Photoresist nozzle device and photoresist supply system

Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment. Semiconductor devices are typically fabricated by sequentially depositing insulating or dielectric layers, conductive layers, and semiconductive layers of material over a semiconductor substrate, and patterning the various material layers using lithography to form circuit components and elements thereon. Many integrated circuits are typically manufactured on a single semiconductor wafer, and individual dies on the wafer are singulated by sawing between the integrated circuits along a scribe line. The individual dies are typically packaged separately, in multi-chip modules, or in other types of packaging, for example.

In the lithography process, a photoresist is applied to a wafer. The photoresist is a material that forms a pattern when it is exposed to radiation. A thin layer of the photoresist is spread on the surface of a wafer, and the photoresist is exposed to a pattern for a step in the semiconductor manufacturing process. These patterns now have very fine details, and some issues in the photoresist may cause an unsatisfactory image in the exposed photoresist. Although existing devices and methods for lithography process have been generally adequate for their intended purposes, they have not been entirely satisfactory in all respects. Consequently, it would be desirable to provide a solution for photoresist for use in an wafer process apparatus

For a more complete understanding of the present disclosure, and the advantages of the present disclosure, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a schematic view of a photoresist supply system and a coating apparatus in accordance with some embodiments of the disclosure.

FIG. 2 is a schematic view of a photoresist nozzle device and a coating apparatus in accordance with some embodiments of the disclosure.

FIG. 3 is a schematic view of a photoresist nozzle device and a coating apparatus in accordance with some embodiments of the disclosure.

FIG. 4 is a schematic view of a photoresist nozzle device and a coating apparatus in accordance with some embodiments of the disclosure.

FIG. 5 is a schematic view of a photoresist nozzle device in accordance with some embodiments of the disclosure.

The making and using of various embodiments of the disclosure are discussed in detail below. It should be appreciated, however, that the various embodiments can be embodied in a wide variety of specific contexts. The specific embodiments discussed are merely illustrative, and do not limit the scope of the disclosure.

It should be understood that the following disclosure provides many different embodiments, or examples, for implementing different features of the disclosure. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. Moreover, the performance of a first process before a second process in the description that follows may include embodiments in which the second process is performed immediately after the first process, and may also include embodiments in which additional processes may be performed between the first and second processes. Various features may be arbitrarily drawn in different scales for the sake of simplicity and clarity. Furthermore, the formation of a first feature over or on a second feature in the description may include embodiments in which the first and second features are formed in direct or indirect contact.

Some variations of the embodiments are described. It is understood that additional operations can be provided before, during, and after the method, and some of the operations described can be replaced or eliminated for other embodiments of the method.

FIG. 1 is a schematic view of a photoresist supply system 1 and a coating apparatus A 1 in accordance with some embodiments of the disclosure. The photoresist supply system 1 is configured to supply photoresist fluid L 1 to the coating apparatus A 1 . The photoresist supply system 1 includes a photoresist container 10 , a buffer tank 20 , a gas pump 30 , a pump 40 , and a photoresist nozzle device 50 .

The photoresist container 10 is configured to contain the photoresist fluid L 1 . The photoresist container 10 is coupled with the buffer tank 20 , and transferring the photoresist fluid L 1 to the buffer tank 20 . The photoresist container 10 includes a bottle 11 and a seal cap 12 disposed on a top opening of the bottle 11 . The bottle 11 and the seal cap 12 form a first sealed chamber 13 . The photoresist fluid L 1 is contained in the first sealed chamber 13 . The photoresist container 10 is replaceable with a new photoresist container 10 in the photoresist supply system 1 when the bottle 11 is empty.

The buffer tank 20 is also configured to contain the photoresist fluid L 1 . The buffer tank 20 receives the photoresist fluid L 1 from the photoresist container 10 . When the bottle 11 is empty, the photoresist supply system 1 continually supplies the photoresist fluid L 1 to the coating apparatus A 1 via the buffer tank 20 . In some embodiments, the volume of the buffer tank 20 is greater than the volume of the photoresist container 10 .

The buffer tank 20 includes a tank body 21 and a seal cover 22 disposed on a top opening of the tank body 21 . The tank body 21 and the seal cover 22 form a second sealed chamber 23 . The photoresist container 10 and the buffer tank 20 are coupled with each other by a first tube T 1 . The first tube T 1 is inserted into the bottle 11 by passing through the seal cap 12 . One end of the first tube T 1 is immersed in the photoresist fluid L 1 in the bottle 11 . The first tube T 1 is further inserted into the tank body 21 by passing through the seal cover 22 . One end of the first tube T 1 is immersed in the photoresist fluid L 1 in the tank body 21 .

A gas pump 30 is configured to transfer a gas into the photoresist container 10 and the buffer tank 20 . In some embodiments, the gas includes N 2 . The gas pump 30 is coupled with the photoresist container 10 and the buffer tank 20 by a second tube T 2 . The second tube T 2 is inserted into the bottle 11 by passing through the seal cap 12 . One end of the second tube T 2 is located in the first sealed chamber 13 and located over the photoresist fluid L 1 in the bottle 11 . The second tube T 2 is also inserted into the tank body 21 by passing through the seal cap 12 . One end of the second tube T 2 is located in the second sealed chamber 23 and located over the photoresist fluid L 1 in the tank body 21 . In some embodiments, the gas pump 30 is coupled with the photoresist container 10 by one tube and coupled with the buffer tank 20 by another tube.

When the gas is transferred into the photoresist container 10 by the gas pump 30 , the pressure of the first sealed chamber 13 in the photoresist container 10 is increased. Therefore, the photoresist fluid L 1 in the photoresist container 10 flows into the buffer tank 20 via the first tube T 1 . The volume of the photoresist fluid L 1 in the photoresist container 10 flowing into the buffer tank 20 is relative to the volume of the gas transferred into the photoresist container 10 . For example, the gas pump 30 transfers 5 ml gas into the bottle 11 , and 5 ml photoresist fluid L 1 flows to the buffer tank 20 .

Furthermore, when the gas is transferred into the buffer tank 20 , the pressure of the second sealed chamber 23 in the buffer tank 20 is increased. Therefore, the photoresist fluid L 1 in the buffer tank 20 flows into the pump 40 . The volume of the photoresist fluid L 1 in the buffer tank 20 flowing into the pump 40 is relative to the volume of the gas and the photoresist fluid L 1 transferred into the buffer tank 20 . For example, 3 ml gas and 3 m 1 photoresist fluid L 1 is transferred into the tank body 21 , and 6 ml photoresist fluid L 1 flows to the pump 40 .

In some embodiments, a first valve V 1 is disposed on the second tube T 2 . The first valve V 1 controls the flow rate of the gas flowing in to the photoresist container 10 . In some embodiments, a second valve V 2 is disposed on the second tube T 2 . The second valve V 2 controls the flow rate of the gas flowing in to the buffer tank 20 . Further, by the first valve V 1 and the second valve V 2 , the gas pump 30 is configured to selectively supply the gas to the photoresist container 10 or the buffer tank 20 .

For example, if the bottle 11 is empty and the photoresist container 10 should be replaced, the first valve V 1 is closed and the gas pump 30 transfers the gas to the buffer tank 20 . Furthermore, a third valve V 3 is disposed on the tube T 1 . The third valve V 3 is closed when the gas pump 30 transfers gas to the buffer tank 20 , and the photoresist fluid L 1 is prevented from being exhausted from the first tube T 1 . Therefore, the photoresist supply system 1 should continually supply the photoresist fluid L 1 to the coating apparatus A 1 .

In addition, when the photoresist fluid L 1 in the buffer tank 20 is low, the second valve V 2 is closed and the gas pump 30 transfers gas to the photoresist container 10 . Furthermore, a fourth valve V 4 disposed on the tank body 21 , and the gas in the tank body 21 can be exhausted via the valve V 4 . Therefore, the photoresist fluid L 1 can fill with the tank body 21 via the first tube T 1 , when the fourth valve V 4 is opened.

The pump 40 receives the photoresist fluid L 1 from the buffer tank 20 . In some embodiments, the pump 40 is a piston pump. The pump 40 is configured to supply a volume of the photoresist fluid L 1 to the coating apparatus A 1 . For example, the volume is in a range from about 0.5 ml to about 8.0 ml according to different semiconductor manufacturing processes.

The pump 40 includes a cylinder 41 and a piston 42 . The cylinder 41 contains photoresist fluid L 1 . The piston 42 is movably disposed in the cylinder 41 . When the piston 42 is moved from a first side 411 of the cylinder 41 toward a second side 412 of the cylinder 41 in a distance, the piston 42 pushes the photoresist fluid L 1 to the photoresist nozzle device 50 . The distance is relative to the volume and the size of the cylinder 41 . For example, the volume is about 5 ml, and the distance is about 10 mm. After the piston 42 pushes the photoresist fluid L 1 to the photoresist nozzle device 50 , the piston 42 is moved back toward to the first side 411 of the cylinder 41 , and the cylinder 41 is filled with the photoresist fluid L 1 transferred from the buffer tank 20 .

In some embodiments, the pump 40 is coupled with the buffer tank 20 via a third tube T 3 . The third tube T 3 is communicated with the second sealed chamber 23 and the cylinder 41 . One end of the third tube T 3 is disposed on the bottom of the tank body 21 . The other end of the third tube T 3 is disposed on a side wall of the cylinder 41 .

A fifth valve V 5 is disposed on the third tube T 3 . The fifth valve V 5 is closed when the piston 42 pushes the photoresist fluid L 1 to the photoresist nozzle device 50 . The fifth valve V 5 is opened after the piston 42 pushes the photoresist fluid L 1 to the photoresist nozzle device 50 and the piston 42 is moved back toward to the first side 411 of the cylinder 41 .

In some embodiments, the photoresist fluid L 1 is made by mixing resin, light sensitive agent, and solvent. Since the photoresist fluid L 1 is viscous, some bubbles and gas are included in the photoresist fluid L 1 during the mixing process. In general, the photoresist container 10 filled with photoresist fluid L 1 is obtained from a factory. Some bubbles B 1 usually remains in the photoresist fluid L 1 of the photoresist container 10 . Therefore, a filter F 1 is disposed on the third tube T 3 to remove almost all of the bubbles B 1 before the photoresist fluid flows into the cylinder 41 . Moreover, since the photoresist fluid L 1 is exhausted from the photoresist container 10 and the buffer tank 20 by the gas, some gas is dissolved in the photoresist fluid L 1 .

Since some of the bubbles B 1 may not be removed by the filter F 1 and enter into the cylinder 41 , a fourth tube T 4 is disposed on a side wall of the cylinder 41 , and a sixth valve V 6 is disposed on the fourth tube T 4 . After a predetermined number of times (such as three thousands times) of the piston 42 pushing the photoresist fluid L 1 to the photoresist nozzle device 50 , the sixth valve V 6 is opened and some of the photoresist fluid L 1 are exhausted from the cylinder 41 . The photoresist fluid L 1 exhausted from the cylinder 41 is to be checked for the presence of the bubbles B 1 .

If there are bubbles B 1 in the photoresist fluid L 1 , the filter F 1 should be replaced. Since the bubbles B 1 are also generated due to some parts of the photoresist supply system 1 , such as the valves, the valves also should be checked. However, the time for checking the photoresist fluid L 1 is long. For example, a checking process of the photoresist fluid L 1 is performed after the piston 42 pushes the photoresist fluid L 1 to the photoresist nozzle device 50 the predetermined number of times. Some bubbles B 1 may be transferred to the coating apparatus A 1 between two checking processes.

FIG. 2 is a schematic view of a photoresist nozzle device 50 and the coating apparatus A 1 in accordance with some embodiments of the disclosure. The coating apparatus A 1 includes a processing chamber A 11 and a wafer chuck A 12 . The wafer chuck A 12 is disposed in the processing chamber A 11 . A wafer W 1 is disposed on the wafer chuck A 12 .

The photoresist nozzle device 50 is located in the processing chamber A 11 . The photoresist nozzle device 50 is configured to spurt the photoresist fluid L 1 on the wafer W 1 . When the photoresist fluid L 1 flows on the wafer W 1 , the wafer W 1 is rotated by the wafer chuck A 12 , and the photoresist fluid L 1 uniformly covers a top surface of the wafer W 1 .

The photoresist nozzle device 50 is coupled with the pump 40 via a fifth tube T 5 . The photoresist nozzle device 50 includes a nozzle 51 and a retaining element 52 . The nozzle 51 is disposed on a bottom surface of the retaining element 52 . The retaining element 52 has a retaining body 521 , a channel 522 , and a fastening element 523 . The channel 522 is located in the retaining body 521 . The channel 522 communicates with the nozzle 51 and the fifth tube T 5 . The fifth tube T 5 is fixed on the retaining body 521 by the fasten element 523 . In some embodiments, the fasten element 523 is a screw nut.

The fifth tube T 5 is further connected to the second side 412 of the cylinder 41 as shown in FIG. 1 . The photoresist fluid L 1 in the cylinder 41 flows to the nozzle 51 via the fifth tube T 5 and the channel 522 . A seventh valve V 7 as shown in FIG. 1 is disposed on the fifth tube T 5 . After the piston 42 pushes the photoresist fluid L 1 to the nozzle 51 via the fifth tube T 5 , the seventh valve V 7 is closed. Therefore, the photoresist fluid L 1 in the nozzle 51 and the channel 522 is prevented from drawing back to the cylinder 41 .

However, in some embodiments, the seventh valve V 7 is closed after the pump 40 draws back a little bit of the photoresist fluid L 1 . As show in FIG. 2 , the photoresist fluid L 1 in the nozzle 51 is a distance from an exhaust opening 511 . Therefore, the photoresist fluid L 1 in the nozzle 51 is prevented from falling on the wafer W 1 unexpectedly after the seventh valve V 7 is closed.

In some embodiments, the channel 522 is an L-shaped structure. The channel 522 has a first straight segment 5221 and a second straight segment 5222 . The first straight segment 5221 is parallel to a horizontal direction D 2 . The second straight segment 5222 is parallel to a vertical direction D 1 . A connection location 5223 of the first straight segment 5221 and the second straight segment 5222 is a 90-degree bend. Therefore, the photoresist fluid L 1 flowing through the first straight segment 5221 and the second straight segment 5222 via the connection location 5223 is not smooth.

When the pump 40 draws back a little bit of the photoresist fluid L 1 from the fifth tube T 5 , the hydraulic pressure of the photoresist fluid L 1 at the connection location 5223 is decreased. Therefore, the gas dissolved in the photoresist fluid L 1 is released and forms some bubbles B 1 . The bubbles B 1 may fall down on the wafer W 1 with the photoresist fluid L 1 spurted from the nozzle 51 . Some defects may be caused on the wafer W 1 by the bubbles B 1 .

FIG. 3 is a schematic view of a photoresist nozzle device 50 and the coating apparatus A 1 in accordance with some embodiments of the disclosure. As shown in FIG. 3 , the channel 522 located in the retaining body 521 includes a first straight segment 5221 , a second straight segment 5222 , and a bend segment 5224 .

In some embodiments, the bend segment 5224 has a diameter E 1 in a range from about 1 cm to about 3 cm and a length in a range from about 2 cm to about 4 cm. The bend segment 5224 has a diameter E 1 and a length about 1 to about 2 times longer than the diameter E 1 . In some embodiments, the curved segment 542 has a curvature in a range about 0.5 cm^−1 to about 1 cm^−1. Since the length is short, the photoresist fluid L 1 flowing through the first straight segment 5221 and the second straight segment 5222 via the bend segment 5224 is still not smooth enough. Fewer bubbles B 1 are still generated at the bend segment 5224 .

In general, the fifth tube T 5 is made of light shading materials to protect the photoresist fluid L 1 in the fifth tube T 5 from ambient light. The retaining element 52 is also made of light shading materials. However, the bubbles B 1 located in the channel 522 cannot be inspected directly. Therefore, another embodiment is provided.

FIG. 4 is a schematic view of a photoresist nozzle device 50 and the coating apparatus A 1 in accordance with some embodiments of the disclosure. FIG. 5 is a photoresist nozzle device 50 in accordance with some embodiments of the disclosure. The photoresist nozzle device 50 includes a nozzle 51 , a retaining frame 53 , and a tube 54 . The nozzle 51 , the retaining frame 53 , and the tube 54 are located in the processing chamber A 11 . The nozzle 51 is disposed on a bottom surface of the retaining frame 53 . The tube 54 is disposed on the retaining frame 53 . The tube 54 communicates with the fifth tube T 5 and the nozzle 51 .

The retaining frame 53 further includes a first wall 531 and a second wall 532 connected to the first wall 531 . The first wall 531 and the second wall 532 form a receiving groove 533 . In some embodiments, the first wall 531 is substantially perpendicular to the second wall 532 . The first wall 531 is substantially extended to the vertical direction D 1 , and the second wall 532 is substantially extended to the horizontal direction D 2 .

The tube 54 includes a first segment 541 , a curved segment 542 and a second segment 543 . The first segment 541 passes through the first wall 531 . The curved segment 542 is connected to the first segment 541 and the second segment 543 . The curved segment 542 is located in the receiving groove 533 . The second segment 543 passes through the second wall 532 . The second segment 543 is connected to the nozzle 51 .

In some embodiments, the tube 54 is made of light transmissible materials. Since the curved segment 542 is uncovered by the retaining frame 53 , the inner side of the curved segment 542 is directly inspected from the outside of the coating apparatus A 1 . Therefore, the photoresist fluid L 1 in the photoresist nozzle device 50 may be inspected more frequently. If some bubbles B 1 are generated in the tube 54 , the bubbles B 1 may be inspected and removed in a short time, and the defects of the wafer W 1 caused by the bubbles B 1 are decreased.

In some embodiments, as shown in FIG. 5 , the first segment 541 is extended along the horizontal direction D 2 . The second segment 543 is extended along the vertical direction D 1 . The nozzle 51 is extended along the vertical direction D 1 .

In some embodiments, the curved segment 542 has an arc length in a range from about 5 cm to about 16 cm. For example, the arc length is about 7 cm. The curved segment 542 has a diameter E 2 in a range from about 1 cm to about 5 cm. For example, the diameter E 2 is about 2 cm. The arc length is about 2.5 to about 15 times longer than the diameter E 2 . For example, the arc length is about 3.5 times longer than the diameter E 2 .

In some embodiments, the curved segment 542 is extended along a circular path P 1 . The curved segment 542 has a radian about π/2 rad. In some embodiments, the curved segment 542 has a curvature in a range about 0.1 cm^−1 to about 0.4 cm^−1. For example, the curvature is about 0.3 mm^−1.

In some embodiments, the curved segment 542 has a first end 542 a connected to the first segment 541 and a second end 542 b connected to the second segment 543 . The circular path P 1 at the first end 542 a has a first tangent line J 1 , and the first segment 541 is extended along the first tangent line J 1 . The circular path P 1 at the second end 542 b has a second tangent line J 2 , and the second segment 543 is substantially extended along the second tangent line J 2 .

By the structure of the curved segment 542 , the photoresist fluid L 1 flowing through the first segment 541 and the second segment 543 via the curved segment 542 is smooth. Therefore, the pressure in the curved segment 542 is not decreased greatly when some of the photoresist fluid L 1 is drawn back to the cylinder 41 . Bubbles B 1 generated in the tube 54 are greatly decreased or omitted.

Embodiments of a photoresist supply system and a photoresist nozzle device are provided. A nozzle is configured to spurt a photoresist fluid on a wafer in a coating apparatus. A tube connected to the nozzle includes a curved segment. Therefore, the photoresist fluid flowing in the tube is smooth. Some bubbles generated in the tube by a pump drawing back the photoresist fluid is decreased or omitted. Furthermore, the tube is made of light transmissible materials. The photoresist fluid of the tube is inspected directly from the outside of the coating apparatus. Therefore, the photoresist fluid in the tube may be inspected frequently.

In some embodiments, a photoresist nozzle device is provided. The photoresist nozzle device includes a tube including a first segment, a curved segment connected to the first segment, and a second segment connected to the curved segment. The photoresist nozzle device also includes a nozzle connected to the second segment.

In some embodiments, a photoresist nozzle device for a coating apparatus is provided. The photoresist nozzle device includes a retaining frame having a receiving groove. The retaining frame is located in the coating apparatus. The photoresist nozzle device also includes a tube disposed on the retaining frame. The tube includes a first segment, a curved segment connected to the first segment and located in the receiving groove, and a second segment connected to the curved segment. The photoresist nozzle device further includes a nozzle connected to the second segment.

In some embodiments, a photoresist supply system is provided. The photoresist supply system includes a buffer tank containing a photoresist fluid and a pump coupled with the buffer tank, and receiving the photoresist fluid. The photoresist supply system also includes a tube including a first segment coupled with the pump, a curved segment connected to the first segment, and a second segment connected to the curved segment. The photoresist supply system further includes a nozzle connected to the second segment. The pump transfers the photoresist fluid to the nozzle via the tube.

Although embodiments of the present disclosure and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the disclosure as defined by the appended claims. For example, it will be readily understood by those skilled in the art that many of the features, functions, processes, and materials described herein may be varied while remaining within the scope of the present disclosure. Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure of the present disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps. In addition, each claim constitutes a separate embodiment, and the combination of various claims and embodiments are within the scope of the disclosure.