amount

This application is a national stage application under 35 U.S.C. 371 and claims the benefit of PCT Application No. PCT/JP2016/059323 having an international filing date of 24 Mar. 2016, which designated the United States, which PCT application claimed the benefit of Japanese Patent Application No. 2015-078600 filed 7 Apr. 2015, the disclosures of which are incorporated herein by reference in their entirety.

The present disclosure relates to a solid-state image capture element and an electronic device, and particularly, relates to a solid-state image capture element and an electronic device which are enabled to eliminate asymmetry of a light reception amount in accordance with an incident angle of light incident on a pixel.

Conventionally, in an electronic device with an imaging function, such as a digital still camera or a digital video camera, for example, a solid-state image capture element, such as a charge coupled device (CCD) or a complementary metal oxide semiconductor (CMOS) image sensor is used. The solid-state image capture element has a pixel in which a photodiode that performs photoelectric conversion and a plurality of transistors are combined, and an image is constructed on the basis of pixel signals output from a plurality of pixels arranged in an image plane on which an image of a subject is formed.

Moreover, in recent years, a rear-surface irradiation type solid-state image capture element is often used in which a semiconductor substrate with a photodiode formed thereon is thinned, wiring layers are laminated on the front-surface of the semiconductor substrate, and light is incident from the rear-surface side of the semiconductor substrate to the photodiode.

By the way, in the rear-surface irradiation type solid-state image capture element, light incident from the rear-surface side passes through the semiconductor substrate and is reflected by a wiring formed in the wiring layer, and the reflected light may enter the photodiode. In this case, when the wiring formed in the wiring layer is asymmetrically formed with respect to the center of a pixel, a light amount of the reflected light incident on the photodiode may vary in accordance with an incident angle of the light. That is, in this case, even if a certain amount of light is incident on a pixel while the incident angle of the light is changed, an amount of the reflected light incident on the photodiode varies due to the asymmetry of the wiring layout, and thus a light reception amount of a pixel may not be constant.

Moreover, Patent Literature 1 discloses a rear-surface irradiation type solid-state image capture element which employs such a wiring layout that a wiring is not arranged under the pixels for receiving long wavelength light that easily passes through a semiconductor substrate, and suppresses mixing of light by reducing light reflection in the wiring layer.

Patent Literature

Patent Literature 1: JP2011-129627A

Technical Problem

By the way, in recent years, along with increase of speed of reading pixel signals from pixels, signal lines and control lines tend to increase, and thus it becomes difficult to employ such a wiring layout that wiring is not arranged under the pixels, like the aforementioned Patent Literature 1. Moreover, because such a wiring layout has lower flexibility of design, it is desired to enhance the flexibility of design and maintain a light reception amount of pixel constant with respect to an incident angle of light.

The present disclosure is devised in consideration of the situations, and it is possible to eliminate asymmetry of a light reception amount in accordance with an incident angle of light incident on the pixels.

Solution to Problem

A solid-state image capture element of an aspect of the present disclosure includes: a pixel including a light-receiving portion that receives light incident from a rear-surface side of a semiconductor substrate; and a wiring layer laminated on a front-surface of the semiconductor substrate. The pixel includes a symmetrical wiring that is formed symmetrically with respect to a center of the pixel in a plane view of the pixel.

An electronic device of an aspect of the present disclosure includes a solid-state image capture element including a pixel including a light-receiving portion that receives light incident from a rear-surface side of a semiconductor substrate, and a wiring layer laminated on a front-surface of the semiconductor substrate. The pixel includes a symmetrical wiring that is formed symmetrically with respect to a center of the pixel in a plane view of the pixel.

In an aspect of the present disclosure, a pixel including a light-receiving portion that receives light incident from a rear-surface side of a semiconductor substrate, and a wiring layer laminated on a front-surface of the semiconductor substrate are included. In the pixel, a symmetrical wiring is formed symmetrically with respect to a center of the pixel in a plane view of the pixel.

Advantageous Effects of Invention

According to an aspect of the present disclosure, asymmetry of a light reception amount in accordance with an incident angle of light incident on pixels can be eliminated.

FIG. 1 is a block diagram showing a configuration example of an embodiment of an image capture element to which the present technology is applied.

FIG. 2 is a diagram showing a configuration example of pixels.

FIG. 3 is a diagram showing improvement of shading shape.

FIG. 4 is a diagram showing a relationship between a space of wiring and mixing of light.

FIG. 5 is an explanatory diagram of a light shielding wiring.

FIG. 6 is an explanatory diagram of a first condition which a distance between symmetrical wiring and the light shielding wiring satisfies.

FIG. 7 is an explanatory diagram of a second condition which a distance between the symmetrical wiring and the light shielding wiring satisfies.

FIG. 8 is an explanatory diagram of a condition which a width of the light shielding wiring satisfies.

FIG. 9 is an explanatory diagram of pupil correction.

FIG. 10 is an explanatory diagram of pupil correction.

FIG. 11 is a diagram showing a first modification of a pixel.

FIG. 12 is a diagram showing a second modification of a pixel.

FIG. 13 is a diagram showing a third modification of a pixel.

FIG. 14 is a block diagram showing a configuration example of an imaging device mounted on an electronic device.

FIG. 15 is a diagram showing a usage example of using an image sensor.

Hereinbelow, a specific description is given of specific embodiments to which the present technology is applied with reference to the drawings.

FIG. 1 is a block diagram showing a configuration example of an embodiment of an image capture element to which the present technology is applied.

As shown in FIG. 1 , an image capture element 11 includes a pixel region 12 , a vertical drive circuit 13 , a column signal processing circuit 14 , a horizontal drive circuit 15 , an output circuit 16 , and a control circuit 17 .

The pixel region 12 is a light receiving surface that receives light collected by an optical system (not shown). In the pixel region 12 , a plurality of pixels 21 is arranged in a matrix, and each pixel 21 is connected to the vertical drive circuit 13 via a horizontal signal line 22 for each row and to the column signal processing circuit 14 via a vertical signal line 23 for each column. The plurality of pixels 21 outputs pixel signals at levels in accordance with the amount of light received, respectively, and images of the subject formed in the pixel region 12 are constructed from the pixel signals.

The vertical drive circuit 13 sequentially supplies a drive signal for driving (transferring, selecting, resetting, etc.) each pixel 21 to the pixel 21 via the horizontal signal line 22 , for each row of the plurality of pixels 21 arranged in the pixel region 12 . The column signal processing circuit 14 performs correlated double sampling (CDS) processing on pixel signals output from the plurality of pixels 21 via the vertical signal lines 23 , and thereby performs AD conversion of the pixel signals and removes the reset noise.

The horizontal drive circuit 15 sequentially supplies drive signals for outputting pixel signals from the column signal processing circuit 14 to a data output signal line 24 , to the column signal processing circuit 14 , for each column of the plurality of pixels 21 arranged in the pixel region 12 . The output circuit 16 amplifies the pixel signal supplied from the column signal processing circuit 14 via the data output signal line 24 at timing according to the drive signals of the horizontal drive circuit 15 , and outputs the amplified pixel signal to a signal processing circuit in a later stage. The control circuit 17 generates and supplies, for example, a clock signal according to the drive period of each block of the image capture element 11 and thereby controls the drive of each block.

In the image capture element 11 thus configured, for example, color filters which transmit red light, green light, and blue light are arranged for each pixel 21 according to so-called Bayer array, and each pixel 21 outputs a pixel signal in accordance with the amount of light of each color. Moreover, the image capture element 11 can employ a rear-surface type structure in which the semiconductor substrate with photodiodes configuring the pixels 21 formed thereon is thinned, wiring layers are laminated on the front-surface of the semiconductor substrate, and light is incident from the rear-surface side of the semiconductor substrate.

A configuration of the pixels 21 will be described with reference to FIG. 2 .

A of FIG. 2 shows a planar configuration example of four pixels 21 (pixel 21 R, pixel 21 Gr, pixel 21 Gb, and pixel 21 B) arranged in 2×2 according to the Bayer array, and B of FIG. 2 shows a cross-sectional configuration example of the pixel 21 R.

As shown in A of FIG. 2 , in the Bayer array, the pixel 21 R for receiving red light and the pixel 21 B for receiving blue light are arranged in rows and columns different from each other. Then, the pixel 21 Gr for receiving green light is arranged alternately with the pixel 21 R in the row of the pixel 21 R, and the pixel 21 Gb for receiving green light is arranged alternately with the pixel 21 B in the row of the pixel 21 B. Accordingly, as shown, the pixel 21 R, the pixel 21 Gr arranged on the right side of the pixel 21 R, the pixel 21 Gb arranged on the upper side of the pixel 21 R, and the pixel 21 B arranged diagonally with respect to the pixel 21 R are used as one set.

As shown in B of FIG. 2 , the pixel 21 R is formed by lamination of a wiring layer 31 , a light-receiving portion 32 R, and a red filter 33 R in order from the bottom.

The wiring layer 31 is formed by lamination of a plurality of wirings insulated by interlayer insulating films, and in an example of FIG. 2 , the wiring layer 31 is formed by lamination of four layers of wirings 41 R to 44 R. In other words, in the wiring layer 31 , a wiring 41 R that is a first layer ( 1 MT), wirings 42 R- 1 and 42 R- 2 that are second layers ( 2 MT), wirings 43 R- 1 and 43 R- 2 that are third layers ( 3 MT), wirings 44 R- 1 and 44 R- 2 that are fourth layers ( 4 MT) are formed in order from the light-receiving portion 32 R side.

The light-receiving portion 32 R is a photodiode formed by P-N junction of a P-type region and an N-type region formed on a semiconductor substrate, receives red light that passes through the red filter 33 R, generates electric charges in accordance with the amount of light and holds the electric charges.

The red filter 33 R is a color filter that transmits red light and is arranged at a position corresponding to the pixel 21 R. Note that, although not shown, a color filter that transmits blue light is arranged in the pixel 21 B, and color filters that transmit green light are arranged in the pixels 21 Gr and 21 Gb.

Further, in the pixel 21 R, the wiring 41 R formed closest to the light-receiving portion 32 R is formed in a square that is symmetrical with respect to the center (shape or optical center) of the pixel 21 R and is arranged at the center of the pixel 21 R, when the pixel 21 R is viewed in a planar view. Thus, in the pixel 21 R, the wiring 41 R can conceal asymmetry of the wirings 42 R to 44 R formed in the second and lower layers of the wiring layer 31 (on the farther side from the light-receiving portion 32 R), and a shading shape of the wiring 41 R can be improved.

For example, particularly in the rear-surface type image capture element 11 , longer wavelength light easily passes through a semiconductor substrate, and thereby in the pixel 21 R, light that has passed through the light-receiving portion 32 R is reflected on the wirings 41 R to 44 R of the wiring layer 31 , and the reflected light may enter the light-receiving portion 32 R. Therefore, when the wirings 41 R to 44 R are not formed symmetrically with respect to the pixel 21 R, due to the asymmetry, an amount of the reflected light incident on the light-receiving portion 32 R may vary depending on an incident angle of the light.

Improvement of asymmetry of a light reception amount of the light-receiving portion 32 R in accordance with an incident angle of light incident on the pixel 21 R will be described with reference to FIG. 3 .

A of FIG. 3 shows a simulation result of the pixel 21 R in which the wiring 41 R of a symmetrical shape is provided, and B of FIG. 2 shows a simulation result of a pixel 21 R′ in which the wiring 41 R of a symmetrical shape is not provided.

In the pixel 21 R, the wiring 41 R as described above with reference to FIG. 2 is formed in a first layer of the wiring layer 31 , and the wirings 42 R to 44 R are asymmetrically formed in second and lower layers of the wiring layer 31 . On the other hand, in the pixel 21 W, the wirings 42 R to 44 R are formed asymmetrically in the second and lower layers of the wiring layer 31 . In other words, the simulation is conducted such that the pixel 21 R and pixel 21 W are configured to differ only in the presence or absence of the wiring 41 R and have the same wirings 42 R to 44 R in the second and lower layers of the wiring layer 31 .

Moreover, in the simulation result shown in the right side of A of FIG. 3 and B of FIG. 3 , the horizontal axis represents an incident angle (an angle when an angle orthogonal to the front-surface is 0 degree) of light incident on the pixel 21 R and pixel 21 R′. Moreover, the vertical axis represents the ratio of a pixel signal (hereinbelow, referred to as “shading”) for each incident angle to the maximum value with the maximum value taken as 100%.

As shown in A of FIG. 3 , in the pixel 21 R, shading with respect to an incident angle of light is substantially constant, and it is indicated that no great change (very small change) occurs in a pixel signal output from the pixel 21 R regardless of the incident angle of light incident on the pixel 21 R.

In contrast, as shown in B of FIG. 3 , in the pixel 21 R′, shading with respect to an incident angle of light is not constant, and the waveform (hereinbelow, referred to as “shading shape”) is asymmetric. That is, it is indicated that, in accordance with an incident angle of light incident on the pixel 21 R′, a great change occurs in a pixel signal output from the pixel 21 R′. As described above, in the pixel 21 R′, when an incident angle of incident light changes, due to the asymmetry of the wirings 42 R to 44 R, an amount of light received by the pixel 21 R′ changes, in other words, the shading shape deteriorates (the difference of reflected light between the plus side and the minus side of incident angle increases).

Accordingly, the pixel 21 R is provided centrally with the wiring 41 R of a symmetrical shape, and thereby removing adverse effects caused by asymmetry of the wirings 42 R to 44 R formed in the second and lower layers of the wiring layer 31 , and improving the shading shape compared with the pixel 21 R′.

Here, as shown in A of FIG. 2 , in the pixel 21 R, the wiring 41 R is formed to have spaces X between the wiring 41 R and the adjacent pixels 21 Gr and 21 Gb, respectively. Providing such a space X enables to avoid light incident on the pixel 21 R from being reflected on the wiring 41 R and mixing into the pixel 21 Gr or 21 Gb.

For example, the configuration is employed in which the wiring 41 R is formed to cover the entire surface of the first layer of the wiring layer 31 (all regions excluding portions where through-electrodes are formed), so that it is contemplated that adverse effects caused by asymmetry of the wirings 42 R to 44 R formed in the second and lower layers can be avoided. However, when the wiring 41 R is formed to cover the entire surface, it is apprehended that the light reflected on the wiring 41 R mixes into the adjacent pixel 21 Gr or 21 Gb.

Here, a relationship between the spaces X provided between the wiring 41 R and the pixels 21 Gr and 21 Gb and the mixing of light from the pixel 21 R to the pixel 21 Gr or 21 Gb will be described with reference to FIG. 4 .

FIG. 4 shows simulation results of an output ratio (GR/GB) which is a ratio of a pixel signal GR output from the pixel 21 Gr with respect to a pixel signal GB output from the pixel 21 Gb, when an incident angle of light is changed to the row direction of the pixel 21 R.

For example, when the space X of the wiring 41 R is set to 0 nm, in other words, when the wiring 41 R is formed on the entire surface of the first layer of the wiring layer 31 , an output ratio when an incident angle is 0 degree (orthogonal to the sensor surface) is 0.68%. Moreover, an output ratio when an incident angle is 10 degrees is 2.08%, and an output ratio when an incident angle is 20 degrees is 15.96%. In other words, it is indicated that as an incident angle of light is increased to the row direction of the pixel 21 R, the mixing into the pixel 21 Gr adjacent in the row direction is increased in a larger degree than the mixing into the pixel 21 Gb adjacent in the column direction.

Moreover, when the space X of the wiring 41 R is set to 300 nm, an output ratio when an incident angle is 0 degree is 0.41%, an output ratio when an incident angle is 10 degrees is 2.13%, and an output ratio when incident angle is 20 degrees is 11.01%. Further, when the space X of the wiring 41 R is set to 600 nm, an output ratio when an incident angle is 0 degree is 0.24%, an output ratio when an incident angle is 10 degrees is 4.99%, and an output ratio when an incident angle is 20 degrees is 12.31%. Furthermore, when the space X of the wiring 41 R is set to 900 nm, an output ratio when an incident angle is 0 degree is −1.60%, an output ratio when an incident angle is 10 degrees is 4.34%, and an output ratio when an incident angle is 20 degrees is 7.47%.

As described above, the pixel 21 R having a configuration in which the wiring 41 R is formed to have the spaces X between the wiring 41 R and the pixels 21 Gr and 21 Gb, respectively can suppress the mixing of light into the pixels 21 Gr and 21 Gb, compared with a configuration in which the wiring 41 R is formed on the entire surface of the first layer of the wiring layer 31 . Particularly in the case that an incident angle is large, the mixing of light is greatly increased when the wiring 41 R is formed on the entire surface of the first layer of the wiring layer 31 , while the mixing of light can be effectively suppressed when the space X is provided.

Accordingly, in order to suppress the mixing of light as described above, in the pixel 21 R, it is necessary to layout the wiring 41 R by providing an appropriate space X.

By the way, when the wiring 41 R is formed with the space X in the pixel 21 R, it is apprehended that the light which passes through the gap is reflected on a wiring under the wiring 41 R, and the reflected light mixes into the adjacent pixel 21 Gr or 21 Gb. Accordingly, it is possible to provide a wiring for shielding such light in the first layer of the wiring layer 31 of the pixel 21 Gr or 21 Gb. Note that, hereinbelow, when the pixels 21 Gr and 21 Gb need not to be distinguished, they are simply referred to as “pixel 21 G” as appropriate.

A wiring 41 G for shielding light provided in the pixel 21 G will be described with reference to FIG. 5 .

FIG. 5 shows a cross-sectional configuration example of the pixel 21 R and pixel 21 G. As shown in FIG. 5 , the pixel 21 G is formed by lamination of a light-receiving portion 32 G for receiving green light and a green filter 33 G for transmitting green light on the wiring layer 31 , as in the pixel 21 R.

Further, in the pixel 21 G, a wiring 41 G formed to have a predetermined width from the boundary with the pixel 21 R is provided in the first layer of the wiring layer 31 . Accordingly, the pixel 21 G can shield, with the wiring 41 G, light reflected on wirings 42 R to 44 R of the second and lower layers provided in the wiring layer 31 of the pixel 21 R, prevent such light from entering the light-receiving portion 32 G, and reduce occurrence of color mixture.

As described above, in the image capture element 11 , the pixel 21 R can improve shading shape by having the wiring 41 R formed symmetrically with respect to the center of pixel 21 R, and the pixel 21 G can prevent the mixing of light from the pixel 21 R by having the wiring 41 G for shielding light reflected on the wiring layer 31 of the pixel 21 R.

Here, hereinbelow, the wiring 41 R provided in the pixel 21 R is also referred to as “symmetrical wiring 41 R”, and the wiring 41 G provided in the pixel 21 G is also referred to as “light shielding wiring 41 G”, as appropriate. For example, the symmetrical wiring 41 R and the light shielding wiring 41 G are connected to a drain power source VDD.

Furthermore, in the image capture element 11 , in order to prevent the mixing of light from the pixel 21 R to the pixel 21 G, a distance between the symmetrical wiring 41 R and the light shielding wiring 41 G, and, a width of the light shielding wiring 41 G preferably satisfy the conditions described below.

For example, in the pixel 21 R, it is necessary to prevent the light reflected on the symmetrical wiring 41 R from entering the light-receiving portion 32 G.

A first condition that the distance between the symmetrical wiring 41 R and the light shielding wiring 41 G satisfies will be described with reference to FIG. 6 .

For example, as shown by the void arrows in FIG. 6 , in order to avoid light incident at an incident angle θ from being reflected at the end on the pixel 21 G side of the wiring 41 R and entering the light-receiving portion 32 G, a distance Wr between the symmetrical wiring 41 R and the light shielding wiring 41 G is set. In other words, the distance Wr between the symmetrical wiring 41 R and the light shielding wiring 41 G needs to satisfy the relationship of Formula (1) as follows, with respect to a vertical distance Z 1 between the light-receiving portion 32 R and the symmetrical wiring 41 R and an incident angle θ at which light enters the pixel 21 R.

[Math. 1]

Wr> 2× Z 1×tan θ  (1)

As described above, setting the distance Wr larger than the lower limit value (2×Z 1 ×tan θ) shown in Formula (1) using the distance Z 1 and the incident angle θ can avoid the light reflected on the symmetrical wiring 41 R of the pixel 21 R from entering the light-receiving portion 32 G.

Next, in the pixel 21 R, a wiring which is not covered by the symmetrical wiring 41 R is provided in the second and lower layers of the wiring layer 31 , it is necessary to prevent the light reflected on the wiring from passing between the symmetrical wiring 41 R and the light shielding wiring 41 G and entering the light-receiving portion 32 G.

A second condition that a distance between the symmetrical wiring 41 R and the light shielding wiring 41 G satisfies will be described with reference to FIG. 7 .

The pixel 21 R shown in FIG. 7 has a configuration in which the wiring 43 R- 1 which is not covered by the symmetrical wiring 41 R is provided. Then, for example, as shown by the void arrows in FIG. 7 , it is necessary to prevent light incident at an incident angle θ from passing the gap between the symmetrical wiring 41 R and the light shielding wiring 41 G and being reflected on the wiring 43 R- 1 , and the reflected light from passing through the gap and entering the light-receiving portion 32 G.

To this end, the distance Wr between the symmetrical wiring 41 R and the light shielding wiring 41 G needs to satisfy the relationship of Formula (2) as follows, with respect to the vertical distance Z 2 between the symmetrical wiring 41 R and the wiring 43 R- 1 , and an incident angle θ at which light enters the pixel 21 R.

[Math. 2]

Wr< 2× Z 2×tan θ  (2)

As described above, setting the distance Wr smaller than the upper limit value (2×Z 2 ×tan θ) shown in Formula (2) using the distance Z 2 and the incident angle θ can avoid light reflected on the wiring 43 R- 1 which is not covered by the symmetrical wiring 41 R of the pixel 21 R from entering the light-receiving portion 32 G.

Next, in the pixel 21 R, when a wiring which is not covered by the symmetrical wiring 41 R is provided in the second and lower layers of the wiring layer 31 , it is necessary to prevent the light reflected on the wiring from passing through the inner side of the pixel 21 G than the light shielding wiring 41 G and entering the light-receiving portion 32 G.

Conditions which a width of the light shielding wiring 41 G satisfies will be described with reference to FIG. 8 .

The pixel 21 R shown in FIG. 8 has a configuration in which the wiring 43 R- 1 not covered by the symmetrical wiring 41 R is provided. Then, for example, as shown by the void arrows in FIG. 8 , it is necessary to prevent the light incident at an incident angle θ from passing through a gap between the symmetrical wiring 41 R and the light shielding wiring 41 G and being reflected on the wiring 43 R- 1 , and the reflected light from passing through the inner side of the pixel 21 G than the light shielding wiring 41 G and entering the light-receiving portion 32 G.

To this end, a width Wg of the light shielding wiring 41 G needs to satisfy the relationship of Formula (3) as follows with respect to a vertical distance Z 2 between the symmetrical wiring 41 R and the wiring 43 R- 1 and an incident angle θ at which light enters the pixel 21 R.

[Math. 3]

Wg>Z 2×tan θ  (3)

As described above, setting the width Wg larger than the lower limit value (Z 2 ×tan θ) shown in Formula (3) using the distance Z 2 and the incident angle θ can avoid the light reflected on the wiring 43 R- 1 which is not covered by the symmetrical wiring 41 R of the pixel 21 R from entering the light-receiving portion 32 G.

As described above, the image capture element 11 can eliminate asymmetry of a light reception amount in accordance with an incident angle of light incident on the pixel 21 R. Particularly in the pixel 21 R, the wirings 42 R to 44 R formed in the second and lower layers of the wiring layer 31 may be formed asymmetrically, and flexibility of design of wiring layout can be enhanced. For example, in the image capture element 11 , it is possible to increase speed of reading pixel signals by increasing signal lines, control lines and the like.

By the way, in the image capture element 11 , an incident angle θ of light incident on the pixel 21 varies depending on a position where the pixel 21 is arranged in the pixel region 12 . In other words, the incident angle θ decreases at the center of the pixel region 12 , and the incident angle θ increases in the periphery of the pixel region 12 . Accordingly, in the image capture element 11 , it is preferable to correct the distance Wr and the width Wg in accordance with the position of the pixel 21 (hereinbelow, referred to as “pupil correction”).

Next, the pupil correction of the distance Wr and the width Wg in accordance with a position where the pixel 21 is arranged will be described with reference to FIGS. 9 and 10 .

A of FIG. 9 shows a cross-sectional configuration example of the pixel 21 R and the pixel 21 G arranged at the center of the pixel region 12 , and B of FIG. 9 shows a cross-sectional configuration example of the pixel 21 R and the pixel 21 G arranged in the periphery of the pixel region 12 .

As shown in FIG. 9 , the incident angle θ 1 decreases at the center of the pixel region 12 , and the incident angle θ 2 increases in the periphery of the pixel region 12 . Accordingly, it is preferable to perform pupil correction such that the distance Wr 2 of the pixel 21 R arranged in the periphery of the pixel region 12 is greater than the distance Wr 1 of the pixel 21 R arranged at the center of the pixel region 12 (Wr 1 <Wr 2 ). Thus, the mixing of light from the pixel 21 R to the pixel 21 G can be appropriately reduced in accordance with the position where the pixel 21 R and the pixel 21 G are arranged in the pixel region 12 .

Moreover, A of FIG. 10 shows a cross-sectional configuration example of the pixel 21 R and the pixel 21 G arranged at the center of the pixel region 12 , and B of FIG. 10 shows a cross-sectional configuration example of the pixel 21 R and the pixel 21 G arranged in the periphery of the pixel region 12 .

As shown in FIG. 10 , the incident angle θ 1 decreases at the center of the pixel region 12 , and the incident angle θ 2 increases in the periphery of the pixel region 12 . Accordingly, it is preferable to perform pupil correction such that the width Wg 2 of the light shielding wiring 41 G of the pixel 21 G arranged in the periphery of pixel region 12 is greater than the width Wg 1 of the light shielding wiring 41 G of the pixel 21 G arranged at the center of the pixel region 12 (Wg 1 <Wg 2 ). Thus, the mixing of light from the pixel 21 R to the pixel 21 G can be appropriately reduced in accordance with the position where the pixel 21 R and the pixel 21 G are arranged in the pixel region 12 .

By performing the pupil correction as described above, in the image capture element 11 , it is possible to reduce color mixture regardless of an image height and capture an image in which noise due to color mixture is suppressed.

Note that, in the pixel 21 R shown in FIG. 2 , the planar shape of the wiring 41 R formed in the first layer of the wiring layer 31 is formed in a square shape, but not limited thereto. Moreover, the wiring of a symmetrical shape may be formed in a layer other than the first layer of the wiring layer 31 .

Next, modifications of the pixel 21 R will be described with reference to FIGS. 11 to 13 .

For example, in the pixel 21 R-a shown in FIG. 11 , the planar shape of the wiring 41 R-a formed in the first layer of the wiring layer 31 is formed in a circular shape. Moreover, in the pixel 21 R-b shown in FIG. 12 , the planar shape of the wiring 41 R-b formed in the first layer of the wiring layer 31 is formed in an octagon shape. As described above, the planar shape of the wiring 41 R may be any shape as long as it is symmetrical with respect to the center of the pixel 21 R, and the wiring 41 R need only conceal the asymmetry of the wiring of the second and lower layers and improve the shading shape.

Moreover, the pixel 21 R-c shown in FIG. 13 has a configuration in which the wiring 42 R with symmetry is formed in the second layer of the wiring layer 31 . Note that, while the wiring 42 R is formed in the second layer, in the pixel 21 R-c, no wiring is formed in the first layer of the wiring layer 31 , so that the wiring 42 R is formed closest to the light-receiving portion 32 R. As described above, when the wiring layer 31 has the degree of freedom of wiring layout, the wiring 42 R with symmetry may be formed in the second layer of the wiring layer 31 . The wiring 42 R configured thus can suppress effects of the asymmetrical wiring 43 R or 44 R formed below the wiring 42 R.

Moreover, for example, in the pixel 21 R, the wiring 42 R with symmetry is provided in the second layer of the wiring layer 31 , and in the pixel 21 G, the wiring 41 G for shielding light is provided in the first layer of the wiring layer 31 , so that it is possible to reliably prevent light reflected on the wiring 42 R or light reflected on a wiring below the wiring 42 R from entering the light-receiving portion 32 G.

Note that, in the aforementioned present embodiment, while the configuration has been described in which the wiring 42 R with symmetry formed in the first layer of the wiring layer 31 is provided in the pixel 21 R, obviously, the wiring with symmetry formed in the first layer of the wiring layer 31 may be provided in the pixel 21 B or the pixel 21 G. As described above, the wiring 42 R with symmetry formed in the first layer of the wiring layer 31 is not limited to being in the pixel 21 R, and may be, for example, in the pixel 21 that receives infrared light. For example, a wiring with symmetry formed in the first layer of the wiring layer 31 is provided in the pixel 21 that receives light having a wavelength of 620 nm or more, thus giving a good effect.

Note that the image capture element 11 of the embodiment as described above can be used for various electronic devices, such as imaging systems, such as digital still cameras or digital video cameras, mobile phones having an imaging function, or other devices having an imaging function, for example.

FIG. 14 is a block diagram showing a configuration example of an imaging device mounted on an electronic device.

As shown in FIG. 14 , an imaging device 101 includes an optical system 102 , an image capture element 103 , a signal processing circuit 104 , a monitor 105 , and a memory 106 , and can capture still images and moving images.

The optical system 102 is configured to have one or a plurality of lenses, and guides image light from a subject (incident light) to the image capture element 103 and forms an image on the light receiving surface (sensor unit) of the image capture element 103 .

As the image capture element 103 , the image capture element 11 of the aforementioned embodiment is used. Electrons are stored in the image capture element 103 for a certain period in accordance with the image formed on the light receiving surface via the optical system 102 . Then, a signal corresponding to electrons stored in the image capture element 103 is supplied to the signal processing circuit 104 .

The signal processing circuit 104 performs various kinds of signal processing on the pixel signal output from the image capture element 103 . The image (image data) obtained by the signal processing performed by the signal processing circuit 104 is supplied to and displayed on the monitor 105 , or is supplied to and stored (recorded) in the memory 106 .

In the imaging device 101 thus configured, for example, a high-quality image with adverse effects due to an incident angle of light removed can be captured by use of the image capture element 11 of the aforementioned embodiment.

FIG. 15 is a diagram showing a usage example of using the aforementioned image capture element 11 (image sensor).

The image sensor described above can be used in a variety of cases, e.g., sensing light such as visible light, infrared light, ultraviolet light, and X-ray.

Devices that take images used for viewing, such as a digital camera and a portable appliance with a camera function. Devices used for traffic, such as an in-vehicle sensor that takes images of the front and the back of a car, surroundings, the inside of the car, and the like, a monitoring camera that monitors travelling vehicles and roads, and a distance sensor that measures distances between vehicles and the like, which are used for safe driving (e.g., automatic stop), recognition of the condition of a driver, and the like. Devices used for home electrical appliances, such as a TV, a refrigerator, and an air conditioner, to takes images of a gesture of a user and perform appliance operation in accordance with the gesture. Devices used for medical care and health care, such as an endoscope and a device that performs angiography by reception of infrared light. Devices used for security, such as a monitoring camera for crime prevention and a camera for personal authentication. Devices used for beauty care, such as skin measurement equipment that takes images of the skin and a microscope that takes images of the scalp. Devices used for sports, such as an action camera and a wearable camera for sports and the like. Devices used for agriculture, such as a camera for monitoring the condition of the field and crops.

Additionally, the present technology may also be configured as below.

(1)

A solid-state image capture element including:

a pixel including a light-receiving portion that receives light incident from a rear-surface side of a semiconductor substrate; and

a wiring layer laminated on a front-surface of the semiconductor substrate,

in which the pixel includes a symmetrical wiring that is formed symmetrically with respect to a center of the pixel in a plane view of the pixel.

(2)

The solid-state image capture element according to (1),

in which the symmetrical wiring is arranged in a layer closest to the light-receiving portion, of a plurality of layers of wiring formed in the wiring layer.

(3)

The solid-state image capture element according to (1) or (2),

in which a gap of a predetermined distance is provided between a second pixel adjacent to a first pixel including the symmetrical wiring and the symmetrical wiring.

(4)

The solid-state image capture element according to (3),

in which a light shielding wiring having a predetermined width from a boundary of the first pixel is provided in a layer closest to the light-receiving portion, of a plurality of layers of wiring formed in the wiring layer of the second pixel.

(5)

The solid-state image capture element according to (3),

in which in the first pixel, the predetermined distance provided between the second pixel and the symmetrical wiring is corrected in accordance with an arrangement position of the first pixel.

(6)

The solid-state image capture element according to (4),

in which the predetermined width of the light shielding wiring provided in the second pixel is corrected in accordance with an arrangement position of the second pixel.

(7)

The solid-state image capture element according to any one of (1) to (6),

in which the first pixel is a pixel configured to receive red light, and the second pixel is a pixel configured to receive green light.

(8)

The solid-state image capture element according to any one of (1) to (7),

in which the first pixel is a pixel configured to receive light having a wavelength of 620 nm or more.

(9)

An electronic device including

a solid-state image capture element including

a pixel including a light-receiving portion that receives light incident from a rear-surface side of a semiconductor substrate, and

a wiring layer laminated on a front-surface of the semiconductor substrate,

in which the pixel includes a symmetrical wiring that is formed symmetrically with respect to a center of the pixel in a plane view of the pixel.

Note that, the present embodiment is not limited to the aforementioned embodiment and various changes can be made without departing from the gist of the present disclosure.

11 image capture element

12 pixel region

13 vertical drive circuit

14 column signal processing circuit

15 horizontal drive circuit

16 output circuit

17 control circuit

21 pixel

22 horizontal signal line

23 vertical signal line

24 data output signal line

31 wiring layer

32 R and 32 G light-receiving portion

33 R red filter

33 G green filter

41 to 44 wiring