Polarizer with variable inter-wire distance

This claims priority to U.S. Provisional Patent Application No. 61/924,569, filed on Jan. 7, 2014, 61/924,560, filed on Jan. 7, 2014, 61/895,225, filed on Oct. 24, 2013, which are hereby incorporated herein by reference in their entirety.

The present application is related generally to wire grid polarizers.

Wire grid polarizers may be used for polarizing light, by allowing one polarization of light to pass through the polarizer, and reflecting or absorbing an opposite polarization of light. For simplicity, the polarization that primarily passes through the polarizer will be hereafter referred to as p-polarized light and the polarization that is primarily reflected or absorbed will be hereafter referred to as s-polarized light. Goals of wire grid polarizer design include increasing transmission of p-polarized light, decreasing transmission of s-polarized light, and increasing reflection or absorption of s-polarized light. Different applications have different requirements.

The goals of increasing transmission of p-polarized light and decreasing transmission of s-polarized light are common to most or all applications. There can be a trade-off between these two. In other words, certain designs that may increase transmission of p-polarized light may also undesirably increase transmission of s-polarized light. Other designs that decrease transmission of s-polarized light may also undesirably decrease transmission of p-polarized light.

For some applications, it is desirable to reflect as much s-polarized light as possible. For example, reflected light from a wire grid polarizing beam splitter can effectively utilize both the transmitted p-polarized light and the reflected s-polarized light. It can be important in such designs to increase reflection of s-polarized light without reducing transmission of p-polarized light. Sometimes there is a trade-off in a particular design between increasing transmission of p-polarized light and increasing reflection of s-polarized light.

For other applications, absorption of s-polarized light may be preferred, such as for example if reflection of light can disrupt the image or other intended use. In a transmissive panel image projection system, reflected light may go back into the LCD imager causing image degradation, or stray light can reach the screen, degrading contrast. An ideal selectively absorptive wire grid polarizer will transmit all p-polarized light and selectively absorb all s-polarized light. In reality, some s-polarized light is transmitted and some reflected and some p-polarized light is absorbed and some reflected. Sometimes there is a trade-off in a particular design between increasing transmission of p-polarized light and increasing absorption of s-polarized light.

The effectiveness of a wire grid polarizer can thus be quantified by (1) high transmission of p-polarized light; (2) high contrast; and (3) depending on the design, high absorption or reflection of s-polarized light. Contrast is equal to percent of p-polarized light transmitted (Tp) divided by percent of s-polarized light transmitted (Ts): Contrast=Tp/Ts.

It can be important in wire grid polarizers for infrared, visible, and ultraviolet light to have small wires with small pitch, such as nanometer or micrometer size and pitch, for effective polarization. Typically, a pitch of less than half of the wavelength of light to be polarized is needed for effective polarization. Smaller pitches may improve the contrast. Thus, small pitch can be an important feature of wire grid polarizers. Manufacture of wire grid polarizers with sufficiently small pitch is challenging, and is a goal of research in this field.

Small wires can be damaged by handling and by environmental conditions. Protection of the wires can be important in wire grid polarizers. Durability of wire grid polarizers is thus another important feature. Increasing degrees of freedom of the polarizer can be valuable at allowing a wire grid polarizer to optimize its design for a specific application or wavelength.

For example, see U.S. Pat. No. 5,991,075, U.S. Pat. No. 6,288,840, U.S. Pat. No. 6,665,119, U.S. Pat. No. 7,630,133, U.S. Pat. No. 7,692,860, U.S. Pat. No. 7,800,823, U.S. Pat. No. 7,961,393, and U.S. Pat. No. 8,426,121; U.S. Patent Publication Numbers US 2008/0055723, US 2009/0041971, and US 2009/0053655; U.S. patent application Ser. No. 13/326,566, filed on Dec. 15, 2011; “Application of 100 Å linewidth structures fabricated by shadowing techniques” by D. C. Flanders in J. Vac. Sci. Technol., 19(4), November/December 1981; and “Submicron periodicity gratings as artificial anisotropic dielectrics” by Dale C. Flanders in Appl. Phys. Lett. 42 (6), 15 Mar. 1983, pp. 492-494.

It has been recognized that it would be advantageous to provide a durable wire grid polarizer with high transmission of p-polarized light, high contrast, and/or small pitch. High absorption or high reflection of s-polarized light, depending on the design, can also be important. It has been recognized that it would be advantageous to provide a wire grid polarizer with increased degrees of freedom. The present invention is directed to various embodiments of, and methods of making, wire grid polarizers. Each of the various embodiments or methods may satisfy one or more of these needs.

In one embodiment, the wire grid polarizer can comprise an array of parallel, elongated nano-structures disposed over a surface of a substrate. Each of the nano-structures can include a pair of parallel, elongated wires, each oriented laterally with respect to one another. Each wire of the pair of wires can include a top rib disposed over a bottom rib. There can be a first gap disposed between the pair of wires. The first gap can extend between adjacent top ribs and adjacent bottom ribs. Each of the nano-structures can be separated from an adjacent nano-structure by a second gap disposed between adjacent nanostructures, and thus between adjacent pairs of wires. A first gap width of the first gap can be different than a second gap width of the second gap.

In another embodiment, the wire grid polarizer can comprise an array of parallel, elongated nano-structures disposed over a surface of a substrate. Each of the nano-structures can include a pair of parallel, elongated top ribs, each oriented laterally with respect to one another, and a first gap disposed between the pair of top ribs. Each of the nano-structures can be separated from an adjacent nano-structure by a second gap disposed between adjacent nanostructures, and thus between adjacent pairs of top ribs. There can be a first gap width of the first gap that is different than a second gap width of the second gap.

A method of making a wire grid polarizer can comprise some or all of the following steps:

1. providing a transmissive substrate having an array of parallel, elongated support ribs disposed over the substrate with solid-material-free support-rib gaps between the support ribs; 2. conformal coating the substrate and the support ribs with a layer of material while maintaining the support-rib gaps between the support ribs; 3. etching the layer of material to remove horizontal segments and leaving an array of parallel, elongated top ribs along sides of the support ribs, including a pair of top ribs for each support rib with a top rib disposed along each side of the support rib; 4. backfilling the support-rib gaps and above tops of the support ribs with first fill material, the first fill material and the support ribs having similar etch properties; 5. etching the first fill material down to tops of the top ribs and tops of the support ribs; and 6. etching the support ribs and the first fill material in the support-rib gaps down to a base of the top ribs.

FIG. 1 is a schematic cross-sectional side view of a wire grid polarizer 10 comprising an array of parallel, elongated nano-structures 15 , each of the nano-structures 15 including a pair of parallel, elongated wires 16 , each oriented laterally with respect to one another, each including a top rib 12 disposed over a bottom rib 14 , a first gap G 1 disposed between the pair of top ribs 12 , and each of the nano-structures 15 separated from an adjacent nano-structure 15 by a second gap G 2 , in accordance with an embodiment of the present invention;

FIG. 2 is a schematic cross-sectional side view of a wire grid polarizer 20 , similar to wire grid polarizer 10 , but also including a second fill material 21 disposed in the first gaps G 1 and in the second gaps G 2 , the second fill material 21 extending above a top 15 t of the nanostructures 15 , in accordance with an embodiment of the present invention;

FIG. 3 is a schematic cross-sectional side view of a wire grid polarizer 30 , similar to wire grid polarizer 10 , but also including a second fill material 21 disposed in the first gaps G 1 and in the second gaps G 2 , the second fill material 21 terminating at or below a top 15 t of the nanostructures 15 , and the nanostructures 15 separating the second fill material 21 in one gap G from the second fill material 21 in an adjacent gap G, such that the second fill material 21 forms an array of second fill material ribs 21 r , in accordance with an embodiment of the present invention;

FIG. 9 is a schematic cross-sectional side view of a wire grid polarizer 90 comprising an array of parallel, elongated nano-structures 15 , each of the nano-structures 15 including a pair of parallel, elongated top ribs 12 , each oriented laterally with respect to one another, a first gap G 1 disposed between the pair of top ribs 12 , and each of the nano-structures 15 separated from an adjacent nano-structure 15 by a second gap G 2 , in accordance with an embodiment of the present invention;

FIGS. 1-10 are schematic cross-sectional side views illustrating methods of manufacture of wire grid polarizers, according to embodiments of the present invention;

FIG. 4 shows a step of providing a substrate 11 having an array of parallel, elongated support ribs 13 disposed over the substrate 11 with solid-material-free support-rib gaps G s between the support ribs 13 , according to an embodiment of the present invention;

FIG. 5 shows a step of conformal coating the substrate 11 and the support ribs 13 with a layer of material 52 while maintaining the support-rib gaps G s between the support ribs 13 , according to an embodiment of the present invention;

FIGS. 5-6 shows a step of etching the layer of material 52 to remove horizontal segments 52 h and leaving an array of parallel, elongated top ribs 12 along sides of the support ribs 13 , including a pair of top ribs 12 for each support rib 13 with a top rib 12 disposed along each side of the support rib 13 , according to an embodiment of the present invention;

FIG. 7 shows a step of backfilling the support-rib gaps G s and above tops 13 t of the support ribs 13 with a solid first fill material 71 , according to an embodiment of the present invention;

FIG. 8 shows a step of etching the first fill material 71 at least down to tops 12 t of the top ribs 12 and tops 13 t of the support ribs 13 , according to an embodiment of the present invention;

FIG. 9 shows a step of etching the support ribs 13 and the first fill material 71 in the support-rib gaps G s down to a base 12 b of the top ribs 12 , according to an embodiment of the present invention;

FIGS. 10 & 1 show a step of using the top ribs 12 as a mask, etching 101 the substrate 11 between top ribs 12 thus forming an array of parallel elongated bottom ribs 14 , with each bottom rib 14 disposed below a top rib 12 , with each top rib 12 and bottom rib 14 together defining a wire 16 , with gaps G between adjacent wires 16 , according to an embodiment of the present invention;

FIG. 2 shows a step of backfilling the gaps G between the wires 16 and above tops 16 t of the wires 16 with second fill material 21 , according to an embodiment of the present invention; and

FIG. 3 shows a step of etching the second fill material 21 at least down to tops 16 t of the wires 16 , forming a second fill material rib 21 r in each gap G, according to an embodiment of the present invention.

10 wire grid polarizer

11 substrate

11 s substrate surface

12 top rib

12 b base of the top rib

12 bp common plane at a base of the top rib

12 tp common plane at a top of the top rib

12 t top of the top rib

13 support rib

13 t support rib top

14 bottom rib

14 t top of the bottom rib

15 nano-structure

15 b base of the nanostructure

15 bp common plane at a base of the nanostructure

15 t top of the nanostructure

15 tp common plane at a top of the nanostructure

16 wire

16 a individual wire in a pair of wires

16 b individual wire in a pair of wires

16 t wire top

20 wire grid polarizer

21 second fill material

21 r second fill material rib

21 r1 second fill material rib in the first gap

21 r2 second fill material rib in the second gap

30 wire grid polarizer

51 etch

52 layer of material

52 h horizontal segments of the layer of material

52 v vertical segments of the layer of material

71 first fill material

90 wire grid polarizer

101 etch

G gap

G 1 first gap

G 2 second gap

G s support-rib gap

Th 12 top rib thickness

Th 14 bottom rib thickness

Th 16 wire thickness

W 1 first gap width

W 2 second gap width

W 12 top rib width

W 13 support rib width

W 14 bottom rib width

W 16 wire width

W 52 layer of material width

Many materials used in optical structures absorb some light, reflect some light, and transmit some light. The following definitions are intended to distinguish between materials or structures that are primarily absorptive, primarily reflective, or primarily transmissive.

1. As used herein, the term “absorptive” means substantially absorptive of light in the wavelength of interest.

a. Whether a material is “absorptive” is relative to other materials used in the polarizer. Thus, an absorptive structure will absorb substantially more than a reflective or a transmissive structure. b. Whether a material is “absorptive” is dependent on the wavelength of interest. A material can be absorptive in one wavelength range but not in another. c. In one aspect, an absorptive structure can absorb greater than 40% and reflect less than 60% of light in the wavelength of interest (assuming the absorptive structure is an optically thick film—i.e. greater than the skin depth thickness). d. Absorptive ribs can be used for selectively absorbing one polarization of light.

2. As used herein, the term “reflective” means substantially reflective of light in the wavelength of interest.

a. Whether a material is “reflective” is relative to other materials used in the polarizer. Thus, a reflective structure will reflect substantially more than an absorptive or a transmissive structure. b. Whether a material is “reflective” is dependent on the wavelength of interest. A material can be reflective in one wavelength range but not in another. Some wavelength ranges can effectively utilize highly reflective materials. At other wavelength ranges, especially lower wavelengths where material degradation is more likely to occur, the choice of materials may be more limited and an optical designer may need to accept materials with a lower reflectance than desired. c. In one aspect, a reflective structure can reflect greater than 80% and absorb less than 20% of light in the wavelength of interest (assuming the reflective structure is an optically thick film—i.e. greater than the skin depth thickness). d. Metals are often used as reflective materials. e. Reflective wires can be used for separating one polarization of light from an opposite polarization of light.

3. As used herein, the term “transmissive” means substantially transmissive to light in the wavelength of interest.

a. Whether a material is “transmissive” is relative to other materials used in the polarizer. Thus, a transmissive structure will transmit substantially more than an absorptive or a reflective structure. b. Whether a material is “transmissive” is dependent on the wavelength of interest. A material can be transmissive in one wavelength range but not in another. c. In one aspect, a transmissive structure can transmit greater than 90% and absorb less than 10% of light in the wavelength of interest.

4. As used in these definitions, the term “material” refers to the overall material of a particular structure. Thus, a structure that is “absorptive” is made of a material that as a whole is substantially absorptive, even though the material may include some reflective or transmissive components. Thus for example, a rib made of a sufficient amount of absorptive material so that it substantially absorbs light is an absorptive rib even though the rib may include some reflective or transmissive material embedded therein. 5. As used herein, the term “light” can mean light or electromagnetic radiation in the x-ray, ultraviolet, visible, and/or infrared, or other regions of the electromagnetic spectrum. 6. As used herein, the term “substrate” includes a base material, such as for example a glass wafer. The term “substrate” includes a single material, and also includes multiple materials, such as for example a glass wafer with at least one thin film on a surface of the wafer used together as the base material.

As illustrated in FIGS. 1-3 , wire grid polarizers 10 , 20 , and 30 are shown comprising an array of parallel, elongated nano-structures 15 disposed over a surface 11 s of a substrate 11 . The substrate can be a sheet of glass or a wafer, and can be thin with two opposite, planar surfaces. Each of the nano-structures 15 can include a pair (e.g. see 16 a and 16 b ) of parallel, elongated wires 16 , each oriented laterally with respect to one another. Each wire 16 of the pair of wires 16 can include a top rib 12 disposed over a bottom rib 14 . There can be a first gap G 1 disposed between two wires 16 of the pair of wires 16 . The first gap G 1 can extend between adjacent top ribs 12 and adjacent bottom ribs 14 . Each of the nano-structures 15 can be separated from an adjacent nano-structure 15 by a second gap G 2 disposed between adjacent nanostructures 15 , and thus between adjacent pairs of wires 16 . The first gap G 1 and/or the second gap G 2 can be air-filled gaps G (see in FIG. 1 ). The first gap G 1 and/or the second gap G 2 can be filled partially or totally with a solid material (see 21 in FIGS. 2-3 ). A comparison of a width W 1 of the first gap G 1 to a width W 2 of the second gap G 2 is described below.

The first gap G 1 and the second gap G 2 can extend from a base 15 b of the nanostructures 15 to a top 15 t of the nanostructures 15 . The base 15 b of the nanostructures 15 can substantially terminate in a common plane 15 bp . A top 15 t of the nanostructures 15 can substantially terminate in a common plane 15 tp . A base 12 b of the top ribs 12 can substantially terminate in a common plane 12 bp and a top 14 t of the bottom ribs 14 can also substantially terminate in this common plane 12 bp .

As shown in FIGS. 2-3 , a solid second fill material 21 can be disposed in the first gaps G 2 and in the second gaps G 2 . As shown on wire grid polarizer 20 in FIG. 2 , the second fill material 21 can further extend above a top 15 t of the nanostructures 15 . As shown on wire grid polarizer 30 in FIG. 3 , the second fill material 21 can terminate at or below a top 15 t of the nanostructures 15 , and the nanostructures 15 can separate the second fill material 21 in one gap G from the second fill material 21 in an adjacent gap G, such that the second fill material 21 forms an array of second fill material ribs 21 r . Thus for example, the nanostructures 15 separate second fill material ribs 21 r1 in the first gaps G 1 from second fill material ribs 21 r2 in the second gaps G 2 . The second fill material 21 can improve wire grid polarizer durability, but can also adversely affect wire grid polarizer performance, such as by decreasing transmission of p-polarized light. The need for durability can be balanced against possible degradation in performance for each wire grid polarizer design.

As illustrated in FIG. 9 , a wire grid polarizer 90 is shown comprising an array of parallel, elongated nano-structures 15 disposed over a surface 11 s of a substrate 11 . Each of the nano-structures 15 can include a pair of parallel, elongated top ribs 12 , each oriented laterally with respect to one another, and a first gap G 1 disposed between the pair of top ribs 12 . Each of the nano-structures 15 can be separated from an adjacent nano-structure 15 by a second gap G 2 disposed between adjacent nanostructures 15 , and thus between adjacent pairs of top ribs 12 . The first gap G 1 and the second gap G 2 can extend from a base 12 b of the top ribs 12 to a top 12 t of the top ribs 12 . A top 12 t of the top ribs 12 can substantially terminate in a common plane 12 tp , a top surface of the substrate 11 s can substantially terminate in a common plane 12 bp , and a base 12 b of the top ribs 12 can substantially terminate in the common plane 12 bp at the top surface 11 s of the substrate 11 . The first gap G 1 and/or the second gap G 2 can be air-filled gaps G. Alternatively, the first gap G 1 and/or the second gap G 2 can be filled partially or totally with a solid material (e.g. add the second fill material 21 shown in FIGS. 2-3 to the polarizer 90 shown in FIG. 9 ). A comparison of a width W 1 of the first gap G 1 to a width W 2 of the second gap G 2 is described below.

Method of Making a Wire Grid Polarizer

A method of making a wire grid polarizer can comprise some or all of the following steps. These steps can be performed in order in the order specified.

1. Providing a substrate 11 having an array of parallel, elongated support ribs 13 disposed over the substrate 11 with solid-material-free support-rib gaps G s between the support ribs 13 . See FIG. 4 .

a. This step may be accomplished by patterning and etching a substrate 11 . b. The substrate may be homogenous and made of a single material, such as a wafer of glass for example. The support ribs 13 can be formed by etching into the substrate 11 and thus can be integrally formed from, and made of the same material as, the final substrate 11 . Alternatively, the substrate 11 and the support ribs 13 can be formed of different materials. c. The substrate 11 can include multiple regions 11 a - b . Region 11 a can become the eventual material of the bottom ribs 14 (e.g. transmissive, absorptive, or reflective) and region 11 b can be the eventual substrate 11 below the wires 16 .

2. Conformal coating the substrate 11 and the support ribs 13 with a layer of material 52 while maintaining the support-rib gaps G s between the support ribs 13 . The conformal coating may be done by various methods, such as for example atomic layer deposition (ALD) or sputter. See FIG. 5 . The layer of material 52 can be the material of the top ribs 12 that will be formed in the next step. 3. Etching 51 the layer of material 52 to remove horizontal segments 52 h and leaving an array of parallel, elongated top ribs 12 along sides of the support ribs 13 , including a pair of top ribs 12 for each support rib 13 with a top rib 12 disposed along each side of the support rib 13 . An anisotropic etch 51 can etch away horizontal segments 52 h but leave most of the vertical segments 52 v due to the directional nature of this etch 51 . See FIGS. 5-6 . 4. Backfilling the support-rib gaps G s and above tops 13 t of the support ribs 13 with a solid first fill material 71 . See FIG. 7 . The first fill material 71 can be formed by spinning on a liquid that can harden upon evaporation of an included solvent. For example, spin-on a liquid glass in a solvent, then bake out the solvent. Another method is applying multiple layers by atomic layer deposition (ALD). 5. Etching the first fill material 71 down to tops 12 t of the top ribs 12 and tops 13 t of the support ribs 13 . See FIG. 8 . 6. Etching the support ribs 13 and the first fill material 71 in the support-rib gaps G s down to a base 12 h of the top ribs 12 . The first fill material 71 and the support ribs 13 can have similar etch properties and an etch can be selected to preferentially etch the first fill material 71 and the support ribs 13 with minimal etch of the top ribs 12 . See FIG. 9 . 7. Using the top ribs 12 as a mask, etching 101 the substrate 11 between top ribs 12 thus forming an array of parallel elongated bottom ribs 14 , with each bottom rib 14 disposed below a top rib 12 , with each top rib 12 and bottom rib 14 together defining a wire 16 , with gaps G between adjacent wires 16 . See FIGS. 1 and 10 . An etch can be selected to preferentially etch the substrate 11 with minimal etch of the top ribs 12 . The remaining substrate 11 can be transmissive. 8. Backfilling the gaps G between the wires 16 and above tops 16 t of the wires 16 with second fill material 21 . See FIG. 2 . 9. Etching the second fill material 21 at least down to tops 16 t of the wires 16 , forming a second fill material rib 21 r in each gap G. See FIG. 3 .

Gap Width (W 1 and W 2 ) Relationships

For the polarizers described above ( 10 , 20 , 30 , and 90 ), a first gap width W 1 of the first gap G 1 can be different than a second gap width W 2 of the second gap G 2 . Varying the first gap width W 1 with respect to the second gap width W 2 can affect transmission of p-polarized light (Tp) and transmission of s-polarized light (Ts). The effect of this relationship between the two gaps G is wavelength dependent. Having the ability to adjust one gap width (W 1 or W 2 ) with respect to the other gap width (W 2 or W 1 ) thus gives a polarizer designer an additional degree of freedom in optimizing wire grid polarizer design, and allows optimization of a polarizer for a specific wavelength or range of wavelengths of light.

There can be many different ratios of the two gap widths, depending on desired wavelength range of use and overall polarizer structure. For example, a ratio of the two gap widths can be from 1.05 to 1.3 in one aspect, from 1.3 to 1.5 in another aspect, from 1.5 to 2.0 in another aspect, greater than 1.15 in another aspect, or greater than 2.0 in another aspect. In other words, a larger of the first gap width W 1 or the second gap width W 2 divided by a smaller of the first gap width W 1 or the second gap width W 2 can be greater than or equal to 1.05 and less than or equal to

1.3 ⁢ ( 1.05 ≤ W 1 W 2 ≤ 1.3 ⁢ ⁢ or ⁢ ⁢ 1.05 ≤ W 2 W 1 ≤ 1.3 )

in one aspect, greater than or equal to 1.3 and less than or equal to 1.5 in another

aspect

( 1.3 ≤ W 1 W 2 ≤ 1.5 ⁢ ⁢ or ⁢ ⁢ 1.3 ≤ W 2 W 1 ≤ 1.5 ) ,

greater than or equal to 1.5 and less than or equal to 2.0 in another aspect

( 1.5 ≤ W 1 W 2 ≤ 2.0 ⁢ ⁢ or ⁢ ⁢ 1.5 ≤ W 2 W 1 ≤ 2.0 ) ,

greater than 1.15 in another aspect

( 1.15 ≤ W 1 W 2 ⁢ ⁢ or ⁢ ⁢ 1.15 ≤ W 2 W 1 ) ,

or greater than 2.0 in another aspect

( 2.0 ≤ W 1 W 2 ⁢ ⁢ or ⁢ ⁢ 2.0 ≤ W 2 W 1 ) .

A difference between the first gap width W 1 and the second gap width W 2 can be between 5 nanometers and 20 nanometers in one aspect, between 19 nanometers and 40 nanometers, or between 39 nanometers and 100 nanometers in another aspect. A difference between the first gap width W 1 and the second gap width W 2 can be at least 5 nanometers in one aspect, at least 10 nanometers in another aspect, or at least 25 nanometers in another aspect.

The first gap width W 1 can be the same as, or approximately the same as, the support rib width W 13 . The second gap width W 2 can be approximately equal to the support rib gap width W G8 minus two times the wire width W 16 (W 2 =W Gs −2*W 16 ). Support rib gap width W Gs and support rib width W 13 can be controlled by the lithography technique (mask, interference lithography, etc.) used to make the support ribs 13 . Wire width W 16 can be controlled by the layer of material width W 52 , which can be determined by the deposition technique used (e.g. ALD or sputter) and duration of application of this layer of material 52 .

A width W 12 of the top ribs 12 can be the same as or approximately the same as a width W 14 of the bottom ribs 14 , and this can equal wire width W 16 . Alternatively, depending on the nature of the etch used to form the bottom ribs 14 while using the top ribs 12 as a mask, and the materials used for the top ribs 12 and the bottom ribs 14 , the top rib width W 12 can be different from the bottom rib width W 14 . For example, if the etch has increased isotropic property, and if the bottom ribs 14 etch more easily than the top ribs 12 , then these widths can differ from each other. Wire grid performance at the desired wavelength(s) and durability are factors to consider in a determination of whether these widths should be equal or not.

Measurement of width on an actual wire grid polarizer may be less precise than measurement on a drawing because the wires 16 or ribs 12 and 14 can lean to one side and can vary in width from top to bottom. Thus, if there question of where to measure in order to determine if the widths fall within the requirements specified above, then measure at base 12 b of the top ribs 12 .

General Information for all Embodiments

At least one of the top ribs 12 , the bottom ribs 14 , or the second fill material ribs 21 r can be absorptive in order to substantially absorb one polarization state of the incoming light. At least one of the top ribs 12 , the bottom ribs 14 , or the second fill material ribs 21 r can be transmissive. At least one of the top ribs 12 , the bottom ribs 14 , or the second fill material ribs 21 r can be reflective in order to substantially polarize incident light. The substrate 11 and/or the second fill material 21 can be transmissive.

U.S. patent application Ser. No. 13/326,566, filed on Dec. 15, 2011, and U.S. Pat. Nos. 7,570,424 and 7,961,393, incorporated herein by reference in their entirety, provide examples of possible substrate materials, dielectric materials including absorptive dielectric materials and transmissive dielectric materials, and reflective materials. The reflective materials can also be made of a semiconductor material doped to achieve a desired level of conductivity, or other types of conductors such as certain forms of carbon.

The wire grid polarizers described herein can be made with a relatively high aspect ratio (top rib thickness divided by top rib width—Th 12 /W 12 , bottom rib thickness divided by bottom rib width—Th 14 /W 14 , and/or wire thickness divided by wire width—Th 16 /W 16 ,). A large aspect ratio can be accomplished by formation of relatively tall support ribs 13 in relation to a width W 52 of the layer of material 52 (which may approximate eventual top rib width W 12 ) and/or by a deep etch during formation of the bottom ribs 14 .

Modeling has shown good polarization characteristics with aspect ratios (of the top ribs 12 , the bottom ribs 14 , or the wires 16 ) of between 8 and 60 in one aspect, between 4 and 7 in another aspect, or between 3 and 8 in another aspect, depending on the wavelength for desired polarization and overall wire grid polarizer design. Modeling has shown good polarization characteristics with a wire width W 16 of between 5 nm and 20 nm for polarization of some ultraviolet wavelengths. Modeling has shown good polarization characteristics with a top rib thickness Th 12 of between 50 nm and 100 nm in one aspect, between 90 nm and 160 nm in another aspect, or between 150 nm and 300 nm in another aspect, depending on the wavelength for desired polarization.

Lithography techniques can limit a possible minimum pitch. Lithography techniques can limit a pitch of the support ribs 13 , but two wires 16 can be made for every support rib 13 , thus effectively cutting the pitch in half. This small pitch allows for more effective polarization and allows polarization at lower wavelengths.